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  3. Necking Reduction at Low Temperature in Aspect Ratio Etching of SiO2 at CF4/H2/Ar Plasma
  4. Publication with shared reference
  5. 10.3390/nano14020209
  1. Home
  2. Publications
  3. Necking Reduction at Low Temperature in Aspect Ratio Etching of SiO2 at CF4/H2/Ar Plasma
  4. Publication with shared reference
  5. 10.3390/nano14020209

Publications with shared reference:

Necking Reduction at Low Temperature in Aspect Ratio Etching of SiO2 at CF4/H2/Ar Plasma

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