Halldor Gudfinnur Svavarsson
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
Research Interests
Halldor Gudfinnur Svavarsson has a total of 77 co-authors. Here are the top co-authors by number of shared publications:
- Andrei Manolescu
Reykjavik University
13 shared publications - Muhammad Taha Sultan
Dept. of Engineering, Reykjavik University, Menntavegur 1, 102, Reykjavik, Iceland
11 shared publications - Jon Tomas Gudmundsson
Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, Iceland
6 shared publications Robert Magnusson
Department of Electrical Engineering, University of Texas - Arlington, Arlington, Texas 76019, USA
6 shared publications- Magdalena Lidia Ciurea
National Institute of Materials Physics, 405A Atomistilor Street, 077125 Magurele, Romania
4 shared publications - Snorri Ingvarsson
University of Iceland
4 shared publications
Latest Publications
- 29 October 2026
- Published by Royal Society of Chemistry (RSC) in Nanoscale
- Vol. 18 (41) , 22731-22743
Synergistic conducting-polymer-coated silicon nanowires for breath waveform sensing
PPy/PANI-functionalized silicon nanowires exhibit enhanced response kinetics and long-term stability, enabling reliable real-time respiratory waveform monitoring for wearable sensing applications. The graphical abstract was created with Blender and Genspark.
- 29 October 2026
- Published by Royal Society of Chemistry (RSC) in Nanoscale
- Vol. 18 (41) , 22731-22743
Synergistic conducting-polymer-coated silicon nanowires for breath waveform sensing
PPy/PANI-functionalized silicon nanowires exhibit enhanced response kinetics and long-term stability, enabling reliable real-time respiratory waveform monitoring for wearable sensing applications. The graphical abstract was created with Blender and Genspark.
- 15 October 2026
- Published by Royal Society of Chemistry (RSC) in Journal of Materials Chemistry C
- Vol. 14 (39) , 18662-18671
Reduced iodide migration in MAPI via negatively charged defects
Trapping of an iodide vacancy (IVAC) by hydroxyl ions (OH − ) and a grain boundary (GB).
- 15 October 2026
- Published by Royal Society of Chemistry (RSC) in Journal of Materials Chemistry C
- Vol. 14 (39) , 18662-18671
Reduced iodide migration in MAPI via negatively charged defects
Trapping of an iodide vacancy (IVAC) by hydroxyl ions (OH − ) and a grain boundary (GB).
- Open Access
- 27 January 2025
- Published by Springer Nature in JOM
- Vol. 77 (4) , 2512-2526
Advancing Sustainability in Solar-Grade Silicon Production: Enhanced Boron and Phosphorus Removal via Silicon Refining from Al–Si Melt
Solar radiation is a renewable and practically infinite source of energy that creates no greenhouse gas emissions such as $${\text{CO}}_{2}$$ . Photovoltaic devices that turn solar energy directly into electricity are commonly made of high-purity solar-grade silicon, (SoG-Si). The SoG-Si is conventionally produced by a carbothermic reduction of quartz ( $${\text{SiO}}_{2}$$ ), resulting in roughly 98 wt.% metallurgical grade silicon (MG-Si), which is then further purified into SoG-Si using the Siemens process. The carbothermic step releases a large quantity of $${\text{CO}}_{2}$$ , and conventional purification methods require technically complicated equipment, consume intensive energy, and involve the use and production of highly toxic silane gases. This work has investigated a metallurgical purification method of MG-Si by solidification from aluminum-Si melt. Four purification rounds have been applied to ensure that boron and phosphorus are reduced to 314 $${\text{ppb}}_{{\text{a}}}$$ and 96 $${\text{ppb}}_{{\text{a}}}$$ respectively. A > 99.99 wt.% Si has been obtained, which can be further purified by the directional solidification method, and the purity of Si can be improved to 6N by effectively removing the other elements. The raw material of this process, the MG-Si, was produced by an aluminothermic process without direct $${\text{CO}}_{2}$$ emissions. Such a process, purification of MG-Si obtained from the aluminothermic reduction of a ferrosilicon slag, by a metallurgical route plus an additional step of directional solidification eliminates the use of highly hazardous silane gases associated with the conventional processes and requires much simpler equipment and lower operational energy, cost, and $${\text{CO}}_{2}$$ emissions.- 27 January 2025
