Optical plasma emission spectroscopy of etching plasmas used in Si-based semiconductor processing
Authors:
- 1 August 2002
- journal article
- Published by IOP Publishing in Plasma Sources Science and Technology
- Vol. 11 (3A) , A26-A30
Abstract
Previously published applications of optical emission spectroscopy as a quantitative plasma diagnostic technique are reviewed. By adding traces of rare gases to the plasma, electron temperatures (Te) and relative electron and ion densities can be determined from electron impact-induced optical emission. Excitation from both the ground state and metastable states of the rare gases must be considered. At higher rare gas partial pressures, UV radiation trapping and optical cascading must also be taken into account. Absolute species concentrations (e.g. Cl2, Cl, O, and F) can be derived from their optical emissions, combined with Te measurements determined from rare gas optical emission. Examples are given of neutral and ion species density measurements in chlorine, oxygen, and fluorocarbon-containing low-pressure, high charge-density plasmas. Typical results of Te measurements are also presented and compared with Langmuir probeKeywords
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