UZUwe Detlef Zeitner

Uwe Detlef Zeitner

*This is an algorithmically generated author record based on publicly available information.

Current Organizations / Institutes

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Previous Organizations / Institutes

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Uwe Detlef Zeitner has a total of 110 co-authors. Here are the top co-authors by number of shared publications:


Latest Publications

  • Open Access

    Long-lived hot and dense plasma from relativistic laser–nanowire array interaction

    by Ehsan Eftekhari-Zadeh, Mikhail Gyrdymov, Parysatis Tavana, Robert Loetzsch, Ingo Uschmann, Thomas Siefke, Thomas Käsebier, Uwe Zeitner, Adriana Szeghalmi, Alexander Pukhov, et al.

    Long-lived hot and dense plasmas generated by ultra-intense laser beams are of critical importance for laser-driven nuclear physics, bright hard X-ray sources, and laboratory astrophysics. We report the experimental observation of plasmas with nanosecond-scale lifetimes, near-solid density, and keV-level temperatures, produced by irradiating periodic arrays of composite nanowires with ultra-high-contrast relativistically intense femtosecond laser pulses. Jet-like plasma structures extending up to 1 mm from the nanowire surface were observed, emitting K-shell radiation from He-like Ti20+ ions. High-resolution X-ray spectra have been analyzed using 3D particle-in-cell (PIC) simulations of the laser–plasma interaction combined with collisional–radiative modeling (FLYCHK). The results indicate that the jets consist of plasma with densities of 1020–1022 cm−3 and keV-scale temperatures, persisting for several nanoseconds. We attribute the formation of these jets to the generation of kilotesla-scale global magnetic fields during the laser interaction, as predicted by PIC simulations. These fields may drive long-timescale current instabilities that sustain magnetic fields of several hundred tesla, sufficient to confine hot, dense plasma over nanosecond durations.

  • Open Access

    Ultrashallow EUV and Soft X‐Ray Gratings Fabricated by Broad‐Beam Nitrogen Ion Irradiation

    by Johannes Kaufmann, Thomas Siefke, Uwe Zeitner

    Controlled and precise fabrication of structures with heights in the range of single‐digit nanometers is one of the challenges for diffraction gratings operating near‐normal incidence in the extreme ultraviolet (EUV) and soft X‐ray range. Here, we expand on previous research utilizing swelling of silicon after irradiation with ions as an alternative to conventional dry etching. By irradiating silicon through a mask with a broad beam of nitrogen ions, we realized lamellar gratings in a precise and well‐controlled process. We were able to fabricate gratings with structure heights between 1.00 ± 0.05 and 10 ± 0.5 nm and a pitch of 1 µm, which is suitable for both EUV and soft X‐ray applications. A variation of ion energy from 20 to 40 keV further expands the foundations of this process and yields an additional parameter to control the resulting structure height and shape.

  • Open Access

    In situ current measurement in a compact broad ion source for helium and other ions

    by Johannes Kaufmann, Felix Otto, Thomas Siefke, Uwe Zeitner


  • Open Access

    Second harmonic generation in periodic metal–insulator–metal nanoparticle arrays

    by Sebastian Beer, Jeetendra Gour, Umair A. Mir, Alessandro Alberucci, Thomas Siefke, Uwe D. Zeitner, Stefan Nolte

    We investigate second harmonic generation from vertically stacked metal–insulator–metal nanobars arranged in a two-dimensional rectangular array. At specific angles of incidence, the nonlinear emission is maximized due to the near-field enhancement associated with the surface lattice resonance from the periodic arrangement, regardless of the number of insulator layers embedded in each nanoantenna. Intuitively, stacking should increase second harmonic generation with the number of metal layers. In fact, the maximum emission was reached at the highest stacking, but experimental results also indicate a far more complex relation between the individual layers. Due to the small vertical distance between the metallic layers, the fields in each nanogap are strongly coupled, leading to the generation of gap-plasmons and magnetic modes.


  • Open Access

    Fabrication of shallow EUV gratings on silicon by irradiation with helium ions

    by J Kaufmann, R Ciesielski, K Freiberg, M Walther, A Fernández Herrero, S Lippmann, V Soltwisch, T Siefke, U Zeitner

    To accurately achieve structure height differences in the range of single digit nanometres is of great importance for the fabrication of diffraction gratings for the extreme ultraviolet range (EUV). Here, structuring of silicon irradiated through a mask by a broad beam of helium ions with an energy of 30 keV was investigated as an alternative to conventional etching, which offers only limited controllability for shallow structures due to the higher rate of material removal. Utilising a broad ion beam allows for quick and cost effective fabrication. Ion fluence of the irradiations was varied in the range of 1016 ... 1017 ions · cm-2. This enabled a fine tuning of structure height in the range of 1.00 ± 0.05 to 20 ± 1 nm, which is suitable for shallow gratings used in EUV applications. According to transmission electron microscopy investigations the observed structure shape is attributed to the formation of point defects and bubbles/cavities within the silicon. Diffraction capabilities of fabricated elements are experimentally shown at the SX700 beamline of BESSY II. Rigorous Maxwell solver simulation based on the finite-element method and rigorous coupled wave analysis are utilised to describe the experimental obtained diffraction pattern.


