Kentaro Kawai
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Previous Organizations / Institutes
The organizations / institutes from the scholar's other articles in the past ten years
Research Subjects
Research Interests
Kentaro Kawai has a total of 111 co-authors. Here are the top co-authors by number of shared publications:
- Kenta Arima
Department of Precision Engineering, Graduate School of Engineering, The University of Osaka, 2-1, Yamada-oka, Suita, Osaka 565-0871, Japan
22 shared publications Mizuho Morita
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
12 shared publicationsShuichi Shoji
Waseda University
12 shared publicationsJunichi Uchikoshi
8 shared publicationsOsamu Tabata
Nano/Micro Engineering Lab., Kyoto University
5 shared publications- Yoshikazu Hirai
Kyoto University
5 shared publications
Latest Publications
- 3 May 2023
- Published by Wiley in Chemnanomat
- Vol. 9 (5)
Modulation of Optical Properties by ZnSe Shell Thickness Control in InP/ZnSe/ZnS Quantum Dots Front Cover: (ChemNanoMat 5/2023)
- 3 May 2023
- Published by Wiley in Chemnanomat
- Vol. 9 (5)
Modulation of Optical Properties by ZnSe Shell Thickness Control in InP/ZnSe/ZnS Quantum Dots Front Cover: (ChemNanoMat 5/2023)
- 1 May 2023
- Published by Japan Institute of Electronics Packaging in Journal of The Japan Institute of Electronics Packaging
- Vol. 26 (3) , 266-274
Effect of Additive Element on Fatigue Properties of Sn-Sb-Ag High Temperature Lead-Free Solder
Sn-6.4Sb-3.9Ag (mass%)系はんだの高耐熱化を目指して高温疲労特性に対するNiまたはCu添加の影響を調査した。Sn-6.4Sb-3.9AgにNiおよびCuを添加することで,大傾角粒界を有する結晶粒が生成し,結晶粒の数が増加した。微量元素の添加による引張特性の劣化は見られなかった。疲労試験より,Ni添加材においては175°Cにおいて優れた疲労特性が確認され,特に0.4%Ni添加材が最も優れた特性を持つことが確認された。一方,Cu添加材については,2.0%Cu添加で175°Cにおける疲労特性が劣化した。EBSD解析結果から疲労特性の違いは疲労損傷挙動の違いによるものと考えられ,Ni添加および1.0%Cu添加材は連続動的再結晶を伴うのに対し,2.0%Cu添加材は動的回復による応力緩和に起因すると推察された。
- 1 May 2023
- Published by Japan Institute of Electronics Packaging in Journal of The Japan Institute of Electronics Packaging
- Vol. 26 (3) , 266-274
Effect of Additive Element on Fatigue Properties of Sn-Sb-Ag High Temperature Lead-Free Solder
Sn-6.4Sb-3.9Ag (mass%)系はんだの高耐熱化を目指して高温疲労特性に対するNiまたはCu添加の影響を調査した。Sn-6.4Sb-3.9AgにNiおよびCuを添加することで,大傾角粒界を有する結晶粒が生成し,結晶粒の数が増加した。微量元素の添加による引張特性の劣化は見られなかった。疲労試験より,Ni添加材においては175°Cにおいて優れた疲労特性が確認され,特に0.4%Ni添加材が最も優れた特性を持つことが確認された。一方,Cu添加材については,2.0%Cu添加で175°Cにおける疲労特性が劣化した。EBSD解析結果から疲労特性の違いは疲労損傷挙動の違いによるものと考えられ,Ni添加および1.0%Cu添加材は連続動的再結晶を伴うのに対し,2.0%Cu添加材は動的回復による応力緩和に起因すると推察された。
- Open Access
- 3 March 2023
- Published by Wiley in Chemnanomat
- Vol. 9 (5)
Controlling Thickness of ZnSe Intermediate Shell Narrows FWHM of Green‐Emitting Spectra of InP/ZnSe/ZnS Multi‐Shell Quantum Dots
Multi‐shell InP/ZnSe/ZnS quantum dots (QDs) are expected to be applied to next‐generation displays. While the effect of the thickness of the ZnSe intermediate shell on the properties of InP/ZnSe/ZnS QDs has been reported for red‐emission, there are few reports on green‐emitting ones. Here we show the effects of ZnSe thickness on full width at half maximum (FWHM) and photoluminescence quantum yield (PLQY) of the emission spectra of green‐emitting InP/ZnSe/ZnS QDs. The results revealed that the ZnSe intermediate shell of green‐emitting InP/ZnSe/ZnS QDs has an optimum thickness (1.2 nm in this study). Excessive or insufficient ZnSe intermediate shell broadened FWHM and decreased PLQY. This means that difference in the thickness of the ZnSe intermediate shell changes the band structure and the electron behavior. The ZnSe thickness is one of the dominant factors that determine the optical properties in green‐emitting InP/ZnSe/ZnS QDs.
