Jose D. Querales Flores

IV–VI materials are some of the most efficient bulk thermoelectric materials due to their proximity to soft-mode phase transitions, which leads to low lattice thermal conductivity. It has been shown that the lattice thermal conductivity of PbTe can be considerably reduced by bringing PbTe closer to the phase transition, e.g., via lattice expansion. However, the effect of soft phonon modes on the electronic thermoelectric properties of such a system remains unknown. Using first-principles calculations, we show that the soft zone-center transverse optical phonons do not deteriorate the electronic thermoelectric properties of PbTe driven closer to the phase transition via lattice expansion due to external stress, and thus they enhance the thermoelectric figure of merit. We find that the optical deformation potentials change very weakly as the proximity to the phase transition increases, but the population and scattering phase space of soft phonon modes increase. Nevertheless, scattering between electronic states near the band edge and soft optical phonons remains relatively weak even very near the phase transition.

The temperature renormalization of the bulk band structure of a topological crystalline insulator, SnTe, is calculated using first-principles methods. We explicitly include the effect of thermal-expansion-induced modification of electronic states and their band inversion on electron-phonon interaction. We show that the direct gap decreases with temperature, as both thermal expansion and electron-phonon interaction drive SnTe towards the phase transition to a topologically trivial phase as temperature increases. The band gap renormalization due to electron-phonon interaction exhibits a nonlinear dependence on temperature as the material approaches the phase transition, while the lifetimes of the conduction band states near the band edge show a nonmonotonic behavior with temperature. These effects should have important implications on bulk electronic and thermoelectric transport in SnTe and other topological insulators.

Several approaches have been used to investigate the impact of Nitrogen (N) on the electronic structure of GaAs$_{1-x}$N$_{x}$ alloys, however, there is no agreement between theory and experiments about the importance of the different N interstitial defects in these alloys, and their nature is still unknown. Here we analyze the impact of five different N defects on the electronic structure of GaAs$_{1-x}$N$_{x}$ alloys, using density-functional methods: we calculate electronic states, formation energies and charge transition levels. The studied defects include N$_{As}$, As$_{Ga}$, As$_{Ga}$-N$_{As}$ substitutional defects, and (N-N)$_{As}$, (N-As)$_{As}$ split-interstitial complex defects. Our calculated defect formation energies agree with those reported by S.B. Zhang et al. [Phys. Rev. Lett. 86, 1789 (2001)], who predicted these defects. Among the interstitial defects, we found that (N-As)$_{As}$ emerges as the lowest energy configuration in comparison with (N-N)$_{As}$, agreeing with recent experiments [T. Jen, et al., Appl. Phys. Lett. 107, 221904 (2015)]. We also calculated the levels induced in the electronic structure due to each of these defects: defect states may occur as deep levels in the gap, shallow levels close to the band edges, and as levels between bulk states. We find that the largest changes in the band structure are produced by an isolated N atom in GaAs, which is resonant with the conduction band, exhibiting a strong hybridization between N and GaAs states. Deeper levels in the bandgap are obtained with (N-N)$_{As}$ split-interstitial defects. Our results confirm the formation of highly localized states around the N sites, which is convenient for photovoltaics and photoluminescence applications.