Feridun Ay
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
Feridun Ay has a total of 149 co-authors. Here are the top co-authors by number of shared publications:
M. Pollnau
Integrated Optical MicroSystems Group, MESA+ Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands
14 shared publications- Markus Pollnau
Univ. of Surrey (United Kingdom)
12 shared publications - Cem Sevik
University of Antwerp
11 shared publications - Ayberk Özden
Institut für Theoretische Physik, TU Bergakademie Freiberg, Leipziger Straße 23, 09596 Freiberg, Germany
10 shared publications K. Worhoff
Integrated Optical MicroSystems Group, MESA+ Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands
10 shared publicationsKerstin Wörhoff
Integrated Optical MicroSystems Group, MESA + Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands
10 shared publications
Latest Publications
- 8 October 2026
- Published by Elsevier in Journal of Biotechnology
- Vol. 421, 19-28
Evaluation of synthesized borophene; potential toxicity on BAX/BCL-2, Il-1, and IL-10
- 8 October 2026
- Published by Elsevier in Journal of Biotechnology
- Vol. 421, 19-28
Evaluation of synthesized borophene; potential toxicity on BAX/BCL-2, Il-1, and IL-10
- Open Access
- 10 February 2026
- Published by Elsevier in SSRN Electronic Journal
Unlocking High Energy Density in Ionic Liquid Supercapacitors via Termination-Free Mo₂C MXene
The growing demand for high-energy supercapacitors necessitates electrode–electrolyte systems that can operate across wide voltage windows without compromising stability. Here, we report symmetric supercapacitors based on termination-free Mo₂C MXene films synthesized via chemical vapor deposition (CVD) and paired with ionic liquid (IL) electrolytes. Unlike conventionally etched MXenes, the CVD-grown Mo₂C features a clean, termination-free surface that enables a stable and compatible interface with ILs. Using [BMIM]BF₄, the devices deliver energy densities of 114-121 Wh kg⁻¹ and power densities up to 1.8 MW kg⁻¹ within a voltage window of ~2.2-2.3 V, while retaining up to 96% capacitance after 10,000 cycles. When paired with STFSI, the devices achieve the highest specific power density, reaching 2.9 MW kg⁻¹. These results highlight the large surface area of Mo₂C, its excellent electrical conductivity, and strong compatibility with ionic liquid electrolytes. Comparative studies with filter paper and Celgard separators further reveal a trade-off between ionic accessibility and long-term durability, underscoring the critical role of electrolyte-separator-electrode synergy. Collectively, this work establishes termination-free CVD-grown Mo₂C MXene as a promising design pathway for next-generation IL-based high-energy supercapacitors.
- 10 February 2026
- Published by Elsevier in SSRN Electronic Journal
Open AccessUnlocking High Energy Density in Ionic Liquid Supercapacitors via Termination-Free Mo₂C MXene
The growing demand for high-energy supercapacitors necessitates electrode–electrolyte systems that can operate across wide voltage windows without compromising stability. Here, we report symmetric supercapacitors based on termination-free Mo₂C MXene films synthesized via chemical vapor deposition (CVD) and paired with ionic liquid (IL) electrolytes. Unlike conventionally etched MXenes, the CVD-grown Mo₂C features a clean, termination-free surface that enables a stable and compatible interface with ILs. Using [BMIM]BF₄, the devices deliver energy densities of 114-121 Wh kg⁻¹ and power densities up to 1.8 MW kg⁻¹ within a voltage window of ~2.2-2.3 V, while retaining up to 96% capacitance after 10,000 cycles. When paired with STFSI, the devices achieve the highest specific power density, reaching 2.9 MW kg⁻¹. These results highlight the large surface area of Mo₂C, its excellent electrical conductivity, and strong compatibility with ionic liquid electrolytes. Comparative studies with filter paper and Celgard separators further reveal a trade-off between ionic accessibility and long-term durability, underscoring the critical role of electrolyte-separator-electrode synergy. Collectively, this work establishes termination-free CVD-grown Mo₂C MXene as a promising design pathway for next-generation IL-based high-energy supercapacitors.
