Temperature dependence of the character of AlN nucleation layer grown on SiC substrates by MOCVD
Authors:
- Dongguo ZhangDZDongguo Zhang
- Zhonghui LiZLZhonghui Li
- Daqing PengDPDaqing Peng
- Xun DongXDXun Dong
- Chuanhao LiCLChuanhao Li
- 1 November 2016
- journal article
- Published by Elsevier in Superlattices and Microstructures
- Vol. 99, 104-107
Abstract
No abstract availableKeywords
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