A. S. Zuruzi
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Previous Organizations / Institutes
The organizations / institutes from the scholar's other articles in the past ten years
A. S. Zuruzi has a total of 7 co-authors. Here are the top co-authors by number of shared publications:
S. K. Lahiri
Institute of Materials Research and Engineering
2 shared publicationsC.-H. Chiu
Institute of Materials Research and Engineering, 10 Kent Ridge Crescent, Singapore 119 260
1 shared publicationD. M. DeRosa
Biosystems Engineering Department, Biochemistry and Molecular Biophysics Department, The University of Arizona, Tucson, AZ 85721, USA
1 shared publicationK. N. Tu
Department of Materials Science and Engineering, UCLA, Los Angeles, California 90095
1 shared publicationK. S. Siow
Infineon Technologies (Asia Pacific)
1 shared publicationN. C. MacDonald
Materials Department, and Mechanical and Environmental Engineering Department, University of California, Santa Barbara, CA 93106, USA
1 shared publication
Latest Publications
- 13 February 2006
- Published by Wiley in Advanced Engineering Materials
- Vol. 8 (1-2) , 77-80
Formation of Nanostructured Titania: Effect of Thickness on Oxidation Kinetics of Titanium Thin Films in Aqueous Hydrogen Peroxide
The oxidation kinetics of Ti films in aqueous hydrogen peroxide was investigated. Oxidation of Ti films is dependent on both film thickness and average grain size. Films of thickness 50 nm or less exhibit Stage I oxidation while thicker films exhibit both Stages I and II. The difference in oxidation rates and dependencies on grain size observed in these two stages are attributed to different mechanisms controlling oxide growth.
- 13 February 2006
- Published by Wiley in Advanced Engineering Materials
- Vol. 8 (1-2) , 77-80
Formation of Nanostructured Titania: Effect of Thickness on Oxidation Kinetics of Titanium Thin Films in Aqueous Hydrogen Peroxide
The oxidation kinetics of Ti films in aqueous hydrogen peroxide was investigated. Oxidation of Ti films is dependent on both film thickness and average grain size. Films of thickness 50 nm or less exhibit Stage I oxidation while thicker films exhibit both Stages I and II. The difference in oxidation rates and dependencies on grain size observed in these two stages are attributed to different mechanisms controlling oxide growth.
- 1 August 2001
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 30 (8) , 997-1000
Correlation between intermetallic thickness and roughness during solder reflow
- 1 August 2001
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 30 (8) , 997-1000
Correlation between intermetallic thickness and roughness during solder reflow
- 19 October 1999
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 86 (9) , 4916-4921
Roughness evolution of Cu6Sn5 intermetallic during soldering
The roughness evolution of the intermetallic compound during the soldering reaction of 40/60% (by wt %) PbSn solder on Cu and its effects on wettability were studied due to their importance in the reworking of microelectronic components. The roughness parameters investigated were and the ratio, where is the root mean square roughness and is the average distance between asperities. It was found that increased with soldering time for the range of soldering times studied. The evolution of was found to follow a parabolic relation with soldering time—which is similar to that observed for the intermetallic thickness. However, the ratio was found to increase very gradually for the range of soldering times investigated. From the ratio obtained, the average inclination of the intermetallic morphology was calculated. The average inclination of the intermetallic morphology was found to be greater than the apparent contact angle observed during the wetting of the 40/60% PbSn solder on Cu substrates. This inconsistency was attributed to the difference in the roughness of the intermetallic in the inner regions and at the reaction band at the edge of the solder cap.- 19 October 1999
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 86 (9) , 4916-4921
Roughness evolution of Cu6Sn5 intermetallic during soldering
The roughness evolution of the intermetallic compound during the soldering reaction of 40/60% (by wt %) PbSn solder on Cu and its effects on wettability were studied due to their importance in the reworking of microelectronic components. The roughness parameters investigated were and the ratio, where is the root mean square roughness and is the average distance between asperities. It was found that increased with soldering time for the range of soldering times studied. The evolution of was found to follow a parabolic relation with soldering time—which is similar to that observed for the intermetallic thickness. However, the ratio was found to increase very gradually for the range of soldering times investigated. From the ratio obtained, the average inclination of the intermetallic morphology was calculated. The average inclination of the intermetallic morphology was found to be greater than the apparent contact angle observed during the wetting of the 40/60% PbSn solder on Cu substrates. This inconsistency was attributed to the difference in the roughness of the intermetallic in the inner regions and at the reaction band at the edge of the solder cap.