- Published by Springer Nature in JOM
- Vol. 77 (4) , 2512-2526
Open AccessAdvancing Sustainability in Solar-Grade Silicon Production: Enhanced Boron and Phosphorus Removal via Silicon Refining from Al–Si Melt
Solar radiation is a renewable and practically infinite source of energy that creates no greenhouse gas emissions such as $${\text{CO}}_{2}$$ . Photovoltaic devices that turn solar energy directly into electricity are commonly made of high-purity solar-grade silicon, (SoG-Si). The SoG-Si is conventionally produced by a carbothermic reduction of quartz ( $${\text{SiO}}_{2}$$ ), resulting in roughly 98 wt.% metallurgical grade silicon (MG-Si), which is then further purified into SoG-Si using the Siemens process. The carbothermic step releases a large quantity of $${\text{CO}}_{2}$$ , and conventional purification methods require technically complicated equipment, consume intensive energy, and involve the use and production of highly toxic silane gases. This work has investigated a metallurgical purification method of MG-Si by solidification from aluminum-Si melt. Four purification rounds have been applied to ensure that boron and phosphorus are reduced to 314 $${\text{ppb}}_{{\text{a}}}$$ and 96 $${\text{ppb}}_{{\text{a}}}$$ respectively. A > 99.99 wt.% Si has been obtained, which can be further purified by the directional solidification method, and the purity of Si can be improved to 6N by effectively removing the other elements. The raw material of this process, the MG-Si, was produced by an aluminothermic process without direct $${\text{CO}}_{2}$$ emissions. Such a process, purification of MG-Si obtained from the aluminothermic reduction of a ferrosilicon slag, by a metallurgical route plus an additional step of directional solidification eliminates the use of highly hazardous silane gases associated with the conventional processes and requires much simpler equipment and lower operational energy, cost, and $${\text{CO}}_{2}$$ emissions. - Open Access
- 19 June 2024
- Published by Wiley in Advanced Photonics Research
- Vol. 5 (8)
Optimizing SiGe–SiO2 Visible–Short‐Wave Infrared Photoresponse by Modulating Interplay Between Strain and Defects Through Annealing
SiGe‐SiO2‐based structures present high interest for their high photosensitivity from visible to short‐wavelength infrared. Herein, two postdeposition annealing procedures, that is, rapid thermal annealing (RTA) and rapid‐like furnace annealing (FA), are compared. Both RTA and FA are performed at 600 °C for 1 min for SiGe nanocrystals (NCs) formation in SiO2 matrix in Si/SiO2/SiGe/SiO2 structures deposited by magnetron sputtering. The FA imitates RTA resulting in enhanced spectral response. X‐ray diffraction, transmission electron microscopy, and Raman spectroscopy are carried out showing Ge‐rich SiGe NCs with 11.3 ± 1.2 nm size for RTA and 9.4 ± 0.8 nm for FA. Photocurrent spectra for both structures show several peaks that are annealing dependent. The photocurrent intensity for FA samples is ≈7 times higher than RTA samples while cutoff wavelengths are slightly different, that is, 1365 nm for FA and 1375 nm for RTA. The FA structures show (at −1.5 V) over 4 A W−1 responsivity at 730 nm, 6.4 × 107 Jones detectivity at 735 nm, and 2.2 × 107 Jones at about 1210 nm. FA structures contain small SiGe NCs with incorporated residual strain, while RTA ones are formed of columnar SiGe NCs separated by SiGeOx amorphous regions and show increased tensile strain in the SiGe.