  • Open Access

    Wafer‐scale nanofabrication of sub‐5 nm gaps in plasmonic metasurfaces

    by Jeetendra Gour, Sebastian Beer, Pallabi Paul, Alessandro Alberucci, Michael Steinert, Adriana Szeghalmi, Thomas Siefke, Ulf Peschel, Stefan Nolte, Uwe Detlef Zeitner

    In the rapidly evolving field of plasmonic metasurfaces, achieving homogeneous, reliable, and reproducible fabrication of sub‐5 nm dielectric nanogaps is a significant challenge. This article presents an advanced fabrication technology that addresses this issue, capable of realizing uniform and reliable vertical nanogap metasurfaces on a whole wafer of 100 mm diameter. By leveraging fast patterning techniques, such as variable‐shaped and character projection electron beam lithography (EBL), along with atomic layer deposition (ALD) for defining a few nanometer gaps with sub‐nanometer precision, we have developed a flexible nanofabrication technology to achieve gaps as narrow as 2 nm in plasmonic nanoantennas. The quality of our structures is experimentally demonstrated by the observation of resonant localized and collective modes corresponding to the lattice, with Q‐factors reaching up to 165. Our technological process opens up new and exciting opportunities to fabricate macroscopic devices harnessing the strong enhancement of light–matter interaction at the single nanometer scale.


  • Open Access

    Potential of E-beam lithography for micro- and nano-optics fabrication on large areas

    by Uwe D. Zeitner, Michael Banasch, Marcus Trost

    Micro-structured optics experienced a first peak in the mid-1990s, when numerous attempts to realize optical functions based on diffractive structures were made.1 However, at that time, diffractive optics were not able to fulfill many of the high-flying expectations. Nevertheless, since then, substantial improvements of the fabrication technologies specifically dedicated to the realization of optical micro- and nano-structures have brought such elements into a multitude of applications.2 – 7 A particularly topical area of research in this context is the field of optical meta-materials as they offer access to novel optical functionalities by nano-patterning.8


  • Open Access

    Measurement of the bonding energy via non-planar direct bonding

    by Pascal Birckigt, Carolin Rothhardt, Gerd Harnisch, Stefan Risse, Uwe D. Zeitner

    An accurate measurement of the bonding energy of an interface is important in many areas of applied research. We present a novel method for measuring the bonding energy, which is based on the principle of non-planar direct bonding, i.e., direct bonding of originally planar wafers onto non-planar substrates. We discuss in detail the advantages and disadvantages compared to the commonly used double cantilever beam method. To demonstrate the practical relevance, by using the example of glass wafers, the evolution of the bonding energy during different de-bonding steps is investigated, focusing on how the surface shape variations and the surface roughness affects water stress corrosion. We find that the bonding energy in the corroded state is not affected by the original surface shape variations and mid-spatial frequency range roughness, anymore. A molecular mechanism to explain this phenomenon is proposed.


  • Tailoring nanowire lasing modes via coupling to metal gratings

    by F. Vitale, D. Repp, T. Siefke, U. Zeitner, U. Peschel, T. Pertsch, C. Ronning

    Tailoring the emission of plasmonic nanowire-based lasers represents one of the major challenges in the field of nanoplasmonics, given the envisaged integration of such devices into on-chip all-optical circuits. In this study, we proposed a mode selection scheme based on distributed feedback, achieved via the external coupling of single zinc oxide nanowires to an aluminum grating, which enabled a quasi-single mode lasing action. The nano-manipulation of a single nanowire allowed for a reliable comparison of lasing emission characteristics in both planar (i.e., a nanowire on the metallic substrate) and on-grating configurations. We found that, by varying the orientation of the nanowire on the grating, only when the nano-cavity was perpendicular to the ridge direction, an additional peak emerged in the emission spectrum on the low-energy side of the gain envelope. As a consequence of the fulfillment of the Bragg condition, such a peak was attributed to a hybrid mode dominating the mode competition. Simulation results showed that the hybrid mode could be efficiently waveguided along the nanowire cavity and supported by localized plasmon polaritons building up at the raised features (“fences”) on top of metal grating ridges. Moreover, the hybrid mode was found to experience an extra reflectance of nearly 50% across the grating periods in addition to that provided by nanowire end facets.


  • Open Access

    Second harmonic generation under doubly resonant lattice plasmon excitation

    by Sebastian Beer, Jeetendra Gour, Alessandro Alberucci, Christin David, Stefan Nolte, Uwe D. Zeitner

    Second harmonic generation is enhanced at the surface lattice resonance in plasmonic nanoparticle arrays. We carried out a parametric investigation on two-dimensional lattices composed of gold nanobars where the centrosymmetry is broken at oblique incidence. We study the influence of the periodicity, the incidence angle and the direction of the linear input polarization on the second harmonic generation. Excitation of the surface lattice resonance either at the fundamental or second harmonic wavelength, achieved by varying the incidence angle, enhance the conversion efficiency. As a special case, we demonstrate that both the wavelengths can be simultaneously in resonance for a specific period of the lattice. In this double resonant case, maximum second harmonic power is achieved.