Dongjea Seo
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Previous Organizations / Institutes
The organizations / institutes from the scholar's other articles in the past ten years
Research Subjects
Dongjea Seo has a total of 53 co-authors. Here are the top co-authors by number of shared publications:
- Steven J. Koester
Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis, MN, USA
3 shared publications - Alexander S. McLeod
University of Minnesota, Twin Cities
2 shared publications Brayden Lukaskawcez
School of Physics and Astronomy University of Minnesota, Twin Cities Minneapolis Minnesota 55455 USA
2 shared publicationsGwan-Hyoung Lee
Department of Materials Science and Engineering, Yonsei University, Seoul 03722, Korea
2 shared publicationsHeon-Jin Choi
Department of Materials Science and Engineering, Yonsei University, Seoul 03722, Korea
2 shared publicationsJames Hone
Department of Mechanical Engineering Columbia University New York NY 10027 USA
2 shared publications
Latest Publications
- Open Access
- 19 September 2025
- Published by Wiley in Advanced Optical Materials
- Vol. 13 (29)
Interfacial Strong Coupling and Negative Dispersion of Propagating Polaritons in Freestanding Oxide Membranes
Membranes of complex oxides like perovskite SrTiO 3 extend the multi‐functional promise of oxide electronics into the nanoscale regime of 2D materials. Here, it is demonstrated that freestanding oxide membranes supply a reconfigurable platform for nano‐photonics based on propagating surface phonon polaritons. Infrared near‐field imaging and spectroscopy enabled by a tunable ultrafast laser are applied to study pristine nano‐thick SrTiO 3 membranes prepared by hybrid molecular beam epitaxy. As predicted by coupled mode theory, it is found that strong coupling of interfacial polaritons realizes symmetric and antisymmetric hybridized modes with simultaneously tunable negative and positive group velocities. By resolving reflection of these propagating modes from membrane edges, defects, and substrate structures, their dispersion is quantified with position‐resolved nano‐spectroscopy. Remarkably, polariton negative dispersion is found to be both robust and tunable through choice of membrane dielectric environment and thickness, and proposes a novel design for in‐plane Veselago lensing harnessing this control. This work lays the foundation for tunable transformation optics at the nanoscale using polaritons in a wide range of freestanding complex oxide membranes.
- 19 September 2025
- Published by Wiley in Advanced Optical Materials
- Vol. 13 (29)
Open AccessInterfacial Strong Coupling and Negative Dispersion of Propagating Polaritons in Freestanding Oxide Membranes
Membranes of complex oxides like perovskite SrTiO 3 extend the multi‐functional promise of oxide electronics into the nanoscale regime of 2D materials. Here, it is demonstrated that freestanding oxide membranes supply a reconfigurable platform for nano‐photonics based on propagating surface phonon polaritons. Infrared near‐field imaging and spectroscopy enabled by a tunable ultrafast laser are applied to study pristine nano‐thick SrTiO 3 membranes prepared by hybrid molecular beam epitaxy. As predicted by coupled mode theory, it is found that strong coupling of interfacial polaritons realizes symmetric and antisymmetric hybridized modes with simultaneously tunable negative and positive group velocities. By resolving reflection of these propagating modes from membrane edges, defects, and substrate structures, their dispersion is quantified with position‐resolved nano‐spectroscopy. Remarkably, polariton negative dispersion is found to be both robust and tunable through choice of membrane dielectric environment and thickness, and proposes a novel design for in‐plane Veselago lensing harnessing this control. This work lays the foundation for tunable transformation optics at the nanoscale using polaritons in a wide range of freestanding complex oxide membranes.
