Jia Yang
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Previous Organizations / Institutes
The organizations / institutes from the scholar's other articles in the past ten years
Jia Yang has a total of 21 co-authors. Here are the top co-authors by number of shared publications:
Elbara Ziade
Boston University 1 Department of Mechanical Engineering Boston, Massachusetts 02215, USA
5 shared publicationsAaron J. Schmidt
Boston University 1 Department of Mechanical Engineering Boston, Massachusetts 02215, USA
3 shared publications- Aaron J. Schmidt
Boston University 1 Department of Mechanical Engineering Boston, Massachusetts 02215, USA
3 shared publications Carlo Maragliano
Institute Center for Energy, Masdar Institute of Science and Technology 2 , Abu Dhabi, United Arab Emirates
2 shared publications- Denis Nothern
Boston University 2 Photonics Center Boston, Massachusetts 02215, USA
2 shared publications Theodore Moustakas
Boston University 2 Photonics Center Boston, Massachusetts 02215, USA
2 shared publications
Latest Publications
- 23 September 2017
- Published by Tsinghua University Press in Nano Research
- Vol. 11 (4) , 2173-2180
Enhanced thermal transport across monolayer MoS2
Characterizing the thermal properties of MoS2 is important for the design of electronic devices based on this material. We used frequency domain thermoreflectance to study the cross-plane thermal transport in mechanically exfoliated MoS2 samples supported on SiO2 and muscovite mica substrates. The thickness of MoS2 ranged between one and five layers, and the MoS2 layers were sandwiched between a metal layer and the substrate. In the case of mica, heat transport into the substrate remained the same whether or not a monolayer of MoS2 was present, whereas, for SiO2, heat transport was reduced by surface roughness. We observed a significant improvement in heat transport across monolayer MoS2 as compared to few layer MoS2. For MoS2 on SiO2, the effective thermal interface conductance was improved by more than three times if a monolayer was used. For MoS2 on mica, the thermal interface conductance was approximately two times better for monolayer MoS2. This implies that monolayer MoS2 has superior thermal properties and can be used in electronic devices as an intermediate layer between two materials. Additionally, we also report on the measurement of anisotropic thermal conductivity in bulk MoS2 and mica.
- 23 September 2017
- Published by Tsinghua University Press in Nano Research
- Vol. 11 (4) , 2173-2180
Enhanced thermal transport across monolayer MoS2
Characterizing the thermal properties of MoS2 is important for the design of electronic devices based on this material. We used frequency domain thermoreflectance to study the cross-plane thermal transport in mechanically exfoliated MoS2 samples supported on SiO2 and muscovite mica substrates. The thickness of MoS2 ranged between one and five layers, and the MoS2 layers were sandwiched between a metal layer and the substrate. In the case of mica, heat transport into the substrate remained the same whether or not a monolayer of MoS2 was present, whereas, for SiO2, heat transport was reduced by surface roughness. We observed a significant improvement in heat transport across monolayer MoS2 as compared to few layer MoS2. For MoS2 on SiO2, the effective thermal interface conductance was improved by more than three times if a monolayer was used. For MoS2 on mica, the thermal interface conductance was approximately two times better for monolayer MoS2. This implies that monolayer MoS2 has superior thermal properties and can be used in electronic devices as an intermediate layer between two materials. Additionally, we also report on the measurement of anisotropic thermal conductivity in bulk MoS2 and mica.
- 16 January 2017
- Published by AIP Publishing in Applied Physics Letters
- Vol. 110 (3) , 031903
Thickness dependent thermal conductivity of gallium nitride
As the size of gallium nitride (GaN) transistors is reduced in order to reach higher operating frequencies, heat dissipation becomes the critical bottleneck in device performance and longevity. Despite the importance of characterizing the physics governing the thermal transport in thin GaN films, the literature is far from conclusive. In this letter, we report measurements of thermal conductivity in a GaN film with thickness ranging from 15–1000 nm grown on 4H-SiC without a transition layer. Additionally, we measure the thermal conductivity in the GaN film when it is 1 μm-thick in the temperature range of 300 600 K and use a phonon transport model to explain the thermal conductivity in this film.- 16 January 2017
- Published by AIP Publishing in Applied Physics Letters
- Vol. 110 (3) , 031903
Thickness dependent thermal conductivity of gallium nitride
As the size of gallium nitride (GaN) transistors is reduced in order to reach higher operating frequencies, heat dissipation becomes the critical bottleneck in device performance and longevity. Despite the importance of characterizing the physics governing the thermal transport in thin GaN films, the literature is far from conclusive. In this letter, we report measurements of thermal conductivity in a GaN film with thickness ranging from 15–1000 nm grown on 4H-SiC without a transition layer. Additionally, we measure the thermal conductivity in the GaN film when it is 1 μm-thick in the temperature range of 300 600 K and use a phonon transport model to explain the thermal conductivity in this film.- 7 March 2016
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 119 (9) , 095107
Modeling optical absorption for thermoreflectance measurements
Optical pump-probe techniques based on thermoreflectance, such as time domain thermoreflectance and frequency domain thermoreflectance (FDTR), have been widely used to characterize the thermal conductivity of thin films and the thermal conductance across interfaces. These techniques typically use a transducer layer to absorb the pump light and improve the thermoreflectance signal. The transducer, however, complicates the interpretation of the measured signal because the approximation that all the energy from the pump beam is deposited at the transducer surface is not always accurate. In this paper, we consider the effect of laser absorption in the top layer of a multilayer sample, and derive an analytical solution for the thermoreflectance signal in the diffusion regime based on volumetric heating. We analyze the measurement sensitivity to the pump absorption depth for transducers with different thermal conductivities, and investigate the additional effect of probe laser penetration depth on the measured signal. We validate our model using FDTR measurements on 490 nm thick amorphous silicon films deposited on fused silica and silicon substrates.
