Ming-Hua Mao
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Previous Organizations / Institutes
The organizations / institutes from the scholar's other articles in the past ten years
Research Subjects
Ming-Hua Mao has a total of 102 co-authors. Here are the top co-authors by number of shared publications:
D. Bimberg
15 shared publicationsF. Heinrichsdorff
13 shared publicationsP. Borri
Fachbereich Physik, Universität Dortmund, Otto-Hahn Strasse 4, 44227 Dortmund, Germany
8 shared publicationsD.-C. Wu
Department of Electrical Engineering, Graduate Institute of Electronics Engineering, and Graduate Institute of Photonics and Optoelectronics, National Taiwan University, No.1, Sec. 4, Roosevelt Road, Taipei, 106, China
6 shared publications- Jørn Märcher Hvam
Tech Univ Denmark, DTU Foton, DK-2800 Lyngby, Denmark
6 shared publications Hao-Hsiung Lin
Graduate Institute of Electronics Engineering, National Taiwan University, No. 1, Roosevelt Rd. Sec. 4, Taipei, 10617, Taiwan
5 shared publications
Latest Publications
- 7 September 2023
- Published by Japan Society of Applied Physics
Photonic Inter-Layer Vias for Three-Dimensional Optical Signal Transmission and Effect of Increased Surface Recombination Velocity
2023 International Conference on Solid State Devices and Materials ,Photonic Inter-Layer Vias for Three-Dimensional Optical Signal Transmission and Effect of Increased Surface Recombination Velocity
- 7 September 2023
- Published by Japan Society of Applied Physics
Photonic Inter-Layer Vias for Three-Dimensional Optical Signal Transmission and Effect of Increased Surface Recombination Velocity
2023 International Conference on Solid State Devices and Materials ,Photonic Inter-Layer Vias for Three-Dimensional Optical Signal Transmission and Effect of Increased Surface Recombination Velocity
- Open Access
- 24 March 2023
- Published by Optica Publishing Group in Optics Express
- Vol. 31 (7) , 11820-11828
Three-dimensional inter-layer optical signal transmission realized by a monolithically integrated semiconductor-based carrier transport structure
In this study, we proposed and demonstrated a brand new type of monolithic photonic devices which realizes the three-dimensional (3D) all-optical switching for inter-layer signal transmission. This device is composed of a vertical Si microrod which serves as optical absorption material within a SiN waveguide in one layer and as an index modulation structure within a SiN microdisk resonator lying in the other layer. The ambipolar photo-carrier transport property in the Si microrod was studied by measuring the resonant wavelength shifts under continuous-wave laser pumping. The ambipolar diffusion length can be extracted to be 0.88 µm. Based on the ambipolar photo-carrier transport in a Si microrod through different layers, we presented a fully-integrated all-optical switching operation using this Si microrod and a SiN microdisk with a pump-probe technique through the on-chip SiN waveguides. The switching time windows for the on-resonance operation mode and the off-resonance operation mode can be extracted to be 439 ps and 87 ps, respectively. This device shows potential applications for the future all-optical computing and communication with more practical and flexible configurations in monolithic 3D photonic integrated circuits (3D-PICs).
- 24 March 2023
- Published by Optica Publishing Group in Optics Express
- Vol. 31 (7) , 11820-11828
Open AccessThree-dimensional inter-layer optical signal transmission realized by a monolithically integrated semiconductor-based carrier transport structure
In this study, we proposed and demonstrated a brand new type of monolithic photonic devices which realizes the three-dimensional (3D) all-optical switching for inter-layer signal transmission. This device is composed of a vertical Si microrod which serves as optical absorption material within a SiN waveguide in one layer and as an index modulation structure within a SiN microdisk resonator lying in the other layer. The ambipolar photo-carrier transport property in the Si microrod was studied by measuring the resonant wavelength shifts under continuous-wave laser pumping. The ambipolar diffusion length can be extracted to be 0.88 µm. Based on the ambipolar photo-carrier transport in a Si microrod through different layers, we presented a fully-integrated all-optical switching operation using this Si microrod and a SiN microdisk with a pump-probe technique through the on-chip SiN waveguides. The switching time windows for the on-resonance operation mode and the off-resonance operation mode can be extracted to be 439 ps and 87 ps, respectively. This device shows potential applications for the future all-optical computing and communication with more practical and flexible configurations in monolithic 3D photonic integrated circuits (3D-PICs).
