Guo Liu
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Guo Liu has a total of 36 co-authors. Here are the top co-authors by number of shared publications:
- Jian Lu
City University of Hong Kong
5 shared publications Chao Wang
2 shared publicationsChunming Deng
2 shared publications- Ge Wu
Center for Alloy Innovation and Design (CAID) State Key Lab for Mechanical Behavior of Materials Center for Advancing Materials Performance from the Nanoscale (CAMP-Nano) and Hysitron Applied Research Center in China (HARCC) Xi'an Jiaotong University 710049 Xi'an China
2 shared publications Jinbing Song
2 shared publicationsKesong Zhou
2 shared publications
Latest Publications
- 1 April 2020
- Published by Elsevier in Journal of the European Ceramic Society
- Vol. 40 (4) , 1478-1487
Interface evolution of Si/Mullite/Yb2SiO5 PS-PVD environmental barrier coatings under high temperature
- 1 April 2020
- Published by Elsevier in Journal of the European Ceramic Society
- Vol. 40 (4) , 1478-1487
Interface evolution of Si/Mullite/Yb2SiO5 PS-PVD environmental barrier coatings under high temperature
- Open Access
- 1 March 2020
- Published by Elsevier in Journal of Materiomics
- Vol. 6 (1) , 102-108
Mechanism of vertical crack formation in Yb2SiO5 coatings deposited via plasma spray-physical vapor deposition
- 1 March 2020
- Published by Elsevier in Journal of Materiomics
- Vol. 6 (1) , 102-108
Open AccessMechanism of vertical crack formation in Yb2SiO5 coatings deposited via plasma spray-physical vapor deposition
- 14 January 2020
- Published by Wiley in Advanced Materials Technologies
- Vol. 5 (2)
Direct‐Ink Written Shape‐Morphing Film with Rapid and Programmable Multimotion
Shape‐morphing structures are appealing in the material community to inspire a myriad of applications across domains, including soft robots, tissue engineering, and consumer products. However, it is a challenge to create fast response/recovery actuators with complicated and robust deformation due to the slow diffusion speed of water in hydrogel and small modulus of hydrogel. Herein, a facile strategy is proposed to fabricate a versatile patterned film configuration using chitin and poly(dimethylsiloxane) (PDMS). The direct‐ink writing (DIW) technique is leveraged to build simple, flat, patterned films, which can be morphed into complicated multidimensional architectures. Additionally, computational simulations are conducted to predict the deformation behaviors of the actuator. The sequential response structure can be precisely manipulated by the actuation speed of different structures. Moreover, an assembling method is proposed to create multifunction actuators.
- 14 January 2020
- Published by Wiley in Advanced Materials Technologies
- Vol. 5 (2)
Direct‐Ink Written Shape‐Morphing Film with Rapid and Programmable Multimotion
Shape‐morphing structures are appealing in the material community to inspire a myriad of applications across domains, including soft robots, tissue engineering, and consumer products. However, it is a challenge to create fast response/recovery actuators with complicated and robust deformation due to the slow diffusion speed of water in hydrogel and small modulus of hydrogel. Herein, a facile strategy is proposed to fabricate a versatile patterned film configuration using chitin and poly(dimethylsiloxane) (PDMS). The direct‐ink writing (DIW) technique is leveraged to build simple, flat, patterned films, which can be morphed into complicated multidimensional architectures. Additionally, computational simulations are conducted to predict the deformation behaviors of the actuator. The sequential response structure can be precisely manipulated by the actuation speed of different structures. Moreover, an assembling method is proposed to create multifunction actuators.
- Open Access
- 22 November 2019
- Published by Wiley in Advanced Optical Materials
- Vol. 8 (1)
Full‐Color Reflective Filters in a Large Area with a Wide‐Band Tunable Absorber Deposited by One‐Step Magnetron Sputtering
Full‐color reflective filters for large area applications with potentially unprecedented color saturation and excellent mechanical properties deposited by one‐step magnetron sputtering are proposed. Conventional reflective color filters with multiple layers of dielectric films cannot simultaneously produce a large area and good mechanical properties due to the complex multiple depositions and the difference in the thermal expansion coefficients among the material layers. Herein, full‐spectrum colors are generated by novel Mg‐based reflective color filters in a large area of 2 cm × 2 cm with a high hardness of 9.12 GPa, where the filters include an absorber layer with controllable optical constants and a reflective layer with an amorphous structure. The saturation and hue of the produced colors can be controlled by tuning the optical constants and the thickness of the absorber layer. Additionally, the hardness of the Mg‐based reflective color filters is increased by the reflective metallic glass layers because they are derived from the same material as the absorber layer. This paradigm can pave the way for the efficient fabrication of large area color filtering devices for diverse applications, such as surface decorations, optical components, color display devices, structural color printing, and photovoltaic cells with optimum efficiency.