- 19 June 2024
- Published by Wiley in Advanced Photonics Research
- Vol. 5 (8)
Open AccessOptimizing SiGe–SiO2 Visible–Short‐Wave Infrared Photoresponse by Modulating Interplay Between Strain and Defects Through Annealing
SiGe‐SiO2‐based structures present high interest for their high photosensitivity from visible to short‐wavelength infrared. Herein, two postdeposition annealing procedures, that is, rapid thermal annealing (RTA) and rapid‐like furnace annealing (FA), are compared. Both RTA and FA are performed at 600 °C for 1 min for SiGe nanocrystals (NCs) formation in SiO2 matrix in Si/SiO2/SiGe/SiO2 structures deposited by magnetron sputtering. The FA imitates RTA resulting in enhanced spectral response. X‐ray diffraction, transmission electron microscopy, and Raman spectroscopy are carried out showing Ge‐rich SiGe NCs with 11.3 ± 1.2 nm size for RTA and 9.4 ± 0.8 nm for FA. Photocurrent spectra for both structures show several peaks that are annealing dependent. The photocurrent intensity for FA samples is ≈7 times higher than RTA samples while cutoff wavelengths are slightly different, that is, 1365 nm for FA and 1375 nm for RTA. The FA structures show (at −1.5 V) over 4 A W−1 responsivity at 730 nm, 6.4 × 107 Jones detectivity at 735 nm, and 2.2 × 107 Jones at about 1210 nm. FA structures contain small SiGe NCs with incorporated residual strain, while RTA ones are formed of columnar SiGe NCs separated by SiGeOx amorphous regions and show increased tensile strain in the SiGe.
- Open Access
- 1 January 2024
- Published by Elsevier in SSRN Electronic Journal
Energy analysis of solar-grade silicon purified by solidification from Al-Si melt
Around 90% of the global solar silicon (Si) production is made by Siemens and fluidized bed processes. Besides their complicated fabrication steps, they involve a high-power consumption and utilize hazardous chemicals. Energy use is usually accompanied by CO_2 emissions, which increases the carbon footprint of the solar Si. Metallurgical methods for making solar-Si have attracted attention in recent years since they are simple, efficient and operate with a lower energy consumption. Purification of Si from aluminum-Si (Al-Si) melt operates at a relatively low temperature (1100 ºC) and has the potential to reduce impurities to a few hundred ppb_w, including the elements of phosphorous and boron, which makes the process promising for the solar-grade Si industry. This work presents a thermodynamic analysis of solar Si made by four rounds of purification in Al-Si melt. The fusion heat of Si in Al has been estimated for 577 ºC to 1100 ºC and included in the study. Two scenarios have been analyzed for the Al recycling in the process and it found that the more recycled Al is included in the process, the higher the Si recovery and the lower the energy consumption.
- 1 January 2024
- Published by Elsevier in SSRN Electronic Journal
Open AccessEnergy analysis of solar-grade silicon purified by solidification from Al-Si melt
Around 90% of the global solar silicon (Si) production is made by Siemens and fluidized bed processes. Besides their complicated fabrication steps, they involve a high-power consumption and utilize hazardous chemicals. Energy use is usually accompanied by CO_2 emissions, which increases the carbon footprint of the solar Si. Metallurgical methods for making solar-Si have attracted attention in recent years since they are simple, efficient and operate with a lower energy consumption. Purification of Si from aluminum-Si (Al-Si) melt operates at a relatively low temperature (1100 ºC) and has the potential to reduce impurities to a few hundred ppb_w, including the elements of phosphorous and boron, which makes the process promising for the solar-grade Si industry. This work presents a thermodynamic analysis of solar Si made by four rounds of purification in Al-Si melt. The fusion heat of Si in Al has been estimated for 577 ºC to 1100 ºC and included in the study. Two scenarios have been analyzed for the Al recycling in the process and it found that the more recycled Al is included in the process, the higher the Si recovery and the lower the energy consumption.
