Rusli
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Rusli has a total of 54 co-authors. Here are the top co-authors by number of shared publications:
J. Ahn
Microelectronics Centre, School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Singapore
5 shared publicationsS.F. Yoon
Microelectronics Centre, School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Singapore
5 shared publicationsHao Wang
Novitas, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore
4 shared publicationsC.C. Tin
Department of Physics, Auburn University, AL 36849, USA
3 shared publicationsC.L. Zhu
School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Singapore
3 shared publicationsA. Kumta
Nanyang Technological University School of Electrical and Electronics Engineering Singapore 639798, Singapore
2 shared publications
Latest Publications
- Open Access
Full Coverage of Optimal Phasor Measurement Unit Placement Solutions in Distribution Systems Using Integer Linear Programming
Integer linear programming (ILP) has been widely applied to solve the optimal phasor measurement unit (PMU) placement (OPP) problem for its computational efficiency. Using ILP, a placement with minimum number of Phasor Measurement Units (PMUs) and maximum measurement redundancy can be obtained while ensuring system observability. Author response: please delete this above sentence. However, the existing ILP-based OPP methods does not guarantee full coverage of solutions to the optimization problem, which may sequentially results in suboptimal supervision of the system. In this paper, a hybrid ILP-based method is proposed to cover all solutions to the OPP problem without any omission. Comparing with the existing exhaustive searching methods, the proposed method is more computationally efficient, which makes finding all solutions in a large system a more feasible problem.
Open AccessFull Coverage of Optimal Phasor Measurement Unit Placement Solutions in Distribution Systems Using Integer Linear Programming
Integer linear programming (ILP) has been widely applied to solve the optimal phasor measurement unit (PMU) placement (OPP) problem for its computational efficiency. Using ILP, a placement with minimum number of Phasor Measurement Units (PMUs) and maximum measurement redundancy can be obtained while ensuring system observability. Author response: please delete this above sentence. However, the existing ILP-based OPP methods does not guarantee full coverage of solutions to the optimization problem, which may sequentially results in suboptimal supervision of the system. In this paper, a hybrid ILP-based method is proposed to cover all solutions to the OPP problem without any omission. Comparing with the existing exhaustive searching methods, the proposed method is more computationally efficient, which makes finding all solutions in a large system a more feasible problem.
- 3 February 2015
- Published by Royal Society of Chemistry (RSC) in Nanoscale
- Vol. 7 (10) , 4559-4565
High Efficiency Silicon Nanowire/organic Hybrid Solar Cell with Two-step Surface Treatment
A simple two-step surface treatment process is proposed to boost the efficiency of silicon nanowire/PEDOT:PSS hybrid solar cells. The Si nanowires (SiNWs) are first subjected to a low temperature ozone treatment to form a surface sacrificial oxide, followed by a HF etching process to partially remove the oxide. TEM investigation demonstrates that a clean SiNW surface is achieved after the treatment, in contrast to untreated SiNWs that have Ag nanoparticles left on the surface from the metal-catalyzed etching process that is used to form the SiNWs. The cleaner SiNW surface achieved and the thin layer of residual SiO2 on the SiNWs have been found to improve the performance of the hybrid solar cells. Overall, the surface recombination of the hybrid SiNW solar cells is greatly suppressed, resulting in a remarkably improved open circuit voltage of 0.58 V. The power conversion efficiency has also increased from about 10% to 12.4%. The two-step surface treatment method is promising in enhancing the photovoltaic performance of the hybrid silicon solar cells, and can also be applied to other silicon nanostructure based solar cells.
- 3 February 2015
- Published by Royal Society of Chemistry (RSC) in Nanoscale
- Vol. 7 (10) , 4559-4565
High Efficiency Silicon Nanowire/organic Hybrid Solar Cell with Two-step Surface Treatment
A simple two-step surface treatment process is proposed to boost the efficiency of silicon nanowire/PEDOT:PSS hybrid solar cells. The Si nanowires (SiNWs) are first subjected to a low temperature ozone treatment to form a surface sacrificial oxide, followed by a HF etching process to partially remove the oxide. TEM investigation demonstrates that a clean SiNW surface is achieved after the treatment, in contrast to untreated SiNWs that have Ag nanoparticles left on the surface from the metal-catalyzed etching process that is used to form the SiNWs. The cleaner SiNW surface achieved and the thin layer of residual SiO2 on the SiNWs have been found to improve the performance of the hybrid solar cells. Overall, the surface recombination of the hybrid SiNW solar cells is greatly suppressed, resulting in a remarkably improved open circuit voltage of 0.58 V. The power conversion efficiency has also increased from about 10% to 12.4%. The two-step surface treatment method is promising in enhancing the photovoltaic performance of the hybrid silicon solar cells, and can also be applied to other silicon nanostructure based solar cells.
