Rankings
Publications
Search Publications
Cited-by Search
Sources
Publishers
Scholars
Scholars
Top Cited Scholars
Organizations
About
Scilit
About Us
Advisory Board
Data Sources
Career
Support / Contact
User Guide
Publisher User
Search Function
Rankings Function
API Resource
Scilit Knowledge
Metrics
Scilit Recognitions
Publications Classification
Media
News
Blog
Login
Register
Home
Publications
Evidence that N2O is a Stronger Oxidizing Agent than O2 for the Post-Deposition Annealing of Ta2O5 on Si Capacitors
Publication with shared reference
10.1143/jjap.36.661
Home
Publications
Evidence that N2O is a Stronger Oxidizing Agent than O2 for the Post-Deposition Annealing of Ta2O5 on Si Capacitors
Publication with shared reference
10.1143/jjap.36.661
Publications with shared reference:
Evidence that N
2
O is a Stronger Oxidizing Agent than O
2
for the Post-Deposition Annealing of Ta
2
O
5
on Si Capacitors
0
publications found
Export
Export
Analytics view
Analytics view
Scroll to top