Spyridon Kassavetis

Titanium nitride (TiN) is a candidate material for several plasmonic applications, and pulsed laser ablation in liquids (PLAL) represents a rapid, scalable, and environmentally friendly approach for the large-scale production of nanomaterials with customized properties. In this work, the nanosecond PLAL process is developed, and we provide a concise understanding of the process parameters, such as the solvent and the laser fluence and pulse wavelength, to the size and structure of the produced TiN nanoparticles (NPs). TiN films of a 0.6 μm thickness developed by direct-current (DC) magnetron sputtering were used as the ablation targets. All laser process parameters lead to the fabrication of spherical NPs, while the laser pulse fluence was used to control the NPs’ size. High laser pulse fluence values result in larger TiN NPs (diameter around 42 nm for 5 mJ and 25 nm for 1 mJ), as measured from scanning electron microscopy (SEM). On the other hand, the wavelength of the laser pulse does not affect the mean size of the TiN NPs (24, 26, and 25 nm for 355, 532, and 1064 nm wavelengths, respectively). However, the wavelength plays a vital role in the quality of the produced TiN NPs. Shorter wavelengths result in NPs with fewer defects, as indicated by Raman spectra and XPS analysis. The solvent type also significantly affects the size of the NPs. In aqueous solutions, strong oxidation of the NPs is evident, while organic solvents such as acetone, carbides, and oxides cover the TiN NPs.

Obtaining white light from organic LEDs is a considerable challenge and, to realize white light emission, many studies have been conducted, primarily addressing two- or three-color blend systems as a promising strategy. In this work, pristine films, grown by spin coating, consisting of commercial blue Poly(9,9-di-n-octylfluorenyl-2,7-diyl) (PFO), green Poly(9,9-dioctylfluorene-alt-benzothiadiazole) (F8BT), and red spiro-copolymer (SPR) light-emitting materials, were studied as reference materials. Afterward, binary (SPR doped in host PFO) and ternary (SPR and F8BT doped in host PFO) thin films were successfully prepared with various ratios. The characterization of the as-grown and thermally-treated blend films was focused on their optical and photophysical properties. After, the fabrication of OLED devices on glass substrates was carried out for the evaluation of a blend’s composition and annealing in terms of the devices’ electrical characteristics and electro-emission properties in order to achieve white light emission. Their analysis provided insights into the energy transfer mechanisms between the constituent materials, which were correlated to host–guest interactions as well as to the structural changes originated by thermal treatment, leading to the crystallization of PFO. Finally, the OLEDs based on ternary blends approach the white light emission with (x, y) of (0.272, 0.346). These fabricated devices also exhibit turn-on voltages as low as 3 V, accompanied by remarkable luminance values above 3000 cd/m².

Ultrafast laser patterning is an essential technology for the low-cost and large area production of flexible Organic Electronic (OE) devices, such as Organic Photovoltaics (OPVs). In order to unleash the potential of ultrafast laser processing to perform the selective and high precision removal of complex multilayers from printed OPV stacks without affecting the underlying nanolayers, it is necessary to optimize its parameters for each nanolayer combination. In this work, we developed an efficient on-the-fly picosecond (ps) laser scribing process (P1, P2 and P3) using single wavelength and single step/pass for the precise and reliable in-line patterning of Roll-to-Roll (R2R) slot-die-coated nanolayers. We have investigated the effect of the key process parameters (pulse energy and overlap) on the patterning quality to obtain high selectivity on the ablation of each individual nanolayer. Finally, we present the implementation of the ultrafast laser patterning process in the manufacturing of fully R2R printed flexible semitransparent OPV modules with a 3.4% power conversion efficiency and 91% Geometric Fill Factor (GFF).

Nanosphere lithography has emerged as an efficient route to produce plasmonic nanostructures. Herein, the processes of nanosphere lithography and reactive magnetron sputtering that seem incompatible for a variety of reasons are reviewed and explained. However, understanding the physical obstacles of this combination enables us to identify a window of process parameters that make the deposition of well‐defined trigonal nanoislands of titanium nitride (TiN) feasible. TiN is used as a case study because it is a very good representative of refractory conductive nitrides, such as ZrN, HfN, NbN, and TaN. A UV ozone step is used to confine the triple‐junction vias of the polystyrene mask, and the reactive magnetron sputtering parameters are fine‐tuned to increase the directionality of deposited species, in particular the substrate‐to‐target distance is maximized to improve geometrical directionality, and a negative bias voltage is used to guide the ionic species deep into the vias. The proposed process produces well‐defined TiN nanoislands with low concentration of point defects that have similar structure with continuous films of high electrical conductivity and plasmonic performance.

The present work addresses the issues related to the capacity fading of spinel LiMn₂O₄, such as Mn leaching and Jahn–Teller distortion and suggests an advanced TiN-coated LiAl_0.1Mn_1.9O₄ (LAMO) cathode material as an electrode for lithium-ion batteries. TiN coating layers with the same thickness but a different porosity cover the LiAl_0.1Mn_1.9O₄ electrode via reactive magnetron sputtering, and present promising electrochemical behavior. In contrast with the pristine LiAl_0.1Mn_1.9O₄, the dense TiN-coated LiAl_0.1Mn_1.9O₄ electrode demonstrates a remarkable long-term cycling by reducing the contact area of the electrode/electrolyte interface, resulting in structure stabilization.

Photovoltaics is amongst the most important technologies for renewable energy sources, and plays a key role in the development of a society with a smaller environmental footprint. Key parameters for solar cells are their energy conversion efficiency, their operating lifetime, and the cost of the energy obtained from a photovoltaic system compared to other sources. The optimization of these aspects involves the exploitation of new materials and development of novel solar cell concepts and designs. Both theoretical modeling and characterization of such devices require a comprehensive view including all scales from the atomic to the macroscopic and industrial scale. The different length scales of the electronic and optical degrees of freedoms specifically lead to an intrinsic need for multiscale simulation, which is accentuated in many advanced photovoltaics concepts including nanostructured regions. Therefore, multiscale modeling has found particular interest in the photovoltaics community, as a tool to advance the field beyond its current limits. In this article, we review the field of multiscale techniques applied to photovoltaics, and we discuss opportunities and remaining challenges.