A new RuO4 solvent solution for pure ruthenium film depositions
Authors:
- Julien GatineauJGJulien Gatineau
- Kazutaka YanagitaKYKazutaka Yanagita
- Christian DussarratCDChristian Dussarrat
- 1 November 2006
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 83 (11-12) , 2248-2252
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Atomic Layer Deposition of Ruthenium Thin Films from Ru(thd)3 and OxygenChemical Vapor Deposition, 2004
- Metabolism and Dosimetry of Inhaled 106RuO4 in Fischer-344 RatsHealth Physics, 1980
- A system for nose-only inhalation exposures of small animals to 106RuO4Journal of Aerosol Science, 1979