- 12 August 2013
- Published by IOP Publishing in Nanotechnology
- Vol. 24 (35) , 355301
Design guideline of Si nanohole/PEDOT:PSS hybrid structure for solar cell application
The finite element method is used to simulate light absorption in periodic hybrid Si nanohole (SiNH)/PEDOT:PSS arrays. The structural periodicity (P) and hole diameter (D) of the hybrid SiNH structure are varied to maximize light absorption. In terms of the solar cell performance under the AM1.5G spectrum, the highest ultimate efficiency achieved is 30.5%, when the D/P ratio is 0.8 and P is 600 nm. We have successfully fabricated the SiNH structure based on a low cost electroless chemical etching approach using a silver catalyst. The SiNH diameters formed vary from ∼200 to 300 nm, with periodicities from ∼300 to 1000 nm. The SiNH structure reveals a low average reflectance of 4% for incident light in the range 300 to 1100 nm.
- 12 August 2013
- Published by IOP Publishing in Nanotechnology
- Vol. 24 (35) , 355301
Design guideline of Si nanohole/PEDOT:PSS hybrid structure for solar cell application
The finite element method is used to simulate light absorption in periodic hybrid Si nanohole (SiNH)/PEDOT:PSS arrays. The structural periodicity (P) and hole diameter (D) of the hybrid SiNH structure are varied to maximize light absorption. In terms of the solar cell performance under the AM1.5G spectrum, the highest ultimate efficiency achieved is 30.5%, when the D/P ratio is 0.8 and P is 600 nm. We have successfully fabricated the SiNH structure based on a low cost electroless chemical etching approach using a silver catalyst. The SiNH diameters formed vary from ∼200 to 300 nm, with periodicities from ∼300 to 1000 nm. The SiNH structure reveals a low average reflectance of 4% for incident light in the range 300 to 1100 nm.
High‐Efficiency Si/Polymer Hybrid Solar Cells Based on Synergistic Surface Texturing of Si Nanowires on Pyramids
An efficient Si/PEDOT:PSS hybrid solar cell using synergistic surface texturing of Si nanowires (SiNWs) on pyramids is demonstrated. A power conversion efficiency (PCE) of 9.9% is achieved from the cells using the SiNW/pyramid binary structure, which is much higher than similar cells based on planar Si, pyramid-textured Si, and SiNWs. The PCE is the highest reported to-date for hybrid cells based on Si nanostructures and PEDOT.
High‐Efficiency Si/Polymer Hybrid Solar Cells Based on Synergistic Surface Texturing of Si Nanowires on Pyramids
An efficient Si/PEDOT:PSS hybrid solar cell using synergistic surface texturing of Si nanowires (SiNWs) on pyramids is demonstrated. A power conversion efficiency (PCE) of 9.9% is achieved from the cells using the SiNW/pyramid binary structure, which is much higher than similar cells based on planar Si, pyramid-textured Si, and SiNWs. The PCE is the highest reported to-date for hybrid cells based on Si nanostructures and PEDOT.
- 11 July 2011
- Published by AIP Publishing in Applied Physics Letters
- Vol. 99 (2) , 021104
Highly efficient Si-nanorods/organic hybrid core-sheath heterojunction solar cells
We report a hybrid solar cell based on well-aligned crystalline silicon nanorods (SiNRs) and an organic semiconductor, 2,2′,7,7′-Tetrakis-(N,N-di-4-methoxyphenylamino)-9,9′-spirobifluorene (Spiro-OMeTAD), in a core-sheath heterojunction structure. The device is formed by spin coating Spiro-OMeTAD on SiNRs array fabricated by electroless chemical etching. A silver grid on a conductive poly (3,4-ethylene-dioxythiophene): polystyrenesulfonate layer is used as the top transparent anode. A power conversion efficiency of 10.3% has been obtained for a 1-cm2 cell with 0.35-µm long SiNRs. The high efficiency and simple solution process used suggest that such devices are promising for developing low cost and high efficiency SiNRs/organic solar cells.
