Room temperature growth of nanocrystalline anatase TiO2 thin films by dc magnetron sputtering
Authors:
- Preetam SinghPSPreetam Singh
- Davinder KaurDKDavinder Kaur
- 1 March 2010
- journal article
- Published by Elsevier in Physica B: Condensed Matter
- Vol. 405 (5) , 1258-1266
Abstract
No abstract availableKeywords
This publication has 25 references indexed in Scilit:
- Effect of oxygen partial pressure on the structural and optical properties of sputter deposited ZnO nanocrystalline thin filmsMaterials Letters, 2007
- Preparation of Crystalline TiO2 Thin Film Photocatalysts on Polycarbonate Substrates by a RF-magnetron Sputtering Deposition MethodChemistry Letters, 2006
- Investigation on microstructure and optical properties of titanium dioxide coatings annealed at various temperatureOptical Materials, 2006
- Effect of deposition methods on the properties of photocatalytic TiO2thin films prepared by spray pyrolysis and magnetron sputteringJournal of Physics: Condensed Matter, 2004
- Conductivity in transparent anatase TiO2 films epitaxially grown by reactive sputtering depositionSolid-State Electronics, 2003
- Efficient Photochemical Water Splitting by a Chemically Modified n-TiO 2Science, 2002
- Erratum: Structure and energetics of stoichiometricanatase surfaces [Phys. Rev. B63, 155409 (2001)]Physical Review B, 2002
- Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic propertiesJournal of Physics D: Applied Physics, 2000
- A low-cost, high-efficiency solar cell based on dye-sensitized colloidal TiO2 filmsNature, 1991
- A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin filmJournal of Physics E: Scientific Instruments, 1976