Cheng Li

The authors wish to modify the funding section as follows to this paper

In this work, performance improvements are described for a low-power consumption non-dispersive infrared (NDIR) methane (CH₄) gas sensor using customised optical thin film bandpass filters (BPFs) centered at 3300 nm. BPFs shape the spectral characteristics of the combined mid-infrared III–V based light emitting diode (LED)/photodiode (PD) light source/detector optopair, enhancing the NDIR CH₄ sensor performance. The BPFs, deposited using a novel microwave plasma-assisted pulsed DC sputter deposition process, provide room temperature deposition directly onto the temperature-sensitive PD heterostructure. BPFs comprise germanium (Ge) and niobium pentoxide (Nb₂O₅) alternating high and low refractive index layers, respectively. Two different optical filter designs are progressed with BPF bandwidths (BWs) of 160 and 300 nm. A comparison of the modelled and measured NDIR sensor performance is described, highlighting the maximised signal-to-noise ratio (SNR) and the minimised cross-talk performance benefits. The BPF spectral stability for various environmental temperature and humidity conditions is demonstrated.

In this work performance improvements are described of a low power consumption non-dispersive infrared (NDIR) methane (CH4) gas sensor using customised optical thin film bandpass filters (BPF). BPF’s shape the spectral characteristic of the combined mid infrared III-V based light emitting diode (LED)/ photodiode (PD) light source/detector optopair, enhancing NDIR CH4 sensor performance. The BPF, deposited using a novel microwave plasma assisted pulsed DC sputter deposition process, is deposited at room temperature directly onto the temperature sensitive PD heterostructure. BPF’s comprise germanium (Ge) and niobium pentoxide (Nb2O5) alternating high and low refractive index layers respectively. Two different optical filter designs are progressed; with BPF bandwidths (BWs) of 160 nm and 300 nm. Comparison of modelled and measured NDIR sensor performance is described, highlighting maximized signal to noise ratio (SNR) and minimized cross talk performance benefits. BPF spectral stability for various environmental temperature and humidity conditions is demonstrated.

Optimization of thin film uniformity is an important aspect for large-area coatings, particularly for optical coatings where error tolerances can be of the order of nanometers. Physical vapor deposition is a widely used technique for producing thin films. Applications include anti-reflection coatings, photovoltaics etc. This paper reviews the methods and simulations used for improving thin film uniformity in physical vapor deposition (both evaporation and sputtering), covering characteristic aspects of emission from material sources, projection/mask effects on film thickness distribution, as well as geometric and rotational influences from apparatus configurations. Following the review, a new program for modelling and simulating thin film uniformity for physical vapor deposition was developed using MathCAD. Results from the program were then compared with both known theoretical analytical equations of thickness distribution and experimental data, and found to be in good agreement. A mask for optimizing thin film thickness distribution designed using the program was shown to improve thickness uniformity from ±4% to ±0.56%.

TiO₂ deposition using separate regions for sputtering and oxidation is not well investigated. We optimized process parameter for such as oxygen flow and microwave power to produce high quality TiO₂ filters for Stereo/3D imaging applications. This deposition technique was chosen for its unique advantages: high deposition rates while increasing the probability of obtaining stoichiometric oxides, reduces possibility of target poisoning and provides better stability of process. Various characterization methods, such as scanning electron microscopy (SEM), atomic force microscopy (AFM), Raman, X-ray diffraction (XRD), transmission spectroscopy, were used in compliment to simulations for detailed analysis of deposited TiO₂ thin films. Process parameters were optimized to achieve TiO₂ films with low surface scattering and absorption for fabricating multi-passbands interference filter for 3D glasses. From observations and quantitative analysis of surfaces, it was seen that surface roughness increases while oxygen flow or microwave power increases. As the content of anatase phase also increases with higher microwave power and higher oxygen flow, the formation of anatase grains can cause higher surface roughness. Optical analysis of samples validates these trends and provided additional information for absorption trends. Optimized parameters for deposition process are then obtained and the final fabricated 3D glasses filters showed high match to design, within 0.5% range for thickness error.

Surface Enhanced Raman Spectroscopy presents a rapid, non-destructive method to identify chemical and biological samples with up to single molecule sensitivity. Since its discovery in 1974, the technique has become an intense field of interdisciplinary research, typically generating >2000 publications per year since 2011. The technique relies on the localised surface plasmon resonance phenomenon, where incident light can couple with plasmons at the interface that result in the generation of an intense electric field. This field can propagate from the surface from the metal-dielectric interface, so molecules within proximity will experience more intense Raman scattering. Localised surface plasmon resonance wavelength is determined by a number of factors, such as size, geometry and material. Due to the requirements of the surface optical response, Ag and Au are typical metals used for surface enhanced Raman applications. These metals then need to have nano features that improve the localised surface plasmon resonance, several variants of these substrates exist; surfaces can range from nanoparticles in a suspension, electrochemically roughened electrodes to metal nanostructures on a substrate. The latter will be the focus of this review, particularly reviewing substrates made by oblique angle deposition. Oblique angle deposition is the technique of growing thin films so that the material flux is not normal to the surface. Films grown in this fashion will possess nanostructures, due to the atomic self-shadowing effect, that are dependent mainly on the deposition angle. Recent developments, applications and highlights of surface enhanced Raman scattering substrates made by oblique angle deposition will be reviewed.