Khalid Saeed
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
Research Interests
Khalid Saeed has a total of 13 co-authors. Here are the top co-authors by number of shared publications:
- Iftikhar Ahmad
Center of Excellence for Research in Engineering Materials, Deanship of Scientific Research, King Saud University, P.O. Box 800, Riyadh 11421, Saudi Arabia
3 shared publications - Mohammad Islam
GE Aerospace, 3290 Patterson Ave SE, Grand Rapids, MI 49512, USA
3 shared publications - Amine Achour
LISE Laboratory, Research Centre in Physics of Matter and Radiation (PMR), University of Namur, B-5000 Namur, Belgium
2 shared publications - Muhammad Aftab Akram
School of Chemical and Materials Engineering, National University of Sciences and Technology (NUST), Sector H-12, Islamabad 44000, Pakistan
2 shared publications - Adeel Riaz
School of Chemical and Materials Engineering, National University of Sciences and Technology, Islamabad 44000, Pakistan
1 shared publication - Amna Ashraf
School of Chemical and Materials Engineering, National University of Sciences and Technology, Islamabad 44000, Pakistan
1 shared publication
Latest Publications
- Open Access
- 23 May 2019
- Published by MDPI AG in Nanomaterials
- Vol. 9 (5) , 794
Orange/Red Photoluminescence Enhancement Upon SF6 Plasma Treatment of Vertically Aligned ZnO Nanorods
Although the origin and possible mechanisms for green and yellow emission from different zinc oxide (ZnO) forms have been extensively investigated, the same for red/orange PL emission from ZnO nanorods (nR) remains largely unaddressed. In this work, vertically aligned zinc oxide nanorods arrays (ZnO nR) were produced using hydrothermal process followed by plasma treatment in argon/sulfur hexafluoride (Ar/SF6) gas mixture for different time. The annealed samples were highly crystalline with ~45 nm crystallite size, (002) preferred orientation, and a relatively low strain value of 1.45 × 10−3, as determined from X-ray diffraction pattern. As compared to as-deposited ZnO nR, the plasma treatment under certain conditions demonstrated enhancement in the room temperature photoluminescence (PL) emission intensity, in the visible orange/red spectral regime, by a factor of 2. The PL intensity enhancement induced by SF6 plasma treatment may be attributed to surface chemistry modification as confirmed by X-ray photoelectron spectroscopy (XPS) studies. Several factors including presence of hydroxyl group on the ZnO surface, increased oxygen level in the ZnO lattice (OL), generation of F–OH and F–Zn bonds and passivation of surface states and bulk defects are considered to be active towards red/orange emission in the PL spectrum. The PL spectra were deconvoluted into component Gaussian sub-peaks representing transitions from conduction-band minimum (CBM) to oxygen interstitials (Oi) and CBM to oxygen vacancies (VO) with corresponding photon energies of 2.21 and 1.90 eV, respectively. The optimum plasma treatment route for ZnO nanostructures with resulting enhancement in the PL emission offers strong potential for photonic applications such as visible wavelength phosphors.
- 23 May 2019
- Published by MDPI AG in Nanomaterials
- Vol. 9 (5) , 794
Open AccessOrange/Red Photoluminescence Enhancement Upon SF6 Plasma Treatment of Vertically Aligned ZnO Nanorods
Although the origin and possible mechanisms for green and yellow emission from different zinc oxide (ZnO) forms have been extensively investigated, the same for red/orange PL emission from ZnO nanorods (nR) remains largely unaddressed. In this work, vertically aligned zinc oxide nanorods arrays (ZnO nR) were produced using hydrothermal process followed by plasma treatment in argon/sulfur hexafluoride (Ar/SF6) gas mixture for different time. The annealed samples were highly crystalline with ~45 nm crystallite size, (002) preferred orientation, and a relatively low strain value of 1.45 × 10−3, as determined from X-ray diffraction pattern. As compared to as-deposited ZnO nR, the plasma treatment under certain conditions demonstrated enhancement in the room temperature photoluminescence (PL) emission intensity, in the visible orange/red spectral regime, by a factor of 2. The PL intensity enhancement induced by SF6 plasma treatment may be attributed to surface chemistry modification as confirmed by X-ray photoelectron spectroscopy (XPS) studies. Several factors including presence of hydroxyl group on the ZnO surface, increased oxygen level in the ZnO lattice (OL), generation of F–OH and F–Zn bonds and passivation of surface states and bulk defects are considered to be active towards red/orange emission in the PL spectrum. The PL spectra were deconvoluted into component Gaussian sub-peaks representing transitions from conduction-band minimum (CBM) to oxygen interstitials (Oi) and CBM to oxygen vacancies (VO) with corresponding photon energies of 2.21 and 1.90 eV, respectively. The optimum plasma treatment route for ZnO nanostructures with resulting enhancement in the PL emission offers strong potential for photonic applications such as visible wavelength phosphors.