- Open Access
- 8 November 2021
- Published by Springer Nature in Scientific Reports
- Vol. 11 (1) , 1-9
Minority carrier decay length extraction from scanning photocurrent profiles in two-dimensional carrier transport structures
Carrier transport was studied both numerically and experimentally using scanning photocurrent microscopy (SPCM) in two-dimensional (2D) transport structures, where the structure size in the third dimension is much smaller than the diffusion length and electrodes cover the whole terminal on both sides. Originally, one would expect that with increasing width in 2D transport structures, scanning photocurrent profiles will gradually deviate from those of the ideal one-dimensional (1D) transport structure. However, the scanning photocurrent simulation results surprisingly showed almost identical profiles from structures with different widths. In order to clarify this phenomenon, we observed the spatial distribution of carriers. The simulation results indicate that the integrated carrier distribution in the 2D transport structures with finite width can be well described by a simple-exponential-decay function with the carrier decay length as the fitting parameter, just like in the 1D transport structures. For ohmic-contact 2D transport structures, the feasibility of the fitting formula from our previous 1D analytical model was confirmed. On the other hand, the application of a simple-exponential-decay function in scanning photocurrent profiles for the diffusion length extraction in Schottky-contact 2D transport structures was also justified. Furthermore, our simulation results demonstrate that the scanning photocurrent profiles in the ohmic- or Schottky-contact three-dimensional (3D) transport structures with electrodes covering the whole terminal on both sides will reduce to those described by the corresponding 1D fitting formulae. Finally, experimental SPCM on a p-type InGaAs air-bridge two-terminal thin-film device was carried out. The measured photocurrent profiles can be well fitted by the specific fitting formula derived from our previous 1D analytical model and the extracted electron mobility-lifetime product of this thin-film device is 6.6 × 10–7 cm2·V−1. This study allows us to extract the minority carrier decay length and to obtain the mobility-lifetime product which can be used to evaluate the performance of 2D carrier transport devices.
- 8 November 2021
- Published by Springer Nature in Scientific Reports
- Vol. 11 (1) , 1-9
Open AccessMinority carrier decay length extraction from scanning photocurrent profiles in two-dimensional carrier transport structures
Carrier transport was studied both numerically and experimentally using scanning photocurrent microscopy (SPCM) in two-dimensional (2D) transport structures, where the structure size in the third dimension is much smaller than the diffusion length and electrodes cover the whole terminal on both sides. Originally, one would expect that with increasing width in 2D transport structures, scanning photocurrent profiles will gradually deviate from those of the ideal one-dimensional (1D) transport structure. However, the scanning photocurrent simulation results surprisingly showed almost identical profiles from structures with different widths. In order to clarify this phenomenon, we observed the spatial distribution of carriers. The simulation results indicate that the integrated carrier distribution in the 2D transport structures with finite width can be well described by a simple-exponential-decay function with the carrier decay length as the fitting parameter, just like in the 1D transport structures. For ohmic-contact 2D transport structures, the feasibility of the fitting formula from our previous 1D analytical model was confirmed. On the other hand, the application of a simple-exponential-decay function in scanning photocurrent profiles for the diffusion length extraction in Schottky-contact 2D transport structures was also justified. Furthermore, our simulation results demonstrate that the scanning photocurrent profiles in the ohmic- or Schottky-contact three-dimensional (3D) transport structures with electrodes covering the whole terminal on both sides will reduce to those described by the corresponding 1D fitting formulae. Finally, experimental SPCM on a p-type InGaAs air-bridge two-terminal thin-film device was carried out. The measured photocurrent profiles can be well fitted by the specific fitting formula derived from our previous 1D analytical model and the extracted electron mobility-lifetime product of this thin-film device is 6.6 × 10–7 cm2·V−1. This study allows us to extract the minority carrier decay length and to obtain the mobility-lifetime product which can be used to evaluate the performance of 2D carrier transport devices.
- Open Access
- 23 March 2020
- Published by Springer Nature in Scientific Reports
- Vol. 10 (1) , 1-7
A New Fitting Method for Ambipolar Diffusion Length Extraction in Thin Film Structures Using Photoluminescence Measurement with Scanning Excitation
A new simple method is proposed to extract the ambipolar diffusion length for two-dimensional (2D) electronic transport in thin film structures using a scanning photoluminescence microscopy (SPLM) setup. No spatially-resolved photoluminescence detection methods are required. By measuring the excitation-position-dependent PL intensity across the edge of a semiconductor, ambipolar diffusion length can be extracted from the SPLM profile through a simple analytic fitting function. Numerical simulation was first used to verify the fitting method. Then the fitting method was applied to extract the ambipolar diffusion length from the measured SPLM profile of a GaAs thin film structure. Carrier lifetime was obtained in an accompanying time-resolved photoluminescence measurement under the same excitation condition, and thus the ambipolar diffusion coefficient can be determined simultaneously. The new fitting method provides a simple way to evaluate carrier transport properties in 2D electronic transport structures such as thin films or quantum wells.
