Two-dimensional atomic lithography by submicrometer focusing of atomic beams
Authors:
- Will WilliamsWWWill Williams
- M. SaffmanMSM. Saffman
- 1 June 2006
- journal article
- Published by Optica Publishing Group in Journal of the Optical Society of America B
- Vol. 23 (6) , 1161-1169
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
All Related Versions
This publication has 33 references indexed in Scilit:
- Atom lithography with two-dimensional optical masksApplied Physics B, 2004
- Nanotechnology with atom opticsScience and Technology of Advanced Materials, 2004
- One-, two-and three-dimensional nanostructures with atom lithographyJournal of Physics: Condensed Matter, 2003
- Atomic nanofabrication: atomic deposition and lithography by laser and magnetic forcesJournal of Physics D: Applied Physics, 2003
- Writing a superlattice with light forcesApplied Physics B, 2000
- Magnetic atom optics: mirrors, guides, traps, and chips for atomsJournal of Physics D: Applied Physics, 1999
- Nanofabrication via atom opticsApplied Surface Science, 1999
- Imaging with an atomic beamNature, 1995
- Laser-Focused Atomic DepositionScience, 1993
- Using light as a lens for submicron, neutral-atom lithographyPhysical Review Letters, 1992