172 nm excimer VUV-triggered photodegradation and micropatterning of aminosilane films
- 1 October 2009
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 517 (24) , 6772-6776
Abstract
No abstract availableKeywords
This publication has 19 references indexed in Scilit:
- Conversion of Perhydropolysilazane into a SiOx Network Triggered by Vacuum Ultraviolet Irradiation: Access to Flexible, Transparent Barrier CoatingsChemistry – A European Journal, 2007
- Windowless argon excimer source for surface modificationApplied Surface Science, 2006
- Preparation of a Well-Defined Amino-Terminated Self-Assembled Monolayer and Copper Microlines on a Polyimide Substrate Covered with an Oxide NanoskinLangmuir, 2005
- Direct initiation of the photopolymerization of acrylates by short-wavelength excimer UV radiationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2003
- Photoreactivity of Alkylsilane Self-Assembled Monolayers on Silicon Surfaces and Its Application to Preparing Micropatterned Ternary MonolayersLangmuir, 2003
- Amino-terminated self-assembled monolayer on a SiO2 surface formed by chemical vapor depositionJournal of Vacuum Science & Technology A, 2001
- Micropatterning of Alkyl- and Fluoroalkylsilane Self-Assembled Monolayers Using Vacuum Ultraviolet LightLangmuir, 2000
- Density-functional thermochemistry. III. The role of exact exchangeThe Journal of Chemical Physics, 1993
- Silent-discharge driven excimer UV sources and their applicationsApplied Surface Science, 1992
- Estimation of the surface free energy of polymersJournal of Applied Polymer Science, 1969