- 23 March 2020
- Published by Springer Nature in Scientific Reports
- Vol. 10 (1) , 1-7
Open AccessA New Fitting Method for Ambipolar Diffusion Length Extraction in Thin Film Structures Using Photoluminescence Measurement with Scanning Excitation
A new simple method is proposed to extract the ambipolar diffusion length for two-dimensional (2D) electronic transport in thin film structures using a scanning photoluminescence microscopy (SPLM) setup. No spatially-resolved photoluminescence detection methods are required. By measuring the excitation-position-dependent PL intensity across the edge of a semiconductor, ambipolar diffusion length can be extracted from the SPLM profile through a simple analytic fitting function. Numerical simulation was first used to verify the fitting method. Then the fitting method was applied to extract the ambipolar diffusion length from the measured SPLM profile of a GaAs thin film structure. Carrier lifetime was obtained in an accompanying time-resolved photoluminescence measurement under the same excitation condition, and thus the ambipolar diffusion coefficient can be determined simultaneously. The new fitting method provides a simple way to evaluate carrier transport properties in 2D electronic transport structures such as thin films or quantum wells.
- Open Access
- 1 July 2019
- Published by Springer Nature in Scientific Reports
- Vol. 9 (1) , 9426
A New Analytic Formula for Minority Carrier Decay Length Extraction from Scanning Photocurrent Profiles in Ohmic-Contact Nanowire Devices
Spatially resolved current measurements such as scanning photocurrent microscopy (SPCM) have been extensively applied to investigate carrier transport properties in semiconductor nanowires. A traditional simple-exponential-decay formula based on the assumption of carrier diffusion dominance in the scanning photocurrent profiles can be applied for carrier diffusion length extraction using SPCM in Schottky-contact-based or p-n junction-based devices where large built-in electric fields exist. However, it is also important to study the electric-field dependent transport properties in widely used ohmic-contact nanowire devices where the assumption of carrier diffusion dominance is invalid. Here we derive an analytic formula for scanning photocurrent profiles in such ohmic-contact nanowire devices under uniform applied electric fields and weak optical excitation. Under these operation conditions and the influence of photo-carrier-induced electric field, the scanning photocurrent profile and the carrier spatial distribution strikingly do not share the same functional form. Instead, a surprising new analytic relation between the scanning photocurrent profile and the minority carrier decay length was established. Then the derived analytic formula was validated numerically and experimentally. This analytic formula provides a new fitting method for SPCM profiles to correctly determine the minority carrier decay length, which allows us to quantitatively evaluate the performance of nanowire-based devices.
- 1 July 2019
- Published by Springer Nature in Scientific Reports
- Vol. 9 (1) , 9426
Open AccessA New Analytic Formula for Minority Carrier Decay Length Extraction from Scanning Photocurrent Profiles in Ohmic-Contact Nanowire Devices
Spatially resolved current measurements such as scanning photocurrent microscopy (SPCM) have been extensively applied to investigate carrier transport properties in semiconductor nanowires. A traditional simple-exponential-decay formula based on the assumption of carrier diffusion dominance in the scanning photocurrent profiles can be applied for carrier diffusion length extraction using SPCM in Schottky-contact-based or p-n junction-based devices where large built-in electric fields exist. However, it is also important to study the electric-field dependent transport properties in widely used ohmic-contact nanowire devices where the assumption of carrier diffusion dominance is invalid. Here we derive an analytic formula for scanning photocurrent profiles in such ohmic-contact nanowire devices under uniform applied electric fields and weak optical excitation. Under these operation conditions and the influence of photo-carrier-induced electric field, the scanning photocurrent profile and the carrier spatial distribution strikingly do not share the same functional form. Instead, a surprising new analytic relation between the scanning photocurrent profile and the minority carrier decay length was established. Then the derived analytic formula was validated numerically and experimentally. This analytic formula provides a new fitting method for SPCM profiles to correctly determine the minority carrier decay length, which allows us to quantitatively evaluate the performance of nanowire-based devices.
