Electron and hole traps in SiO/sub 2/ films thermally grown on Si substrates in ultra-dry oxygen
Authors:
- H. MikiHMH. Miki
- M. NoguchiMNM. Noguchi
- K. YokogawaKYK. Yokogawa
- Kim Bo-WooKBKim Bo-Woo
- K. AsadaKAK. Asada
- T. SuganoTST. Sugano
- 1 January 1988
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 35 (12) , 2245-2252
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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