- 22 November 2019
- Published by Wiley in Advanced Optical Materials
- Vol. 8 (1)
Open AccessFull‐Color Reflective Filters in a Large Area with a Wide‐Band Tunable Absorber Deposited by One‐Step Magnetron Sputtering
Full‐color reflective filters for large area applications with potentially unprecedented color saturation and excellent mechanical properties deposited by one‐step magnetron sputtering are proposed. Conventional reflective color filters with multiple layers of dielectric films cannot simultaneously produce a large area and good mechanical properties due to the complex multiple depositions and the difference in the thermal expansion coefficients among the material layers. Herein, full‐spectrum colors are generated by novel Mg‐based reflective color filters in a large area of 2 cm × 2 cm with a high hardness of 9.12 GPa, where the filters include an absorber layer with controllable optical constants and a reflective layer with an amorphous structure. The saturation and hue of the produced colors can be controlled by tuning the optical constants and the thickness of the absorber layer. Additionally, the hardness of the Mg‐based reflective color filters is increased by the reflective metallic glass layers because they are derived from the same material as the absorber layer. This paradigm can pave the way for the efficient fabrication of large area color filtering devices for diverse applications, such as surface decorations, optical components, color display devices, structural color printing, and photovoltaic cells with optimum efficiency.
- Open Access
- 3 August 2018
- Published by American Association for the Advancement of Science (AAAS) in Science Advances
- Vol. 4 (8) , eaat0641
Origami and 4D printing of elastomer-derived ceramic structures
Four-dimensional (4D) printing involves conventional 3D printing followed by a shape-morphing step. It enables more complex shapes to be created than is possible with conventional 3D printing. However, 3D-printed ceramic precursors are usually difficult to be deformed, hindering the development of 4D printing for ceramics. To overcome this limitation, we developed elastomeric poly(dimethylsiloxane) matrix nanocomposites (NCs) that can be printed, deformed, and then transformed into silicon oxycarbide matrix NCs, making the growth of complex ceramic origami and 4D-printed ceramic structures possible. In addition, the printed ceramic precursors are soft and can be stretched beyond three times their initial length. Hierarchical elastomer-derived ceramics (EDCs) could be achieved with programmable architectures spanning three orders of magnitude, from 200 μm to 10 cm. A compressive strength of 547 MPa is achieved on the microlattice at 1.6 g cm−3. This work starts a new chapter of printing high-resolution complex and mechanically robust ceramics, and this origami and 4D printing of ceramics is cost-efficient in terms of time due to geometrical flexibility of precursors. With the versatile shape-morphing capability of elastomers, this work on origami and 4D printing of EDCs could lead to structural applications of autonomous morphing structures, aerospace propulsion components, space exploration, electronic devices, and high-temperature microelectromechanical systems.
- 3 August 2018
- Published by American Association for the Advancement of Science (AAAS) in Science Advances
- Vol. 4 (8) , eaat0641
Open AccessOrigami and 4D printing of elastomer-derived ceramic structures
Four-dimensional (4D) printing involves conventional 3D printing followed by a shape-morphing step. It enables more complex shapes to be created than is possible with conventional 3D printing. However, 3D-printed ceramic precursors are usually difficult to be deformed, hindering the development of 4D printing for ceramics. To overcome this limitation, we developed elastomeric poly(dimethylsiloxane) matrix nanocomposites (NCs) that can be printed, deformed, and then transformed into silicon oxycarbide matrix NCs, making the growth of complex ceramic origami and 4D-printed ceramic structures possible. In addition, the printed ceramic precursors are soft and can be stretched beyond three times their initial length. Hierarchical elastomer-derived ceramics (EDCs) could be achieved with programmable architectures spanning three orders of magnitude, from 200 μm to 10 cm. A compressive strength of 547 MPa is achieved on the microlattice at 1.6 g cm−3. This work starts a new chapter of printing high-resolution complex and mechanically robust ceramics, and this origami and 4D printing of ceramics is cost-efficient in terms of time due to geometrical flexibility of precursors. With the versatile shape-morphing capability of elastomers, this work on origami and 4D printing of EDCs could lead to structural applications of autonomous morphing structures, aerospace propulsion components, space exploration, electronic devices, and high-temperature microelectromechanical systems.