- 13 March 2017
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Selected Topics in Quantum Electronics
- Vol. 23 (5) , 1-5
Continuous Wave Operation of SiO2 Sandwiched Colloidal CdSe/ZnS Quantum-Dot Microdisk Lasers
We report continuous wave operation of SiO 2 sandwiched colloidal CdSe/ZnS quantum-dot microdisk lasers at room temperature. The SiO 2 sandwiched quantum dot structure is formed first and then the disk patterns are defined by e-beam lithography. The benefits of introducing the sandwich structure are two folds: one to increase the confinement factor and the other to reduce the photo-oxidation of quantum dots. The luminescence stability of CdSe/ZnS quantum dots is much improved after they are sandwiched in silicon dioxide. We observe whispering gallery modes spatially and spectrally in the microdisks. We also fabricated Si 3 N 4 microdisks for comparison. The result shows that Si 3 N 4 microdisks are severely damaged when operating under continuous wave excitation while SiO 2 microdisks demonstrate stable lasing behavior at the same excitation condition. Therefore, SiO 2 microdisks are more suitable for high excitation and/or continuous wave applications such as lasers. This device structure shows great potentials to be applied to other wavelength in the visible range.
- 13 March 2017
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Selected Topics in Quantum Electronics
- Vol. 23 (5) , 1-5
Continuous Wave Operation of SiO2 Sandwiched Colloidal CdSe/ZnS Quantum-Dot Microdisk Lasers
We report continuous wave operation of SiO 2 sandwiched colloidal CdSe/ZnS quantum-dot microdisk lasers at room temperature. The SiO 2 sandwiched quantum dot structure is formed first and then the disk patterns are defined by e-beam lithography. The benefits of introducing the sandwich structure are two folds: one to increase the confinement factor and the other to reduce the photo-oxidation of quantum dots. The luminescence stability of CdSe/ZnS quantum dots is much improved after they are sandwiched in silicon dioxide. We observe whispering gallery modes spatially and spectrally in the microdisks. We also fabricated Si 3 N 4 microdisks for comparison. The result shows that Si 3 N 4 microdisks are severely damaged when operating under continuous wave excitation while SiO 2 microdisks demonstrate stable lasing behavior at the same excitation condition. Therefore, SiO 2 microdisks are more suitable for high excitation and/or continuous wave applications such as lasers. This device structure shows great potentials to be applied to other wavelength in the visible range.
- 24 August 2016
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 120 (8) , 083103
Photo-stability and time-resolved photoluminescence study of colloidal CdSe/ZnS quantum dots passivated in Al2O3 using atomic layer deposition
We report photo-stability enhancement of colloidal CdSe/ZnS quantum dots (QDs) passivated in Al2O3 thin film using the atomic layer deposition (ALD) technique. 62% of the original peak photoluminescence (PL) intensity remained after ALD. The photo-oxidation and photo-induced fluorescence enhancement effects of both the unpassivated and passivated QDs were studied under various conditions, including different excitation sources, power densities, and environment. The unpassivated QDs showed rapid PL degradation under high excitation due to strong photo-oxidation in air while the PL intensity of Al2O3 passivated QDs was found to remain stable. Furthermore, recombination dynamics of the unpassivated and passivated QDs were investigated by time-resolved measurements. The average lifetime of the unpassivated QDs decreases with laser irradiation time due to photo-oxidation. Photo-oxidation creates surface defects which reduces the QD emission intensity and enhances the non-radiative recombination rate. From the comparison of PL decay profiles of the unpassivated and passivated QDs, photo-oxidation-induced surface defects unexpectedly also reduce the radiative recombination rate. The ALD passivation of Al2O3 protects QDs from photo-oxidation and therefore avoids the reduction of radiative recombination rate. Our experimental results demonstrated that passivation of colloidal QDs by ALD is a promising method to well encapsulate QDs to prevent gas permeation and to enhance photo-stability, including the PL intensity and carrier lifetime in air. This is essential for the applications of colloidal QDs in light-emitting devices.
