L. L. Zheng
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
L. L. Zheng has a total of 16 co-authors. Here are the top co-authors by number of shared publications:
B. Mackintosh
RWE Schott Solar, Inc., Billerica, MA 01821, USA
1 shared publicationB. Yang
State University of New York at Stony Brook, Stony Brook, NY
1 shared publication- Bo Yang
State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
1 shared publication D. O. Welch
Brookhaven National Laboratory
1 shared publicationD. Yates
RWE Schott Solar, Inc., Billerica, MA 01821, USA
1 shared publicationD.J Larson Jr
State University of New York at Stony Brook, Stony Brook, NY 11794-2300, USA
1 shared publication
Latest Publications
- 11 September 2007
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 27 (6) , 717-736
Toward the Achievement of Substrate Melting and Controlled Solidification in Thermal Spraying
- 11 September 2007
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 27 (6) , 717-736
Toward the Achievement of Substrate Melting and Controlled Solidification in Thermal Spraying
- 23 December 2006
- Published by Elsevier in Journal of Crystal Growth
- Vol. 299 (2) , 404-412
A modified HEM system for optical crystal growth with high melting temperature
- 23 December 2006
- Published by Elsevier in Journal of Crystal Growth
- Vol. 299 (2) , 404-412
A modified HEM system for optical crystal growth with high melting temperature
- 21 July 2006
- Published by Elsevier in Journal of Crystal Growth
- Vol. 293 (2) , 509-516
Meniscus dynamics and melt solidification in the EFG silicon tube growth process
- 21 July 2006
- Published by Elsevier in Journal of Crystal Growth
- Vol. 293 (2) , 509-516
Meniscus dynamics and melt solidification in the EFG silicon tube growth process
- 1 February 2006
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 26 (1) , 53-72
A Critical Assessment of Particle Temperature Distributions During Plasma Spraying: Numerical Studies for YSZ
- 1 February 2006
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 26 (1) , 53-72
A Critical Assessment of Particle Temperature Distributions During Plasma Spraying: Numerical Studies for YSZ
- 1 January 2005
- Published by ASME International
- p. 333-344
Thermal and Dynamics Analysis of Meniscus-Controlled Materials Processing
Fundamental physical processes involved in meniscus-controlled materials processing include meniscus formation and dynamics, movement of solidification interface, and the interaction at the crystal-liquid-vapor tri-junction. Final product shape that can be grown by different techniques depends on the meniscus shape, heat transfer and solidification interface. The fluid flow and heat transfer in the melt and dynamics of meniscus are critical for determining the stable growth conditions for better quality of the grown crystals. In this paper, a theoretical thermal and dynamic model have been developed to describe the heat transfer and dynamics of meniscus and its interaction with solidification. A simplified form of the model will also be developed to allow the investigation of ribbon (or tube) growth that exhibits one-dimensional feature in the most regions. This model will be used to conduct parametric study, and the important process and geometry conditions will be investigated such as the crystal dimension, die-top height, pull rate, and die-top temperature. The dynamic response of meniscus to the potential perturbations during growth such as pull rate and die-top temperature variations, and misalignment between the die and silicon tube will be investigated extensively. From this study, an operating window for stable meniscus will be obtained, and growth procedure that leads to improving the grown crystal quality will be identified.
- 1 January 2005
- Published by ASME International
- p. 333-344
Thermal and Dynamics Analysis of Meniscus-Controlled Materials Processing
Fundamental physical processes involved in meniscus-controlled materials processing include meniscus formation and dynamics, movement of solidification interface, and the interaction at the crystal-liquid-vapor tri-junction. Final product shape that can be grown by different techniques depends on the meniscus shape, heat transfer and solidification interface. The fluid flow and heat transfer in the melt and dynamics of meniscus are critical for determining the stable growth conditions for better quality of the grown crystals. In this paper, a theoretical thermal and dynamic model have been developed to describe the heat transfer and dynamics of meniscus and its interaction with solidification. A simplified form of the model will also be developed to allow the investigation of ribbon (or tube) growth that exhibits one-dimensional feature in the most regions. This model will be used to conduct parametric study, and the important process and geometry conditions will be investigated such as the crystal dimension, die-top height, pull rate, and die-top temperature. The dynamic response of meniscus to the potential perturbations during growth such as pull rate and die-top temperature variations, and misalignment between the die and silicon tube will be investigated extensively. From this study, an operating window for stable meniscus will be obtained, and growth procedure that leads to improving the grown crystal quality will be identified.
- 15 January 2000
- Published by Elsevier in Journal of Crystal Growth
- Vol. 209 (1) , 110-121
Revised form of Jackson–Hunt theory: application to directional solidification of MnBi/Bi eutectics
- 15 January 2000
- Published by Elsevier in Journal of Crystal Growth
- Vol. 209 (1) , 110-121
Revised form of Jackson–Hunt theory: application to directional solidification of MnBi/Bi eutectics