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  3. Highly reliable thin nitrided SiO 2 films formed by rapid thermal processing in an N 2 O ambient
  4. Publication with shared reference
  5. 10.1049/el:19900966
  1. Home
  2. Publications
  3. Highly reliable thin nitrided SiO 2 films formed by rapid thermal processing in an N 2 O ambient
  4. Publication with shared reference
  5. 10.1049/el:19900966

Publications with shared reference:

Highly reliable thin nitrided SiO 2 films formed by rapid thermal processing in an N 2 O ambient

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