Mike Marchywka
Research Subjects
Research Interests
Mike Marchywka has a total of 8 co-authors. Here are the top co-authors by number of shared publications:
Daniel Moses
E. O. Hulbert Center for Space Sciences, Naval Research Laboratory, Washington, DC 20375‐5000
2 shared publicationsSteven C. Binari
Electronic Science and Technology Division, Naval Research Laboratory, Washington, DC 20375‐5000
2 shared publicationsD. Moses
E.O. Hulburt Center for Space Sciences
1 shared publicationDeborah A. Koolbeck
E.O. Hulburt Center for Space Research Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375-5000 Internet
1 shared publicationDennis G. Socker
1 shared publicationP. E. Pehrsson
Naval Research Laboratory
1 shared publication
Latest Publications
- 1 January 1995
- Published by Springer Nature
- p. 161-170
Diamond MIS Capacitors with Silicon Dioxide Dielectric
- 1 January 1995
- Published by Springer Nature
- p. 161-170
Diamond MIS Capacitors with Silicon Dioxide Dielectric
- 1 February 1993
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 140 (2) , L19-L22
Electrochemical Patterning of Amorphous Carbon on Diamond
The ability to pattern ion‐implantation damaged or other nondiamond carbon on a diamond substrate is useful for fabricating a variety of devices. We accomplished such patterning by an unmasked implantation into a diamond substrate followed by photolithography and a selective electrochemical etch. The use of a high resistivity medium coupled with applied biases over 50 V permitted etching without requiring contact between the substrate and an electrode. Many electrolytes gave etches that exhibit high selectivity for nondiamond carbon over both diamond and dielectrics such as photoresist. Optical, electrical, and Raman spectroscopic measurements elucidate the effects of the etch on the implanted diamond surface.
- 1 February 1993
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 140 (2) , L19-L22
Electrochemical Patterning of Amorphous Carbon on Diamond
The ability to pattern ion‐implantation damaged or other nondiamond carbon on a diamond substrate is useful for fabricating a variety of devices. We accomplished such patterning by an unmasked implantation into a diamond substrate followed by photolithography and a selective electrochemical etch. The use of a high resistivity medium coupled with applied biases over 50 V permitted etching without requiring contact between the substrate and an electrode. Many electrolytes gave etches that exhibit high selectivity for nondiamond carbon over both diamond and dielectrics such as photoresist. Optical, electrical, and Raman spectroscopic measurements elucidate the effects of the etch on the implanted diamond surface.
- 1 January 1993
- Published by Springer Nature in MRS Proceedings
- Vol. 302
Band-Edge Photoresponse Characteristics of Diamond Msm's
- 1 January 1993
- Published by Springer Nature in MRS Proceedings
- Vol. 302
Band-Edge Photoresponse Characteristics of Diamond Msm's
- 1 December 1992
- Published by Optica Publishing Group in Applied Optics
- Vol. 31 (34) , 7198-7213
Modulation transfer function measurement technique for small-pixel detectors
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.
- 1 December 1992
- Published by Optica Publishing Group in Applied Optics
- Vol. 31 (34) , 7198-7213
Modulation transfer function measurement technique for small-pixel detectors
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.