- Open Access
Application of p and n-Type Silicon Nanowires as Human Respiratory Sensing Device
Accurate and fast breath monitoring is of great importance for various healthcare applications, for example, medical diagnoses, studying sleep apnea, and early detection of physiological disorders. Devices meant for such applications tend to be uncomfortable for the subject (patient) and pricey. Therefore, there is a need for a cost-effective, lightweight, small-dimensional, and non-invasive device whose presence does not interfere with the observed signals. This paper reports on the fabrication of a highly sensitive human respiratory sensor based on silicon nanowires (SiNWs) fabricated by a top-down method of metal-assisted chemical-etching (MACE). Besides other important factors, reducing the final cost of the sensor is of paramount importance. One of the factors that increases the final price of the sensors is using gold (Au) electrodes. Herein, we investigate the sensor’s response using aluminum (Al) electrodes as a cost-effective alternative, considering the fact that the electrode’s work function is crucial in electronic device design, impacting device electronic properties and electron transport efficiency at the electrode–semiconductor interface. Therefore a comparison is made between SiNWs breath sensors made from both p-type and n-type silicon to investigate the effect of the dopant and electrode type on the SiNWs respiratory sensing functionality. A distinct directional variation was observed in the sample’s response with Au and Al electrodes. Finally, performing a qualitative study revealed that the electrical resistance across the SiNWs renders greater sensitivity to breath than to dry air pressure. No definitive research demonstrating the mechanism behind these effects exists, thus prompting our study to investigate the underlying process.
Open AccessApplication of p and n-Type Silicon Nanowires as Human Respiratory Sensing Device
Accurate and fast breath monitoring is of great importance for various healthcare applications, for example, medical diagnoses, studying sleep apnea, and early detection of physiological disorders. Devices meant for such applications tend to be uncomfortable for the subject (patient) and pricey. Therefore, there is a need for a cost-effective, lightweight, small-dimensional, and non-invasive device whose presence does not interfere with the observed signals. This paper reports on the fabrication of a highly sensitive human respiratory sensor based on silicon nanowires (SiNWs) fabricated by a top-down method of metal-assisted chemical-etching (MACE). Besides other important factors, reducing the final cost of the sensor is of paramount importance. One of the factors that increases the final price of the sensors is using gold (Au) electrodes. Herein, we investigate the sensor’s response using aluminum (Al) electrodes as a cost-effective alternative, considering the fact that the electrode’s work function is crucial in electronic device design, impacting device electronic properties and electron transport efficiency at the electrode–semiconductor interface. Therefore a comparison is made between SiNWs breath sensors made from both p-type and n-type silicon to investigate the effect of the dopant and electrode type on the SiNWs respiratory sensing functionality. A distinct directional variation was observed in the sample’s response with Au and Al electrodes. Finally, performing a qualitative study revealed that the electrical resistance across the SiNWs renders greater sensitivity to breath than to dry air pressure. No definitive research demonstrating the mechanism behind these effects exists, thus prompting our study to investigate the underlying process.