- 11 July 2011
- Published by AIP Publishing in Applied Physics Letters
- Vol. 99 (2) , 021104
Highly efficient Si-nanorods/organic hybrid core-sheath heterojunction solar cells
We report a hybrid solar cell based on well-aligned crystalline silicon nanorods (SiNRs) and an organic semiconductor, 2,2′,7,7′-Tetrakis-(N,N-di-4-methoxyphenylamino)-9,9′-spirobifluorene (Spiro-OMeTAD), in a core-sheath heterojunction structure. The device is formed by spin coating Spiro-OMeTAD on SiNRs array fabricated by electroless chemical etching. A silver grid on a conductive poly (3,4-ethylene-dioxythiophene): polystyrenesulfonate layer is used as the top transparent anode. A power conversion efficiency of 10.3% has been obtained for a 1-cm2 cell with 0.35-µm long SiNRs. The high efficiency and simple solution process used suggest that such devices are promising for developing low cost and high efficiency SiNRs/organic solar cells.
- 8 March 2011
- Published by Optica Publishing Group in Optics Express
- Vol. 19 (6) , 5464-5469
Electrical characteristics and photocurrent spectral response of Si nanowires p-i-n junctions
P-i-n junctions were fabricated along Si nanowires (SiNWs) via the conventional top-down approach using optical lithography. Each device comprises 500 identical SiNWs connected in parallel, and each SiNW has triangular cross-section with dimensions of ~6 nm (base) by ~8 nm (height). The photodiodes exhibit very good rectifying electrical characteristics with a low reverse bias current of ~0.2 fA per SiNW. The photocurrent spectral response exhibits three peaks between 400 nm to 700 nm, which arise due to local optical field enhancement associated with diffraction by the periodic SiNW array and interference in an air/SiO2/Si cavity.
- 8 March 2011
- Published by Optica Publishing Group in Optics Express
- Vol. 19 (6) , 5464-5469
Electrical characteristics and photocurrent spectral response of Si nanowires p-i-n junctions
P-i-n junctions were fabricated along Si nanowires (SiNWs) via the conventional top-down approach using optical lithography. Each device comprises 500 identical SiNWs connected in parallel, and each SiNW has triangular cross-section with dimensions of ~6 nm (base) by ~8 nm (height). The photodiodes exhibit very good rectifying electrical characteristics with a low reverse bias current of ~0.2 fA per SiNW. The photocurrent spectral response exhibits three peaks between 400 nm to 700 nm, which arise due to local optical field enhancement associated with diffraction by the periodic SiNW array and interference in an air/SiO2/Si cavity.
- 8 June 2009
- Published by AIP Publishing in Applied Physics Letters
- Vol. 94 (23) , 233505
Breakdown phenomena of Al-based high-k dielectric/SiO2 stack on 4H-SiC
In this report we present the breakdown phenomena of Al-based high- dielectrics and thermal intermediate layer stack on . The Al-based dielectrics, namely, sputter deposited aluminum nitride and hydrogenated aluminum nitride , have been used to form metal-insulator-semiconductor (MIS) capacitors and field-plate terminated Schottky barrier diodes (SBDs) on . Multistep breakdown modes visible on these devices have been investigated using measurements of dielectric relaxation currents on MIS capacitors.- 8 June 2009
- Published by AIP Publishing in Applied Physics Letters
- Vol. 94 (23) , 233505
Breakdown phenomena of Al-based high-k dielectric/SiO2 stack on 4H-SiC
In this report we present the breakdown phenomena of Al-based high- dielectrics and thermal intermediate layer stack on . The Al-based dielectrics, namely, sputter deposited aluminum nitride and hydrogenated aluminum nitride , have been used to form metal-insulator-semiconductor (MIS) capacitors and field-plate terminated Schottky barrier diodes (SBDs) on . Multistep breakdown modes visible on these devices have been investigated using measurements of dielectric relaxation currents on MIS capacitors.- 28 February 2009
- Published by Elsevier in Solid-State Electronics
- Vol. 53 (2) , 204-210
Passivation of 4H–SiC Schottky barrier diodes using aluminum based dielectrics
- 28 February 2009
- Published by Elsevier in Solid-State Electronics
- Vol. 53 (2) , 204-210
Passivation of 4H–SiC Schottky barrier diodes using aluminum based dielectrics
- 31 March 2006
- Published by Elsevier in Solid-State Electronics
- Vol. 50 (3) , 384-387
DC characterization of 4H-SiC depletion mode MOS field effect transistor
- 31 March 2006
- Published by Elsevier in Solid-State Electronics
- Vol. 50 (3) , 384-387
DC characterization of 4H-SiC depletion mode MOS field effect transistor
- 31 January 2006
- Published by Elsevier in Microelectronic Engineering
- Vol. 83 (1)
Preface