Influence of thickness on the crystallography and surface topography of TiN nano-films deposited by reactive DC and pulsed magnetron sputtering
Authors:
- I. IordanovaIII. Iordanova
- P.J. KellyPKP.J. Kelly
- M. BurovaMBM. Burova
- A. AndreevaAAA. Andreeva
- B. StefanovaBSB. Stefanova
- 1 June 2012
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 520 (16) , 5333-5339
Abstract
No abstract availableKeywords
Funding Information
- Sofia University “St. Kl. Ohridsky”
This publication has 13 references indexed in Scilit:
- Recent developments in pulsed magnetron sputteringSurface and Coatings Technology, 2004
- A comparison of the properties of titanium-based films produced by pulsed and continuous DC magnetron sputteringSurface and Coatings Technology, 2003
- Magnetron sputtering: a review of recent developments and applicationsVacuum, 2000
- Effect of processing parameters on the microstructure and mechanical properties of TiN film on stainless steel by HCD ion platingThin Solid Films, 1999
- Recent advances in magnetron sputteringSurface and Coatings Technology, 1999
- Asymmetric bipolar pulsed power: a new power technologySurface and Coatings Technology, 1998
- The deposition of aluminium oxide coatings by reactive unbalanced magnetron sputteringSurface and Coatings Technology, 1996
- Pulsed magnetron sputter technologySurface and Coatings Technology, 1993
- Microhardness of Ti-N films containing the epsilon -Ti2N phaseJournal of Physics D: Applied Physics, 1988
- Evaluation of coating wear resistance for bulk metal formingThin Solid Films, 1980