- Open Access
- 28 March 2025
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 137 (12)
A deep learning approach for high-resolution and enhanced efficiency in photonic power dividers
With recent developments, nanophotonics has emerged as a field of intense interest offering improvements in the performance of photonic integrated circuits (PICs). By significantly increasing data rates, transmission speed, and bandwidth and reducing both transmission loss and energy consumption, nanophotonic technologies present significant advantages that could redefine the efficiency and capabilities of PICs. In this study, the design of photonic crystal power dividers is addressed using a two-stage deep learning strategy with Deep Convolutional Generative Adversarial Networks (DCGANs). The study primarily aims for high-resolution designs compared to the existing methods. This approach expands the solution set, allowing for simulation results that more closely align with real-world performance while achieving higher transmission efficiency and output rates within practical computational limits. Previous studies were limited by low-resolution designs and the necessity for extensive optimization processes. Using the DCGAN architecture, high-resolution patterns (200 × 200 pixels) with transmission efficiencies exceeding 95% are achieved. This approach highlights the effectiveness of deep learning in discovering complex nonlinear relationships, successfully producing power dividers capable of arbitrary energy distributions. The innovative method positions the role of deep learning in advancing photonic devices and emphasizes their potential impact on neurocomputing and future hardware development.
- 28 March 2025
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 137 (12)
Open AccessA deep learning approach for high-resolution and enhanced efficiency in photonic power dividers
With recent developments, nanophotonics has emerged as a field of intense interest offering improvements in the performance of photonic integrated circuits (PICs). By significantly increasing data rates, transmission speed, and bandwidth and reducing both transmission loss and energy consumption, nanophotonic technologies present significant advantages that could redefine the efficiency and capabilities of PICs. In this study, the design of photonic crystal power dividers is addressed using a two-stage deep learning strategy with Deep Convolutional Generative Adversarial Networks (DCGANs). The study primarily aims for high-resolution designs compared to the existing methods. This approach expands the solution set, allowing for simulation results that more closely align with real-world performance while achieving higher transmission efficiency and output rates within practical computational limits. Previous studies were limited by low-resolution designs and the necessity for extensive optimization processes. Using the DCGAN architecture, high-resolution patterns (200 × 200 pixels) with transmission efficiencies exceeding 95% are achieved. This approach highlights the effectiveness of deep learning in discovering complex nonlinear relationships, successfully producing power dividers capable of arbitrary energy distributions. The innovative method positions the role of deep learning in advancing photonic devices and emphasizes their potential impact on neurocomputing and future hardware development.
- 11 January 2022
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 131 (2) , 025304
Controlled CVD growth of ultrathin Mo2C (MXene) flakes
MXenes combine distinctive properties, including high electrical conductivity, high thermal conductivity, and efficient absorption of electromagnetic waves, which allow them to be utilized in various applications such as electrical energy storage, sensors, and functional composites. This study aims to grow thin and large area flakes in a controlled manner by using chemical vapor deposition, avoiding surface functionalization, and limited lateral dimensions. Herein, we investigate the effects of flow, the precursor/catalyst (Mo/Cu) ratio, and flow rates of carrier gas on the growth of two-dimensional structures. This study examines the effects of the precursor/catalyst (Mo/Cu) ratio and flow rates of carrier gas on the growth of structures. Our results show that when the flow rates of , catalyst/precursor (Cu/Mo) ratio, and carrier gas ( / ) ratio are varied, we can control both thickness (from 7 to 145 nm) and coverage of the substrate surface (from 11% to 68%) of the flakes. Therefore, this study reveals that it is possible to realize centimeter-scale surface coverage and controllable thicknesses by adjusting the process parameters. The deposited films and flakes are analyzed by optical microscopy, atomic force microscopy, and Raman scattering spectroscopy techniques. The Raman spectra are also compared with the theoretical calculations using density functional theory. Overall, the present work is expected to provide a significant impact for utilization of MXenes in various applications.- 11 January 2022
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 131 (2) , 025304
Controlled CVD growth of ultrathin Mo2C (MXene) flakes