- 7 March 2016
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 119 (9) , 095107
Modeling optical absorption for thermoreflectance measurements
Optical pump-probe techniques based on thermoreflectance, such as time domain thermoreflectance and frequency domain thermoreflectance (FDTR), have been widely used to characterize the thermal conductivity of thin films and the thermal conductance across interfaces. These techniques typically use a transducer layer to absorb the pump light and improve the thermoreflectance signal. The transducer, however, complicates the interpretation of the measured signal because the approximation that all the energy from the pump beam is deposited at the transducer surface is not always accurate. In this paper, we consider the effect of laser absorption in the top layer of a multilayer sample, and derive an analytical solution for the thermoreflectance signal in the diffusion regime based on volumetric heating. We analyze the measurement sensitivity to the pump absorption depth for transducers with different thermal conductivities, and investigate the additional effect of probe laser penetration depth on the measured signal. We validate our model using FDTR measurements on 490 nm thick amorphous silicon films deposited on fused silica and silicon substrates.
- Top Cited Papers
- 1 January 2016
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 87 (1) , 014901
Uncertainty analysis of thermoreflectance measurements
We derive a generally applicable formula to calculate the precision of multi-parameter measurements that apply least squares algorithms. This formula, which accounts for experimental noise and uncertainty in the controlled model parameters, is then used to analyze the uncertainty of thermal property measurements with pump-probe thermoreflectance techniques. We compare the uncertainty of time domain thermoreflectance and frequency domain thermoreflectance (FDTR) when measuring bulk materials and thin films, considering simultaneous measurements of various combinations of thermal properties, including thermal conductivity, heat capacity, and thermal boundary conductance. We validate the uncertainty analysis using Monte Carlo simulations on data from FDTR measurements of an 80 nm gold film on fused silica.
- 1 January 2016
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 87 (1) , 014901
Top Cited PapersUncertainty analysis of thermoreflectance measurements
We derive a generally applicable formula to calculate the precision of multi-parameter measurements that apply least squares algorithms. This formula, which accounts for experimental noise and uncertainty in the controlled model parameters, is then used to analyze the uncertainty of thermal property measurements with pump-probe thermoreflectance techniques. We compare the uncertainty of time domain thermoreflectance and frequency domain thermoreflectance (FDTR) when measuring bulk materials and thin films, considering simultaneous measurements of various combinations of thermal properties, including thermal conductivity, heat capacity, and thermal boundary conductance. We validate the uncertainty analysis using Monte Carlo simulations on data from FDTR measurements of an 80 nm gold film on fused silica.
- 31 August 2015
- Published by AIP Publishing in Applied Physics Letters
- Vol. 107 (9) , 091605
Thermal transport through GaN–SiC interfaces from 300 to 600 K
Silicon carbide is used as a substrate for high-power GaN devices because of its closely matched lattice spacing with GaN and its high thermal conductivity. In these devices, thermal resistance at the GaN–SiC interface is a bottleneck to heat flow, making this property an important factor in device design. In this letter, we report the first measurements of the thermal boundary conductance of epitaxial GaN grown directly on SiC without a transition layer. We find that the thermal boundary conductance increases from approximately 230 MW/m2K at 300 K to 330 MW/m2K at 600 K. Our measured values are in good qualitative agreement with the diffuse mismatch model for thermal boundary conductance and are in good quantitative agreement when we include a correction factor based on the ratio of Debye temperatures of the two materials. We also report the thermal conductivity of the GaN film, the thermal conductivity of 4H-SiC, and the thermal boundary conductance between Ni and GaN.
- 31 August 2015
- Published by AIP Publishing in Applied Physics Letters
- Vol. 107 (9) , 091605
Thermal transport through GaN–SiC interfaces from 300 to 600 K
Silicon carbide is used as a substrate for high-power GaN devices because of its closely matched lattice spacing with GaN and its high thermal conductivity. In these devices, thermal resistance at the GaN–SiC interface is a bottleneck to heat flow, making this property an important factor in device design. In this letter, we report the first measurements of the thermal boundary conductance of epitaxial GaN grown directly on SiC without a transition layer. We find that the thermal boundary conductance increases from approximately 230 MW/m2K at 300 K to 330 MW/m2K at 600 K. Our measured values are in good qualitative agreement with the diffuse mismatch model for thermal boundary conductance and are in good quantitative agreement when we include a correction factor based on the ratio of Debye temperatures of the two materials. We also report the thermal conductivity of the GaN film, the thermal conductivity of 4H-SiC, and the thermal boundary conductance between Ni and GaN.