- Open Access
Photocatalytic and Photostability Behavior of Ag- and/or Al-Doped ZnO Films in Methylene Blue and Rhodamine B under UV-C Irradiation
Silver (Ag) and/or aluminum (Al)-doped zinc oxide (ZnO:Ag, ZnO:Al) films with different concentrations were produced using sol-gel process and investigated for wettability and photocatalysis. Water contact angle (CA) measurements indicated the films to be hydrophilic with reduced solid/liquid interfacial surface energy upon metal doping. The films were highly transparent (>94%) with red or blue shift in the absorption edge depending on the dopant type (Ag or Al) owing to the Burstein–Moss effect. The ZnO:Ag and ZnO:Al films with 0.5 and 1.0 wt.% metal dopant showed high degradation efficiency in methylene blue (MB) solution under UV irradiation, mainly due to an increase in the photogenerated electron–hole pair recombination time and hydroxyl radicals (·OH) generation. The MB degradation followed pseudo-first-order reaction with maximum apparent reaction rate constant of 2.40 h−1 for the 0.5 wt.% ZnO:Al film. ZnO films with 1.0 wt.% dopant demonstrated excellent photostability and recyclability even after several runs presumably due to reduced Zn2+ dissolution as well as blocking of the active surface area. ZnO:(Ag + Al) film containing 0.5 wt.% Al and Ag showed excellent UV photodegradation of MB and rhodamine blue (RhB) with high levels of photostability over five cycles.
Open AccessPhotocatalytic and Photostability Behavior of Ag- and/or Al-Doped ZnO Films in Methylene Blue and Rhodamine B under UV-C Irradiation
Silver (Ag) and/or aluminum (Al)-doped zinc oxide (ZnO:Ag, ZnO:Al) films with different concentrations were produced using sol-gel process and investigated for wettability and photocatalysis. Water contact angle (CA) measurements indicated the films to be hydrophilic with reduced solid/liquid interfacial surface energy upon metal doping. The films were highly transparent (>94%) with red or blue shift in the absorption edge depending on the dopant type (Ag or Al) owing to the Burstein–Moss effect. The ZnO:Ag and ZnO:Al films with 0.5 and 1.0 wt.% metal dopant showed high degradation efficiency in methylene blue (MB) solution under UV irradiation, mainly due to an increase in the photogenerated electron–hole pair recombination time and hydroxyl radicals (·OH) generation. The MB degradation followed pseudo-first-order reaction with maximum apparent reaction rate constant of 2.40 h−1 for the 0.5 wt.% ZnO:Al film. ZnO films with 1.0 wt.% dopant demonstrated excellent photostability and recyclability even after several runs presumably due to reduced Zn2+ dissolution as well as blocking of the active surface area. ZnO:(Ag + Al) film containing 0.5 wt.% Al and Ag showed excellent UV photodegradation of MB and rhodamine blue (RhB) with high levels of photostability over five cycles.
- Open Access
Electrochemical Stability Enhancement in Reactive Magnetron Sputtered VN Films upon Annealing Treatment
Vanadium nitride (VN) thin films were produced via direct-current reactive magnetron sputtering technique followed by vacuum annealing. The treatment was carried out at different temperatures for any effect on their electrochemical (EC) stability, up to 10,000 charge–discharge cycles in 0.5 M K2SO4 solution. The film surface chemistry was investigated by using X-ray photoelectron spectroscope (XPS) and cyclic voltammetry (CV) techniques. For the as-deposited film, the oxide layer formed on the VN surface was unstable upon K2SO4 immersion treatment, along with ~23% reduction in the EC capacitance. Vacuum annealing under optimized conditions, however, made the oxide layer stable with almost no capacitance loss upon cycling for up to 10,000 cycles. Annealing treatment of the VN films makes them a potential candidate for long-term use in electrochemical capacitors.
Open AccessElectrochemical Stability Enhancement in Reactive Magnetron Sputtered VN Films upon Annealing Treatment
Vanadium nitride (VN) thin films were produced via direct-current reactive magnetron sputtering technique followed by vacuum annealing. The treatment was carried out at different temperatures for any effect on their electrochemical (EC) stability, up to 10,000 charge–discharge cycles in 0.5 M K2SO4 solution. The film surface chemistry was investigated by using X-ray photoelectron spectroscope (XPS) and cyclic voltammetry (CV) techniques. For the as-deposited film, the oxide layer formed on the VN surface was unstable upon K2SO4 immersion treatment, along with ~23% reduction in the EC capacitance. Vacuum annealing under optimized conditions, however, made the oxide layer stable with almost no capacitance loss upon cycling for up to 10,000 cycles. Annealing treatment of the VN films makes them a potential candidate for long-term use in electrochemical capacitors.