Sjoerd Smit

In the field of photovoltaics, atomic layer deposition (ALD) is mostly known for its success in preparing Al2O3-based surface passivation layers for c-Si homojunction cells. In the last years, many novel types of c-Si heterojunctions have appeared, referred to as passivating contacts. In these concepts, metal oxide thin films are used for surface passivation, carrier selectivity and as transparent conductive oxide. This leads to the question whether the success of ALD for homojunctions can be translated into this new field as well. Therefore, this work provides an overview of these new concepts, and highlights both the current role and prospects of ALD in this field.

In this work, a method is presented to extend traditional solar cell simulation tools to make it possible to calculate the most efficient design of practical solar cells. The method is based on the theory of nonequilibrium thermodynamics, which is used to derive an expression for the local entropy generation rate in the solar cell, making it possible to quantify all free energy losses on the same scale. The framework of non-equilibrium thermodynamics can therefore be combined with the calculus of variations and existing solar cell models to minimize the total entropy generation rate in the cell to find the most optimal design. The variational method is illustrated by applying it to a homojunction solar cell. The optimization results in a set of differential algebraic equations, which determine the optimal shape of the doping profile for given recombination and transport models.

The non‐uniform presence of shunting defects is a significant cause of poor reproducibility across large‐area solar cells, or from batch‐to‐batch for small area cells, but the most commonly used value for shunt parameterisation (the shunt resistance) fails to identify the cause for shunting. Here, the use of equivalent circuit models to describe dark current–voltage characteristics of ZnO:Al/i‐ZnO/CdS/CIGS/Mo devices in order to understand shunting behaviour is evaluated. Simple models, with a single shunt pathway, were tested but failed to fit experimental data, whereas a more sophisticated model developed here, which includes three shunting pathways, yielded excellent agreement throughout the temperature range of 183–323 K. The temperature dependence of fitting parameters is consistent with known physical models. Activation energies and contact barriers are determined from the model, and extracted diode factors are unique across the voltage range. A case study is presented whereby the model is used to diagnose poor reproducibility for CIGS devices (efficiency ~3–14% across a 100 cm² plate). It's shown that lower efficiencies correlated with greater prevalence of Ohmic and non‐Ohmic shunt currents, which may form due to pinholes in absorber and buffer layers respectively, whereas the quality of the main junction was constant for all cells (diode factor ~1.5–2). Electron microscopy confirmed the presence of ZnO:Al/i‐ZnO/Mo and ZnO:Al/CIGS/Mo regions, supporting the multi‐shunt pathway scheme disclosed by modelling. While the model is tested with CIGS cells here, this general model is a powerful diagnostic tool for process development for any type of thin‐film device. Copyright © 2015 John Wiley & Sons, Ltd.

In this work, an optical modeling study on electron scattering mechanisms in plasma-deposited ZnO layers is presented. Because various applications of ZnO films pose a limit on the electron carrier density due to its effect on the film transmittance, higher electron mobility values are generally preferred instead. Hence, insights into the electron scattering contributions affecting the carrier mobility are required. In optical models, the Drude oscillator is adopted to represent the free-electron contribution and the obtained optical mobility can be then correlated with the macroscopic material properties. However, the influence of scattering phenomena on the optical mobility depends on the considered range of photon energy. For example, the grain-boundary scattering is generally not probed by means of optical measurements and the ionized-impurity scattering contribution decreases toward higher photon energies. To understand this frequency dependence and quantify contributions from different scattering phenomena to the mobility, several case studies were analyzed in this work by means of spectroscopic ellipsometry and Fourier transform infrared (IR) spectroscopy. The obtained electrical parameters were compared to the results inferred by Hall measurements. For intrinsic ZnO (i-ZnO), the in-grain mobility was obtained by fitting reflection data with a normal Drude model in the IR range. For Al-doped ZnO (Al:ZnO), besides a normal Drude fit in the IR range, an Extended Drude fit in the UV-vis range could be used to obtain the in-grain mobility. Scattering mechanisms for a thickness series of Al:ZnO films were discerned using the more intuitive parameter “scattering frequency” instead of the parameter “mobility”. The interaction distance concept was introduced to give a physical interpretation to the frequency dependence of the scattering frequency. This physical interpretation furthermore allows the prediction of which Drude models can be used in a specific frequency range.

We examine damage-free transparent-electrode deposition to fabricate high-efficiency amorphous silicon/crystalline silicon heterojunction solar cells. Such solar cells usually feature sputtered transparent electrodes, the deposition of which may damage the layers underneath. Using atomic layer deposition, we insert thin protective films between the amorphous silicon layers and sputtered contacts and investigate their effect on device operation. We find that a 20-nm-thick protective layer suffices to preserve, unchanged, the amorphous silicon layers beneath. Insertion of such protective atomic-layer-deposited layers yields slightly higher internal voltages at low carrier injection levels. However, we identify the presence of a silicon oxide layer, formed during processing, between the amorphous silicon and the atomic-layer-deposited transparent electrode that acts as a barrier, impeding hole and electron collection.