Sebastien Jiguet
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
Sebastien Jiguet has a total of 12 co-authors. Here are the top co-authors by number of shared publications:
- Arnaud Bertsch
Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne (EPFL), 1015 Lausanne, Switzerland
3 shared publications H. Hofmann
École Polytechnique Fédérale de Lausanne, EPFL‐STI‐IMX‐LTP, CH‐1015 Lausanne, Switzerland
2 shared publications- Christophe Moser
Laboratory of Applied Photonics Devices, School of Engineering, École Polytechnique Fédérale de Lausanne, CH-1015, Lausanne, Switzerland
1 shared publication - Diego Armando Sandoval Salaiza
Laboratory of Applied Photonics Devices, Ecole Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland
1 shared publication - Jorge Madrid-Wolff
Laboratory of Applied Photonics Devices, Ecole Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland
1 shared publication - Juergen Brugger
École Polytechnique Fédérale de Lausanne (EPFL)
1 shared publication
Latest Publications
- Open Access
Electrowriting of SU-8 Microfibers
As microfiber-based additive manufacturing (AM) technologies, melt electrowriting (MEW) and solution electrowriting (SEW) have demonstrated efficacy with more biomedically relevant materials. By processing SU-8 resin using MEW and SEW techniques, a material with substantially different mechanical, thermal, and optical properties than that typically processed is introduced. SU-8 polymer is temperature sensitive and requires the devising of a specific heating protocol to be properly processed. Smooth-surfaced microfibers resulted from MEW of SU8 for a short period (from 30 to 90 min), which provides the greatest control and, thus, reproducibility of the printed microfibers. This investigation explores various parameters influencing the electrowriting process, printing conditions, and post-processing to optimize the fabrication of intricate 3D structures. This work demonstrates the controlled generation of straight filaments and complex multi-layered architectures, which were characterized by brightfield, darkfield, and scanning electron microscopy (SEM). This research opens new avenues for the design and development of 3D-printed photonic systems by leveraging the properties of SU-8 after both MEW and SEW processing.
Open AccessElectrowriting of SU-8 Microfibers
As microfiber-based additive manufacturing (AM) technologies, melt electrowriting (MEW) and solution electrowriting (SEW) have demonstrated efficacy with more biomedically relevant materials. By processing SU-8 resin using MEW and SEW techniques, a material with substantially different mechanical, thermal, and optical properties than that typically processed is introduced. SU-8 polymer is temperature sensitive and requires the devising of a specific heating protocol to be properly processed. Smooth-surfaced microfibers resulted from MEW of SU8 for a short period (from 30 to 90 min), which provides the greatest control and, thus, reproducibility of the printed microfibers. This investigation explores various parameters influencing the electrowriting process, printing conditions, and post-processing to optimize the fabrication of intricate 3D structures. This work demonstrates the controlled generation of straight filaments and complex multi-layered architectures, which were characterized by brightfield, darkfield, and scanning electron microscopy (SEM). This research opens new avenues for the design and development of 3D-printed photonic systems by leveraging the properties of SU-8 after both MEW and SEW processing.
- 29 July 2005
- Published by Wiley in Advanced Functional Materials
- Vol. 15 (9) , 1511-1516
Conductive SU8 Photoresist for Microfabrication
A conductive composite photoresist has been developed for the direct photopatterning of electrodes. It is based on a dispersion of silver nanoparticles in SU8, a non‐conductive, negative‐tone photoresist. Manufactured structures have an electrical conductivity at a low silver content of around 6 vol.‐%.
- 29 July 2005
- Published by Wiley in Advanced Functional Materials
- Vol. 15 (9) , 1511-1516
Conductive SU8 Photoresist for Microfabrication
A conductive composite photoresist has been developed for the direct photopatterning of electrodes. It is based on a dispersion of silver nanoparticles in SU8, a non‐conductive, negative‐tone photoresist. Manufactured structures have an electrical conductivity at a low silver content of around 6 vol.‐%.
- 8 September 2004
- Published by Wiley in Advanced Engineering Materials
- Vol. 6 (9) , 719-724
SU8‐Silver Photosensitive Nanocomposite
A photosensitive composite resist having electrical properties has been developed for the direct photopatterning of electrically conductive microcomponents. This composite material is based on the dispersion of silver nanoparticles into the SU‐8 photopolymer, an insulating negative‐tone photoresist. Electrical and optical characterizations reveal a wide range of electrical conductivity of the composite structures depending of the filler load, and a lateral resolution better than 5 μm.
- 8 September 2004
- Published by Wiley in Advanced Engineering Materials
- Vol. 6 (9) , 719-724
SU8‐Silver Photosensitive Nanocomposite
A photosensitive composite resist having electrical properties has been developed for the direct photopatterning of electrically conductive microcomponents. This composite material is based on the dispersion of silver nanoparticles into the SU‐8 photopolymer, an insulating negative‐tone photoresist. Electrical and optical characterizations reveal a wide range of electrical conductivity of the composite structures depending of the filler load, and a lateral resolution better than 5 μm.