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  3. Obtaining a Low and Wide Atomic Layer Deposition Window (150–275 °C) for In2O3 Films Using an InIII Amidinate and H2O
  4. Publication with shared reference
  5. 10.1002/chem.201802317
  1. Home
  2. Publications
  3. Obtaining a Low and Wide Atomic Layer Deposition Window (150–275 °C) for In2O3 Films Using an InIII Amidinate and H2O
  4. Publication with shared reference
  5. 10.1002/chem.201802317

Publications with shared reference:

Obtaining a Low and Wide Atomic Layer Deposition Window (150–275 °C) for In2O3 Films Using an InIII Amidinate and H2O

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