DLDubhaltach Mac Lochlainn

Dubhaltach Mac Lochlainn

*This is an algorithmically generated author record based on publicly available information.

Current Organizations / Institutes

The organizations/institutes from the scholar's latest article


Dubhaltach Mac Lochlainn has a total of 19 co-authors. Here are the top co-authors by number of shared publications:


Latest Publications

  • Open Access

    Large-Diameter Diaphragm Fabry–Pérot Interferometer for High-Sensitivity Temperature Sensing Using a Hermetically Sealed Tunable Medium: Up to 190 nm/K

    by Anthony Weir, Dubhaltach Mac Lochlainn, Helio Musselwhite-Veitch, Gerard Dooly, Dinesh Babu Duraibabu

    This paper presents a proof-of-concept investigation into a novel hermetically sealed tunable-medium Extrinsic Fabry–Pérot Interferometer (EFPI) temperature sensor architecture. A series of tuneable-sensitivity EFPI temperature sensors is demonstrated, comprising a large-diameter fused silica diaphragm with a 800 μm diameter, significantly exceeding conventional designs (typically ∼125 μm), with polished diaphragm thicknesses ranging from 28 to 49 μm, housed in hermetically sealed rigid melting point capillaries with a 1.8 mm internal diameter. By exploiting thermally induced pressure differentials generated by a tunable Krytox GPL 105 oil/air fill fraction within the sealed rigid cavity, the sensors demonstrate a continuously tuneable sensitivity design space spanning 0.45 to 190 nm/K. An exact nonlinear thermal pressure model is derived and validated, replacing the linearised approximation which is shown to be inapplicable at fill fractions approaching unity. The low-sensitivity configuration (0.45 nm/K) was characterised at the National Standards Authority of Ireland (NSAI) National Metrology Laboratory against ITS-90 fixed points: the Triple Point of Water (273.16 K) and the Gallium Fixed Point (302.9146 K), with traceability to the International Temperature Scale of 1990 (ITS-90), yielding an instrument-limited resolution of <1.1 mK, consistent with the metrological validation environment. The high-sensitivity configurations (21 and 190 nm/K) were characterised on a laboratory bench, achieving instrument-limited theoretical resolutions of <24 μK and <2.6 μK respectively, pending future metrological validation. The 190 nm/K sensitivity represents an improvement of approximately 21.7× over the closest directly comparable prior Citationutilised fusion splicing and manual polishing. Future development priorities include metrological validation of the high-sensitivity configurations, long-term stability characterisation, thermal cycling, and progression towards an all-glass hermetically sealed construction.

  • Open Access

    DEVELOPMENT OF NEW TRACEABLE EUROPEAN CAPABILITIES IN THERMAL METROLOGY

    by Jean-Rémy Filitz, Narcisa Arifovic, Mohamed Sadli, Guillaume Failleau, Bruno Hay, Dubaltach Mac Lochlainn, Ales Blahut, Jovan Bojkovski, Nedzadeta Hodzić, Lenka Knazovicka, et al.

    This paper deals with a new European project in which the overall objective is to enhance the availability of facilities in the field of thermal metrology (e.g. high temperature contact thermometry, non-contact thermometry and thermo-physical properties of materials characterisation) in European emerging National Metrology Institutes (NMIs), where access to these types of facilities is currently limited.