- Open Access
Piezoresistance Characterization of Silicon Nanowires in Uniaxial and Isostatic Pressure Variation
Silicon nanowires (SiNWs) are known to exhibit a large piezoresistance (PZR) effect, making them suitable for various sensing applications. Here, we report the results of a PZR investigation on randomly distributed and interconnected vertical silicon nanowire arrays as a pressure sensor. The samples were produced from p-type (100) Si wafers using a silver catalyzed top-down etching process. The piezoresistance response of these SiNW arrays was analyzed by measuring their I-V characteristics under applied uniaxial as well as isostatic pressure. The interconnected SiNWs exhibit increased mechanical stability in comparison with separated or periodic nanowires. The repeatability of the fabrication process and statistical distribution of measurements were also tested on several samples from different batches. A sensing resolution down to roughly 1 pressure was observed with uniaxial force application, and more than two orders of magnitude resistance variation were determined for isostatic pressure below atmospheric pressure.Open AccessPiezoresistance Characterization of Silicon Nanowires in Uniaxial and Isostatic Pressure Variation
Silicon nanowires (SiNWs) are known to exhibit a large piezoresistance (PZR) effect, making them suitable for various sensing applications. Here, we report the results of a PZR investigation on randomly distributed and interconnected vertical silicon nanowire arrays as a pressure sensor. The samples were produced from p-type (100) Si wafers using a silver catalyzed top-down etching process. The piezoresistance response of these SiNW arrays was analyzed by measuring their I-V characteristics under applied uniaxial as well as isostatic pressure. The interconnected SiNWs exhibit increased mechanical stability in comparison with separated or periodic nanowires. The repeatability of the fabrication process and statistical distribution of measurements were also tested on several samples from different batches. A sensing resolution down to roughly 1 pressure was observed with uniaxial force application, and more than two orders of magnitude resistance variation were determined for isostatic pressure below atmospheric pressure. - Open Access
Piezoresistance characterization of silicon nanowires in uniaxial and isostatic pressure variation
Silicon nanowires (SiNWs) are known to exhibit large piezoresistance (PZR) effect, making it suitable for various sensing applications. Here, we report the results of a PZR investigation on randomly distributed and interconnected vertical silicon nanowire arrays as a pressure sensor. The samples were produced from p-type (100) Si wafers using a silver catalysed top-down etching process. The piezoresistance response of these SiNW arrays was analysed by measuring their I-V characteristics under applied uniaxial as well as isostatic pressure. The interconnected SiNWs exhibit increased mechanical stability in comparison with separated or periodic nanowires. The repeatability of the fabrication process and statistical distribution of measurements were also tested on several samples from different batches. A sensing resolution down to roughly \SI{1}{\milli\bar} pressure was observed with uniaxial force application, and more than two orders of magnitude resistance variation was determined for isostatic pressure below atmospheric pressure.
Open AccessPiezoresistance characterization of silicon nanowires in uniaxial and isostatic pressure variation
Silicon nanowires (SiNWs) are known to exhibit large piezoresistance (PZR) effect, making it suitable for various sensing applications. Here, we report the results of a PZR investigation on randomly distributed and interconnected vertical silicon nanowire arrays as a pressure sensor. The samples were produced from p-type (100) Si wafers using a silver catalysed top-down etching process. The piezoresistance response of these SiNW arrays was analysed by measuring their I-V characteristics under applied uniaxial as well as isostatic pressure. The interconnected SiNWs exhibit increased mechanical stability in comparison with separated or periodic nanowires. The repeatability of the fabrication process and statistical distribution of measurements were also tested on several samples from different batches. A sensing resolution down to roughly \SI{1}{\milli\bar} pressure was observed with uniaxial force application, and more than two orders of magnitude resistance variation was determined for isostatic pressure below atmospheric pressure.
- Open Access
- 27 November 2020
- Published by IOP Publishing in IOP SciNotes
- Vol. 1 (3) , 035203
Solid-state dewetting of silver-thin films: self-assembled nano-geometries
The study presents the dynamics of solid-state dewetting of silver (Ag)-film annealed in N2 ambient, analyzed by atomic force microscopy and scanning electron microscopy. Varying the annealing parameters (i.e. temperature and time) and Ag-film thicknesses were taken into account, to determine their effect over the solid-state dewetting of Ag-films. Several morphological evolutions from nanohole to the presence of metastable nanorings were observed. It was determined that structures annealed at high temperature (≥900 °C) and/or time (≥2 h) results in formation of metastable nanorings and whose geometrical aspects and population grew with increasing film thickness. Possible applications of the structures for fabrication of silicon nanowire arrays and photo-emitters are briefly described.