MXenes combine distinctive properties, including high electrical conductivity, high thermal conductivity, and efficient absorption of electromagnetic waves, which allow them to be utilized in various applications such as electrical energy storage, sensors, and functional composites. This study aims to grow thin and large area flakes in a controlled manner by using chemical vapor deposition, avoiding surface functionalization, and limited lateral dimensions. Herein, we investigate the effects of flow, the precursor/catalyst (Mo/Cu) ratio, and flow rates of carrier gas on the growth of two-dimensional structures. This study examines the effects of the precursor/catalyst (Mo/Cu) ratio and flow rates of carrier gas on the growth of structures. Our results show that when the flow rates of , catalyst/precursor (Cu/Mo) ratio, and carrier gas ( / ) ratio are varied, we can control both thickness (from 7 to 145 nm) and coverage of the substrate surface (from 11% to 68%) of the flakes. Therefore, this study reveals that it is possible to realize centimeter-scale surface coverage and controllable thicknesses by adjusting the process parameters. The deposited films and flakes are analyzed by optical microscopy, atomic force microscopy, and Raman scattering spectroscopy techniques. The Raman spectra are also compared with the theoretical calculations using density functional theory. Overall, the present work is expected to provide a significant impact for utilization of MXenes in various applications.- 5 March 2021
- Published by SPIE-Intl Soc Optical Eng
- Vol. 11689, 116890S
Controlled ALD doping of Er3+ for active on-chip waveguide amplifiers based on Al2O3
In this work, we report on the development of ALD-grown ultralow loss host Al2O3 planar waveguides on Si and then successful realization of ALD-grown Er3+ doped on-chip Al2O3 waveguide-based high-gain amplifier devices. Both thermal and plasma enhanced ALD processes have been employed in the optimization processes. Optimization of both Al2O3 and Er2O3 growth conditions is performed for fine-tuning the optical properties of respective films. Systematic characterization of both films has been carried out by making use of spectroscopic ellipsometry, XRD, FTIR, and XPS techniques. The Er2O3 layers are sandwiched between the Al2O3 layers to achieve controlled erbium ion doping with the homogenous distribution. The effects of the growth parameters of Al2O3 and Er2O3 including deposition temperature, RF plasma power, TMA pulse time, Er(thd)3 pulse time, and O2 pulse time are optimized. With this work, we propose a method for precise control of doping ion concentration and its distribution. As a demonstrator, single-mode ridge waveguide amplifiers are realized by lithography from the active planar structures. ALD deposited chip-scale singlemode Er3+ doped Al2O3 ridge waveguide amplifiers with a small-signal gain of more than 13 dB/cm over the C band are realized. The reported ALD based growth process can further be adapted for active ion doping of different oxide systems with precise concentration and profile control, thus offering new opportunities for active on-chip applications.
- 5 March 2021
- Published by SPIE-Intl Soc Optical Eng
- Vol. 11689, 116890S
Controlled ALD doping of Er3+ for active on-chip waveguide amplifiers based on Al2O3
In this work, we report on the development of ALD-grown ultralow loss host Al2O3 planar waveguides on Si and then successful realization of ALD-grown Er3+ doped on-chip Al2O3 waveguide-based high-gain amplifier devices. Both thermal and plasma enhanced ALD processes have been employed in the optimization processes. Optimization of both Al2O3 and Er2O3 growth conditions is performed for fine-tuning the optical properties of respective films. Systematic characterization of both films has been carried out by making use of spectroscopic ellipsometry, XRD, FTIR, and XPS techniques. The Er2O3 layers are sandwiched between the Al2O3 layers to achieve controlled erbium ion doping with the homogenous distribution. The effects of the growth parameters of Al2O3 and Er2O3 including deposition temperature, RF plasma power, TMA pulse time, Er(thd)3 pulse time, and O2 pulse time are optimized. With this work, we propose a method for precise control of doping ion concentration and its distribution. As a demonstrator, single-mode ridge waveguide amplifiers are realized by lithography from the active planar structures. ALD deposited chip-scale singlemode Er3+ doped Al2O3 ridge waveguide amplifiers with a small-signal gain of more than 13 dB/cm over the C band are realized. The reported ALD based growth process can further be adapted for active ion doping of different oxide systems with precise concentration and profile control, thus offering new opportunities for active on-chip applications.
- 28 October 2020
- Published by Wiley in Advanced Optical Materials
- Vol. 8 (24)
MoS2 Phototransistor Sensitized by Colloidal Semiconductor Quantum Wells
A phototransistor built by the assembly of 2D colloidal semiconductor quantum wells (CQWs) on a single layer of 2D transition metal dichalcogenide (TMD) is displayed. This hybrid device architecture exhibits high efficiency in Förster resonance energy transfer (FRET) enabling superior performance in terms of photoresponsivity and detectivity. Here, a thin film of CdSe/CdS CQWs acts as a sensitizer layer on top of the MoS2 monolayer based field‐effect transistor, where this CQWs–MoS2 structure allows for strong light absorption in CQWs in the operating spectral region and strong dipole‐to‐dipole coupling between MoS2 and CQWs resulting in enhanced photoresponsivity of one order of magnitude (11‐fold) at maximum gate voltage (VBG = 2 V) and two orders of magnitude (≈ 5 × 102) at VBG = −1.5 V, and tenfold enhanced specific detectivity. The illumination power‐dependent characterization of this hybrid device reveals that the thin layer of CQWs dominates the photogating mechanism compared to the photoconductivity effect on detection performance. Such hybrid designs hold great promise for 2D‐material based photodetectors to reach high performance and find use in optoelectronic applications.