- 3 March 2023
- Published by Wiley in Chemnanomat
- Vol. 9 (5)
Open AccessControlling Thickness of ZnSe Intermediate Shell Narrows FWHM of Green‐Emitting Spectra of InP/ZnSe/ZnS Multi‐Shell Quantum Dots
Multi‐shell InP/ZnSe/ZnS quantum dots (QDs) are expected to be applied to next‐generation displays. While the effect of the thickness of the ZnSe intermediate shell on the properties of InP/ZnSe/ZnS QDs has been reported for red‐emission, there are few reports on green‐emitting ones. Here we show the effects of ZnSe thickness on full width at half maximum (FWHM) and photoluminescence quantum yield (PLQY) of the emission spectra of green‐emitting InP/ZnSe/ZnS QDs. The results revealed that the ZnSe intermediate shell of green‐emitting InP/ZnSe/ZnS QDs has an optimum thickness (1.2 nm in this study). Excessive or insufficient ZnSe intermediate shell broadened FWHM and decreased PLQY. This means that difference in the thickness of the ZnSe intermediate shell changes the band structure and the electron behavior. The ZnSe thickness is one of the dominant factors that determine the optical properties in green‐emitting InP/ZnSe/ZnS QDs.
- 1 April 2022
- Published by The Electrochemical Society in ECS Journal of Solid State Science and Technology
- Vol. 11 (4) , 041001
Nanocarbon-Induced Etching Property of Semiconductor Surfaces: Testing Nanocarbon’s Catalytic Activity for Oxygen Reduction Reaction at a Single-Sheet Level
In the field of fuel cells, the microscopic understanding of the catalytic activity of nanocarbons or graphene-based materials for oxygen reduction reaction (ORR) is highly demanded. In the current study, a novel concept is presented to achieve it, which is a different approach from familiar electrochemical measurements. To prove this concept, we prepared two nanocarbon materials, whose ORR activities were tested and compared via macroscale cyclic and linear sweep voltammetry. Next, considering the electrochemical potential of ORR and the band-edge position of semiconductors, we chose single-crystalline Ge as the substrate on which the single-sheet nanocarbons were dispersed. We found that etched hollows formed under the loaded nanocarbons after immersing the nanocarbon/Ge sample into O 2 -containing water. The histogram analysis of the hollows represented the difference in catalytic activities to promote Ge etching between the used nanocarbons, and the corresponding trends agreed qualitatively with the electrochemical measurements.
- 1 April 2022
- Published by The Electrochemical Society in ECS Journal of Solid State Science and Technology
- Vol. 11 (4) , 041001
Nanocarbon-Induced Etching Property of Semiconductor Surfaces: Testing Nanocarbon’s Catalytic Activity for Oxygen Reduction Reaction at a Single-Sheet Level
In the field of fuel cells, the microscopic understanding of the catalytic activity of nanocarbons or graphene-based materials for oxygen reduction reaction (ORR) is highly demanded. In the current study, a novel concept is presented to achieve it, which is a different approach from familiar electrochemical measurements. To prove this concept, we prepared two nanocarbon materials, whose ORR activities were tested and compared via macroscale cyclic and linear sweep voltammetry. Next, considering the electrochemical potential of ORR and the band-edge position of semiconductors, we chose single-crystalline Ge as the substrate on which the single-sheet nanocarbons were dispersed. We found that etched hollows formed under the loaded nanocarbons after immersing the nanocarbon/Ge sample into O 2 -containing water. The histogram analysis of the hollows represented the difference in catalytic activities to promote Ge etching between the used nanocarbons, and the corresponding trends agreed qualitatively with the electrochemical measurements.