- 9 June 2017
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 33 (24) , 5998-6004
Reaction Mechanisms of the Atomic Layer Deposition of Tin Oxide Thin Films Using Tributyltin Ethoxide and Ozone
Uniform and conformal deposition of tin oxide thin films is important for several applications in electronics, gas sensing, and transparent conducting electrodes. Thermal atomic layer deposition (ALD) is often best suited for these applications, but its implementation requires a mechanistic understanding of the initial nucleation and subsequent ALD processes. To this end, in situ FTIR and ex situ XPS have been used to explore the ALD of tin oxide films using tributyltin ethoxide and ozone on an OH-terminated, SiO2-passivated Si(111) substrate. Direct chemisorption of tributyltin ethoxide on surface OH groups and clear evidence that subsequent ligand exchange are obtained, providing mechanistic insight. Upon ozone pulse, the butyl groups react with ozone, forming surface carbonate and formate. The subsequent tributyltin ethoxide pulse removes the carbonate and formate features with the appearance of the bands for CH stretching and bending modes of the precursor butyl ligands. This ligand-exchange behavior is repeated for subsequent cycles, as is characteristic of ALD processes, and is clearly observed for deposition temperatures of 200 and 300 °C. On the basis of the in situ vibrational data, a reaction mechanism for the ALD process of tributyltin ethoxide and ozone is presented, whereby ligands are fully eliminated. Complementary ex situ XPS depth profiles confirm that the bulk of the films is carbon-free, that is, formate and carbonate are not incorporated into the film during the deposition process, and that good-quality SnOx films are produced. Furthermore, the process was scaled up in a cross-flow reactor at 225 °C, which allowed the determination of the growth rate (0.62 Å/cycle) and confirmed a self-limiting ALD growth at 225 and 268 °C. An analysis of the temperature-dependence data reveals that growth rate increases linearly between 200 and 300 °C.
- 9 June 2017
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 33 (24) , 5998-6004
Reaction Mechanisms of the Atomic Layer Deposition of Tin Oxide Thin Films Using Tributyltin Ethoxide and Ozone
Uniform and conformal deposition of tin oxide thin films is important for several applications in electronics, gas sensing, and transparent conducting electrodes. Thermal atomic layer deposition (ALD) is often best suited for these applications, but its implementation requires a mechanistic understanding of the initial nucleation and subsequent ALD processes. To this end, in situ FTIR and ex situ XPS have been used to explore the ALD of tin oxide films using tributyltin ethoxide and ozone on an OH-terminated, SiO2-passivated Si(111) substrate. Direct chemisorption of tributyltin ethoxide on surface OH groups and clear evidence that subsequent ligand exchange are obtained, providing mechanistic insight. Upon ozone pulse, the butyl groups react with ozone, forming surface carbonate and formate. The subsequent tributyltin ethoxide pulse removes the carbonate and formate features with the appearance of the bands for CH stretching and bending modes of the precursor butyl ligands. This ligand-exchange behavior is repeated for subsequent cycles, as is characteristic of ALD processes, and is clearly observed for deposition temperatures of 200 and 300 °C. On the basis of the in situ vibrational data, a reaction mechanism for the ALD process of tributyltin ethoxide and ozone is presented, whereby ligands are fully eliminated. Complementary ex situ XPS depth profiles confirm that the bulk of the films is carbon-free, that is, formate and carbonate are not incorporated into the film during the deposition process, and that good-quality SnOx films are produced. Furthermore, the process was scaled up in a cross-flow reactor at 225 °C, which allowed the determination of the growth rate (0.62 Å/cycle) and confirmed a self-limiting ALD growth at 225 and 268 °C. An analysis of the temperature-dependence data reveals that growth rate increases linearly between 200 and 300 °C.