- 24 August 2016
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 120 (8) , 083103
Photo-stability and time-resolved photoluminescence study of colloidal CdSe/ZnS quantum dots passivated in Al2O3 using atomic layer deposition
We report photo-stability enhancement of colloidal CdSe/ZnS quantum dots (QDs) passivated in Al2O3 thin film using the atomic layer deposition (ALD) technique. 62% of the original peak photoluminescence (PL) intensity remained after ALD. The photo-oxidation and photo-induced fluorescence enhancement effects of both the unpassivated and passivated QDs were studied under various conditions, including different excitation sources, power densities, and environment. The unpassivated QDs showed rapid PL degradation under high excitation due to strong photo-oxidation in air while the PL intensity of Al2O3 passivated QDs was found to remain stable. Furthermore, recombination dynamics of the unpassivated and passivated QDs were investigated by time-resolved measurements. The average lifetime of the unpassivated QDs decreases with laser irradiation time due to photo-oxidation. Photo-oxidation creates surface defects which reduces the QD emission intensity and enhances the non-radiative recombination rate. From the comparison of PL decay profiles of the unpassivated and passivated QDs, photo-oxidation-induced surface defects unexpectedly also reduce the radiative recombination rate. The ALD passivation of Al2O3 protects QDs from photo-oxidation and therefore avoids the reduction of radiative recombination rate. Our experimental results demonstrated that passivation of colloidal QDs by ALD is a promising method to well encapsulate QDs to prevent gas permeation and to enhance photo-stability, including the PL intensity and carrier lifetime in air. This is essential for the applications of colloidal QDs in light-emitting devices.
- 20 April 2015
- Published by Optica Publishing Group in Optics Letters
- Vol. 40 (9) , 1904-1907
InAsSb/InAsPSb multiple quantum well disk cavities with pedestal structures on a GaSb substrate for mid-infrared whispering-gallery-mode emission beyond 4 μm
The mid-infrared whispering-gallery-mode disk cavities with multiple quantum wells active medium on a GaSb substrate were fabricated. For this material system in the mid-infrared range, fabrication techniques were developed to form the disk cavity structure. The smooth sidewalls of the disk cavities were achieved by appropriate gas mixture flow ratio of in the inductively coupled plasma-reactive ion etching. In addition, selective wet etching technique was used to form the pedestal of the disk cavity using dilute hydrofluoric acid with good selectivity. For efficient confinement of the whispering gallery modes along the radial direction, the extent of the lateral etching was carefully controlled. The processed 30-μm-diameter disk cavities were optically pumped, and the whispering gallery modes with wavelengths around 4.1 μm can be observed up to 90 K.- 20 April 2015
- Published by Optica Publishing Group in Optics Letters
- Vol. 40 (9) , 1904-1907
InAsSb/InAsPSb multiple quantum well disk cavities with pedestal structures on a GaSb substrate for mid-infrared whispering-gallery-mode emission beyond 4 μm
The mid-infrared whispering-gallery-mode disk cavities with multiple quantum wells active medium on a GaSb substrate were fabricated. For this material system in the mid-infrared range, fabrication techniques were developed to form the disk cavity structure. The smooth sidewalls of the disk cavities were achieved by appropriate gas mixture flow ratio of in the inductively coupled plasma-reactive ion etching. In addition, selective wet etching technique was used to form the pedestal of the disk cavity using dilute hydrofluoric acid with good selectivity. For efficient confinement of the whispering gallery modes along the radial direction, the extent of the lateral etching was carefully controlled. The processed 30-μm-diameter disk cavities were optically pumped, and the whispering gallery modes with wavelengths around 4.1 μm can be observed up to 90 K.- 1 December 2014
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- No. 10928081,p. 102-103
High-Q current-injection InAs quantum-dot microdisk lasers operating at room temperature
We report room-temperature operation of current-injection InAs quantum-dot microdisk lasers with quality factor >23,000. The lasing wavelength is at 1136nm with threshold current of 0.39mA.
- 1 December 2014
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- No. 10928081,p. 102-103
High-Q current-injection InAs quantum-dot microdisk lasers operating at room temperature
We report room-temperature operation of current-injection InAs quantum-dot microdisk lasers with quality factor >23,000. The lasing wavelength is at 1136nm with threshold current of 0.39mA.
- 1 December 2014
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 110-111
All-optical switching in a GaAs microdisk resonator
We demonstrated high-speed all-optical switching in a GaAs microdisk resonator using the tapered fiber pump probe technique. The optical transmission of the resonator was modulated with a time response of 43 ps.
- 1 December 2014
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 110-111
All-optical switching in a GaAs microdisk resonator
We demonstrated high-speed all-optical switching in a GaAs microdisk resonator using the tapered fiber pump probe technique. The optical transmission of the resonator was modulated with a time response of 43 ps.