- 28 October 2020
- Published by Wiley in Advanced Optical Materials
- Vol. 8 (24)
MoS2 Phototransistor Sensitized by Colloidal Semiconductor Quantum Wells
A phototransistor built by the assembly of 2D colloidal semiconductor quantum wells (CQWs) on a single layer of 2D transition metal dichalcogenide (TMD) is displayed. This hybrid device architecture exhibits high efficiency in Förster resonance energy transfer (FRET) enabling superior performance in terms of photoresponsivity and detectivity. Here, a thin film of CdSe/CdS CQWs acts as a sensitizer layer on top of the MoS2 monolayer based field‐effect transistor, where this CQWs–MoS2 structure allows for strong light absorption in CQWs in the operating spectral region and strong dipole‐to‐dipole coupling between MoS2 and CQWs resulting in enhanced photoresponsivity of one order of magnitude (11‐fold) at maximum gate voltage (VBG = 2 V) and two orders of magnitude (≈ 5 × 102) at VBG = −1.5 V, and tenfold enhanced specific detectivity. The illumination power‐dependent characterization of this hybrid device reveals that the thin layer of CQWs dominates the photogating mechanism compared to the photoconductivity effect on detection performance. Such hybrid designs hold great promise for 2D‐material based photodetectors to reach high performance and find use in optoelectronic applications.
- 15 June 2020
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Selected Topics in Quantum Electronics
- Vol. 26 (5) , 1-8
High-Gain Er3+:Al2O3 On-Chip Waveguide Amplifiers
In this work, high-gain on-chip Er $^3+$ doped Al $_2$ O $_3$ single-mode ridge waveguide amplifier device is reported. The growth of the active layer is realized using atomic layer deposition (ALD) compatible with Si processing technology. Optimization of the Al $_2$ O $_3$ and Er $_2$ O $_3$ growth conditions for fine-tuning the optical properties is systematically investigated. In order to optimize the active ion concentration, heterocycle structures consisting of separately optimized Al $_2$ O $_3$ and Er $_2$ O $_3$ are deposited. The structural and optical properties of the active layers were characterized by spectroscopic ellipsometry, X-ray photoelectron spectroscopy, time-resolved photoluminescence, and optical gain measurements. We demonstrated up to 2.74 ± 0.40 dB total gain and 13.71 ± 1.97 dB/cm internal optical net gain per unit length at 1550 ± 12 nm using a 2-mm-long device, pumped using a 980 nm laser diode at 23-mW. This work can be expanded to other rare-earth ion doping processes, paving the way to significant improvements of active on-chip applications.- 15 June 2020
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Selected Topics in Quantum Electronics
- Vol. 26 (5) , 1-8
High-Gain Er3+:Al2O3 On-Chip Waveguide Amplifiers
In this work, high-gain on-chip Er $^3+$ doped Al $_2$ O $_3$ single-mode ridge waveguide amplifier device is reported. The growth of the active layer is realized using atomic layer deposition (ALD) compatible with Si processing technology. Optimization of the Al $_2$ O $_3$ and Er $_2$ O $_3$ growth conditions for fine-tuning the optical properties is systematically investigated. In order to optimize the active ion concentration, heterocycle structures consisting of separately optimized Al $_2$ O $_3$ and Er $_2$ O $_3$ are deposited. The structural and optical properties of the active layers were characterized by spectroscopic ellipsometry, X-ray photoelectron spectroscopy, time-resolved photoluminescence, and optical gain measurements. We demonstrated up to 2.74 ± 0.40 dB total gain and 13.71 ± 1.97 dB/cm internal optical net gain per unit length at 1550 ± 12 nm using a 2-mm-long device, pumped using a 980 nm laser diode at 23-mW. This work can be expanded to other rare-earth ion doping processes, paving the way to significant improvements of active on-chip applications.- 20 January 2020
- Published by Springer Nature in Optical and Quantum Electronics
- Vol. 52 (2) , 74
A realistic approach for designing a single-mode Y-branch for weakly guiding material system using particle swarm algorithm
- 20 January 2020
- Published by Springer Nature in Optical and Quantum Electronics
- Vol. 52 (2) , 74
A realistic approach for designing a single-mode Y-branch for weakly guiding material system using particle swarm algorithm
- 1 January 2020
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 105
Glass-assisted CVD growth of large-area MoS2, WS2 and MoSe2 monolayers on Si/SiO2 substrate
- 1 January 2020
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 105
Glass-assisted CVD growth of large-area MoS2, WS2 and MoSe2 monolayers on Si/SiO2 substrate
- 1 August 2019
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 99, 134-139
Bandgap tuning of Monolayer MoS2(1-x)Se2x alloys by optimizing parameters
- 1 August 2019
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 99, 134-139
Bandgap tuning of Monolayer MoS2(1-x)Se2x alloys by optimizing parameters