- 1 March 2022
- Published by Elsevier in Ceramics International
- Vol. 48 (6) , 7570-7583
Efficient and slurryless ultrasonic vibration assisted electrochemical mechanical polishing for 4H–SiC wafers
- 1 March 2022
- Published by Elsevier in Ceramics International
- Vol. 48 (6) , 7570-7583
Efficient and slurryless ultrasonic vibration assisted electrochemical mechanical polishing for 4H–SiC wafers
- 24 June 2021
- Published by American Physical Society (APS) in Physical Review B
- Vol. 103 (24) , 245433
Atomic-scale insights into the origin of rectangular lattice in nanographene probed by scanning tunneling microscopy
We conducted atomic-scale scanning tunneling microscopy of a graphene nanosheet on graphite. In addition to a rhombus lattice representing the superstructure, we resolved another quadrangle lattice similar to a rectangle in the sheet. Its lattice size was approximately . To clarify the origin of this unique rectangular lattice, the overlap of the superstructures along the direction of their long diagonals was theoretically examined using a simple model. The electron distribution with high energy in the occupied states of armchair-edged graphene nanoribbons (AGNRs) was calculated based on first principles. A rectangular lattice, resembling the one observed experimentally, was found to form on the AGNR under a specific width condition. This finding was also analyzed in terms of Clar's theory and the scattering of electron waves. We propose that wrinkles and adsorbates in graphene play a role similar to an armchair edge, resulting in the phase. If these local defects are in close proximity, the rhombus phases interact to generate electronic structures predicted for AGNRs. This is probably the reason why a rectangular lattice was imaged on the graphene sheet that is not an ideal AGNR.- 24 June 2021
- Published by American Physical Society (APS) in Physical Review B
- Vol. 103 (24) , 245433
Atomic-scale insights into the origin of rectangular lattice in nanographene probed by scanning tunneling microscopy
We conducted atomic-scale scanning tunneling microscopy of a graphene nanosheet on graphite. In addition to a rhombus lattice representing the superstructure, we resolved another quadrangle lattice similar to a rectangle in the sheet. Its lattice size was approximately . To clarify the origin of this unique rectangular lattice, the overlap of the superstructures along the direction of their long diagonals was theoretically examined using a simple model. The electron distribution with high energy in the occupied states of armchair-edged graphene nanoribbons (AGNRs) was calculated based on first principles. A rectangular lattice, resembling the one observed experimentally, was found to form on the AGNR under a specific width condition. This finding was also analyzed in terms of Clar's theory and the scattering of electron waves. We propose that wrinkles and adsorbates in graphene play a role similar to an armchair edge, resulting in the phase. If these local defects are in close proximity, the rhombus phases interact to generate electronic structures predicted for AGNRs. This is probably the reason why a rectangular lattice was imaged on the graphene sheet that is not an ideal AGNR.- 8 August 2019
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 126 (6) , 065301
Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation
A Si-face 4H-SiC surface was modified by plasma oxidation followed by HF etching. The resulting surface was covered with a carbon overlayer composed of C–C bonded clusters and Si–O–C bonding from Si4C4O4 and Si4C4−xO2 (x < 2), as evidenced by photoemission spectroscopy measurements and wetting properties. A trend was observed in which the thickness of the carbon overlayer was proportional to the SiO2 thickness after plasma oxidation, indicating that the former could be controlled on the subnanometer scale by adjusting plasma conditions. After a subsequent annealing under ultrahigh vacuum, we found that graphene grew on the modified SiC surface without the formation of a pitting morphology, which is in contrast to the case using an untreated SiC substrate. Raman spectroscopy revealed that the former graphene includes fewer defects than the latter graphene. We discuss the microscopic mechanism by which reaction products composed of C–C and Si–O–C bonds form in the SiO2 film near the SiO2/SiC interface via plasma oxidation as well as their influence on the subsequent growth of graphene.