- 11 July 2014
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 116 (2) , 023515
Thermal conductance imaging of graphene contacts
Suspended graphene has the highest measured thermal conductivity of any material at room temperature. However, when graphene is supported by a substrate or encased between two materials, basal-plane heat transfer is suppressed by phonon interactions at the interfaces. We have used frequency domain thermoreflectance to create thermal conductance maps of graphene contacts, obtaining simultaneous measurements of the basal-plane thermal conductivity and cross-plane thermal boundary conductance for 1–7 graphitic layers encased between titanium and silicon dioxide. We find that the basal-plane thermal conductivity is similar to that of graphene supported on silicon dioxide. Our results have implications for heat transfer in two-dimensional material systems, and are relevant for applications such as graphene transistors and other nanoelectronic devices.
- 11 July 2014
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 116 (2) , 023515
Thermal conductance imaging of graphene contacts
Suspended graphene has the highest measured thermal conductivity of any material at room temperature. However, when graphene is supported by a substrate or encased between two materials, basal-plane heat transfer is suppressed by phonon interactions at the interfaces. We have used frequency domain thermoreflectance to create thermal conductance maps of graphene contacts, obtaining simultaneous measurements of the basal-plane thermal conductivity and cross-plane thermal boundary conductance for 1–7 graphitic layers encased between titanium and silicon dioxide. We find that the basal-plane thermal conductivity is similar to that of graphene supported on silicon dioxide. Our results have implications for heat transfer in two-dimensional material systems, and are relevant for applications such as graphene transistors and other nanoelectronic devices.
- Top Cited Papers
- 1 October 2013
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 84 (10) , 104904
Thermal property microscopy with frequency domain thermoreflectance
A thermal property microscopy technique based on frequency domain thermoreflectance (FDTR) is presented. In FDTR, a periodically modulated laser locally heats a sample while a second probe beam monitors the surface reflectivity, which is related to the thermal properties of the sample with an analytical model. Here, we extend FDTR into an imaging technique capable of producing micrometer-scale maps of several thermophysical properties simultaneously. Thermal phase images are recorded at multiple frequencies chosen for maximum sensitivity to thermal properties of interest according to a thermal model of the sample. The phase versus frequency curves are then fit point-by-point to obtain quantitative thermal property images of various combinations of thermal properties in multilayer samples, including the in-plane and cross-plane thermal conductivities, heat capacity, thermal interface conductance, and film thickness. An FDTR microscope based on two continuous-wave lasers is described, and a sensitivity analysis of the technique to different thermal properties is carried out. As a demonstration, we image ∼3 nm of patterned titanium under 100 nm of gold on a silicon substrate, and simultaneously create maps of the thermal interface conductance and substrate thermal conductivity. Results confirm the potential of our technique for imaging and quantifying thermal properties of buried layers, indicating its utility for mapping thermal properties in integrated circuits.
- 1 October 2013
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 84 (10) , 104904
Top Cited PapersThermal property microscopy with frequency domain thermoreflectance
A thermal property microscopy technique based on frequency domain thermoreflectance (FDTR) is presented. In FDTR, a periodically modulated laser locally heats a sample while a second probe beam monitors the surface reflectivity, which is related to the thermal properties of the sample with an analytical model. Here, we extend FDTR into an imaging technique capable of producing micrometer-scale maps of several thermophysical properties simultaneously. Thermal phase images are recorded at multiple frequencies chosen for maximum sensitivity to thermal properties of interest according to a thermal model of the sample. The phase versus frequency curves are then fit point-by-point to obtain quantitative thermal property images of various combinations of thermal properties in multilayer samples, including the in-plane and cross-plane thermal conductivities, heat capacity, thermal interface conductance, and film thickness. An FDTR microscope based on two continuous-wave lasers is described, and a sensitivity analysis of the technique to different thermal properties is carried out. As a demonstration, we image ∼3 nm of patterned titanium under 100 nm of gold on a silicon substrate, and simultaneously create maps of the thermal interface conductance and substrate thermal conductivity. Results confirm the potential of our technique for imaging and quantifying thermal properties of buried layers, indicating its utility for mapping thermal properties in integrated circuits.
- 18 December 2009
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 20 (1)
A full description of a scalable microfabrication process for arrayed electrowetting microprisms
- 18 December 2009
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 20 (1)
A full description of a scalable microfabrication process for arrayed electrowetting microprisms
- 29 April 2009
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 151 (2) , 133-140
Novel optical accelerometer based on Fresnel diffractive micro lens
- 29 April 2009
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 151 (2) , 133-140
Novel optical accelerometer based on Fresnel diffractive micro lens