- 27 November 2020
- Published by IOP Publishing in IOP SciNotes
- Vol. 1 (3) , 035203
Open AccessSolid-state dewetting of silver-thin films: self-assembled nano-geometries
The study presents the dynamics of solid-state dewetting of silver (Ag)-film annealed in N2 ambient, analyzed by atomic force microscopy and scanning electron microscopy. Varying the annealing parameters (i.e. temperature and time) and Ag-film thicknesses were taken into account, to determine their effect over the solid-state dewetting of Ag-films. Several morphological evolutions from nanohole to the presence of metastable nanorings were observed. It was determined that structures annealed at high temperature (≥900 °C) and/or time (≥2 h) results in formation of metastable nanorings and whose geometrical aspects and population grew with increasing film thickness. Possible applications of the structures for fabrication of silicon nanowire arrays and photo-emitters are briefly described.
- 26 August 2020
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 128 (8) , 085304
Structural and photoluminescence study of TiO2 layer with self-assembled Si1−xGex nanoislands
We study the surface morphology and growth process of SiGe nanoislands on TiO2 films, deposited over Si (001) substrates by high power impulse magnetron sputtering, followed by varying annealing parameters (i.e., 500–750 °C for 30 min to 20 h). Structural analysis was performed by atomic force microscopy, scanning electron microscopy, and grazing incidence x-ray diffraction. Two structural schemes were taken into consideration, i.e., SiGe grown over pre-annealed TiO2 (scheme I) and as-grown TiO2 (scheme II). Photoluminescence (PL) study of the structures revealed spectral features comprised of multiple peak features related to localized and surface states within the oxide layer, along with a peak due to the SiGe nano-islands. It was observed that the spectral feature and intensity depend on the surface morphology and the crystallinity of the underlying TiO2 layer. The structures were subjected to low temperature PL measurements, and the spectra were de-convoluted in order to validate the origin of the obtained spectra. Structural analysis revealed that pre-annealing the underlying polycrystalline TiO2 film, prior to deposition of SiGe layers (scheme I), facilitates the formation of SiGe nanoislands, preferably along the grain boundaries (due to their higher interfacial energy). In comparison, for the case of SiGe deposited over as-grown TiO2 (scheme II), annealing of the structure resulted in random distribution of nanoislands across the entire film. The size of the nanoislands grew with increased annealing time up until the point they started to coalesce, forming discontinuous SiGe layers and eventually leading to melting of the layer.
- 26 August 2020
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 128 (8) , 085304
Structural and photoluminescence study of TiO2 layer with self-assembled Si1−xGex nanoislands
We study the surface morphology and growth process of SiGe nanoislands on TiO2 films, deposited over Si (001) substrates by high power impulse magnetron sputtering, followed by varying annealing parameters (i.e., 500–750 °C for 30 min to 20 h). Structural analysis was performed by atomic force microscopy, scanning electron microscopy, and grazing incidence x-ray diffraction. Two structural schemes were taken into consideration, i.e., SiGe grown over pre-annealed TiO2 (scheme I) and as-grown TiO2 (scheme II). Photoluminescence (PL) study of the structures revealed spectral features comprised of multiple peak features related to localized and surface states within the oxide layer, along with a peak due to the SiGe nano-islands. It was observed that the spectral feature and intensity depend on the surface morphology and the crystallinity of the underlying TiO2 layer. The structures were subjected to low temperature PL measurements, and the spectra were de-convoluted in order to validate the origin of the obtained spectra. Structural analysis revealed that pre-annealing the underlying polycrystalline TiO2 film, prior to deposition of SiGe layers (scheme I), facilitates the formation of SiGe nanoislands, preferably along the grain boundaries (due to their higher interfacial energy). In comparison, for the case of SiGe deposited over as-grown TiO2 (scheme II), annealing of the structure resulted in random distribution of nanoislands across the entire film. The size of the nanoislands grew with increased annealing time up until the point they started to coalesce, forming discontinuous SiGe layers and eventually leading to melting of the layer.