- 8 August 2019
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 126 (6) , 065301
Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation
A Si-face 4H-SiC surface was modified by plasma oxidation followed by HF etching. The resulting surface was covered with a carbon overlayer composed of C–C bonded clusters and Si–O–C bonding from Si4C4O4 and Si4C4−xO2 (x < 2), as evidenced by photoemission spectroscopy measurements and wetting properties. A trend was observed in which the thickness of the carbon overlayer was proportional to the SiO2 thickness after plasma oxidation, indicating that the former could be controlled on the subnanometer scale by adjusting plasma conditions. After a subsequent annealing under ultrahigh vacuum, we found that graphene grew on the modified SiC surface without the formation of a pitting morphology, which is in contrast to the case using an untreated SiC substrate. Raman spectroscopy revealed that the former graphene includes fewer defects than the latter graphene. We discuss the microscopic mechanism by which reaction products composed of C–C and Si–O–C bonds form in the SiO2 film near the SiO2/SiC interface via plasma oxidation as well as their influence on the subsequent growth of graphene.
- 25 May 2018
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Nanotechnology
- Vol. 17 (4) , 727-730
Nanopore Fabrication of Two-Dimensional Materials on SiO2 Membranes Using He Ion Microscopy
Structures with pores several nanometers in diameter can be used for distinguishing nucleotides in DNA. A 2D material such as a thin membrane is expected to enhance precise molecule recognition. Here, we present the nanopore fabrication to thin 2D membranes using HIM (He ion microscopy). We transferred three 2D materials of CVD (chemical vapor deposition) graphene, CVD BN, and peel-off MoS$_{2}$, to the sub-micrometer pore of freestanding SiO$_{2}$ membranes on a silicon substrate. The number of atomic layers of the 2D materials was confirmed via Raman spectroscopy and XPS (X-ray Photoelectron Spectroscopy). We examined the reproducibility and accuracy of nanopore fabrication as a function of the focal position and beam irradiation intensity of the HIM system. Reproducible nanopores having diameters of less than 10 nm were realized by optimizing the intensity and focal position. We achieved 1.5-nm-diameter nanopores in a single layer of graphene using this HIM technique.
- 25 May 2018
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Nanotechnology
- Vol. 17 (4) , 727-730
Nanopore Fabrication of Two-Dimensional Materials on SiO2 Membranes Using He Ion Microscopy
Structures with pores several nanometers in diameter can be used for distinguishing nucleotides in DNA. A 2D material such as a thin membrane is expected to enhance precise molecule recognition. Here, we present the nanopore fabrication to thin 2D membranes using HIM (He ion microscopy). We transferred three 2D materials of CVD (chemical vapor deposition) graphene, CVD BN, and peel-off MoS$_{2}$, to the sub-micrometer pore of freestanding SiO$_{2}$ membranes on a silicon substrate. The number of atomic layers of the 2D materials was confirmed via Raman spectroscopy and XPS (X-ray Photoelectron Spectroscopy). We examined the reproducibility and accuracy of nanopore fabrication as a function of the focal position and beam irradiation intensity of the HIM system. Reproducible nanopores having diameters of less than 10 nm were realized by optimizing the intensity and focal position. We achieved 1.5-nm-diameter nanopores in a single layer of graphene using this HIM technique.
- Open Access
- 1 May 2018
- Published by Institute of Electrical Engineers of Japan (IEE Japan) in IEEJ Transactions on Sensors and Micromachines
- Vol. 138 (5) , 171-177
Revealing the Influential Factor on Dimerizing of Triangular DNA Origami by Linker
Toward large scale 2D-array of DNA origami which can be widely applicable to various applications, a dimer formation of triangular DNA origami connected by linker ssDNA was investigated. From the results of analysis and experiments, it was concluded that the dimerization is strongly influenced by the deformation of a side of a triangle.
- 1 May 2018
- Published by Institute of Electrical Engineers of Japan (IEE Japan) in IEEJ Transactions on Sensors and Micromachines
- Vol. 138 (5) , 171-177
Open AccessRevealing the Influential Factor on Dimerizing of Triangular DNA Origami by Linker
Toward large scale 2D-array of DNA origami which can be widely applicable to various applications, a dimer formation of triangular DNA origami connected by linker ssDNA was investigated. From the results of analysis and experiments, it was concluded that the dimerization is strongly influenced by the deformation of a side of a triangle.
- 1 May 2018
- Published by Elsevier in Electrochimica Acta
- Vol. 271, 666-676
Investigation of anodic oxidation mechanism of 4H-SiC (0001) for electrochemical mechanical polishing
- 1 May 2018
- Published by Elsevier in Electrochimica Acta
- Vol. 271, 666-676
Investigation of anodic oxidation mechanism of 4H-SiC (0001) for electrochemical mechanical polishing