- Open Access
- 26 June 2025
- Published by Wiley in Advanced Electronic Materials
- Vol. 11 (14)
A Strategic Approach for Enhanced p‐Type Doping of WSe2 p‐MOSFETs Using an Atomic Oxidation Process
Doping allows precise tuning of the electronic properties in 2D materials, optimizing their performance for applications such as complementary metal‐oxide‐semiconductor (CMOS) technology. However, developing reliable p‐type 2D semiconductors remains challenging due to intrinsic defects or unintentional n‐type doping. This study presents robust p‐type monolayer WSe2 field‐effect transistors (FETs) using phase‐engineered WSe2/WSeyOx building blocks created via an atomic oxidation process (AOP). The findings reveal that when bilayer WSe2 is exposed to AOP, the top layer undergoes self‐limited oxidation to WSeyOx with no detectable oxidation of the bottom layer. This result is confirmed by Raman spectroscopy, X‐ray photoelectron spectroscopy, and Kelvin probe force microscopy. This process has further been used to demonstrate a well‐controlled and fully encapsulated WSeyOx/WSe2/WSeyOx heterostructure, ensuring symmetrical protection and stability of the WSe2 channel region. The surface charge transfer doping using WSeyOx provides the capability to selectively modulate the carrier concentration in a WSe2 without altering the intrinsic properties of the channel. This non‐destructive method simplifies the fabrication of p‐type 2D FETs with monolithic, phase‐engineered heterostructures, facilitating seamless integration into next‐generation device architectures.
- 26 June 2025
- Published by Wiley in Advanced Electronic Materials
- Vol. 11 (14)
Open AccessA Strategic Approach for Enhanced p‐Type Doping of WSe2 p‐MOSFETs Using an Atomic Oxidation Process
Doping allows precise tuning of the electronic properties in 2D materials, optimizing their performance for applications such as complementary metal‐oxide‐semiconductor (CMOS) technology. However, developing reliable p‐type 2D semiconductors remains challenging due to intrinsic defects or unintentional n‐type doping. This study presents robust p‐type monolayer WSe2 field‐effect transistors (FETs) using phase‐engineered WSe2/WSeyOx building blocks created via an atomic oxidation process (AOP). The findings reveal that when bilayer WSe2 is exposed to AOP, the top layer undergoes self‐limited oxidation to WSeyOx with no detectable oxidation of the bottom layer. This result is confirmed by Raman spectroscopy, X‐ray photoelectron spectroscopy, and Kelvin probe force microscopy. This process has further been used to demonstrate a well‐controlled and fully encapsulated WSeyOx/WSe2/WSeyOx heterostructure, ensuring symmetrical protection and stability of the WSe2 channel region. The surface charge transfer doping using WSeyOx provides the capability to selectively modulate the carrier concentration in a WSe2 without altering the intrinsic properties of the channel. This non‐destructive method simplifies the fabrication of p‐type 2D FETs with monolithic, phase‐engineered heterostructures, facilitating seamless integration into next‐generation device architectures.
- Open Access
- 1 July 2023
- Published by Springer Nature in Nature Communications
- Vol. 14 (1) , 1-9
Achieving near-perfect light absorption in atomically thin transition metal dichalcogenides through band nesting
Near-perfect light absorbers (NPLAs), with absorbance, $${{{{{{{\mathcal{A}}}}}}}}$$ , of at least 99%, have a wide range of applications ranging from energy and sensing devices to stealth technologies and secure communications. Previous work on NPLAs has mainly relied upon plasmonic structures or patterned metasurfaces, which require complex nanolithography, limiting their practical applications, particularly for large-area platforms. Here, we use the exceptional band nesting effect in TMDs, combined with a Salisbury screen geometry, to demonstrate NPLAs using only two or three uniform atomic layers of transition metal dichalcogenides (TMDs). The key innovation in our design, verified using theoretical calculations, is to stack monolayer TMDs in such a way as to minimize their interlayer coupling, thus preserving their strong band nesting properties. We experimentally demonstrate two feasible routes to controlling the interlayer coupling: twisted TMD bi-layers and TMD/buffer layer/TMD tri-layer heterostructures. Using these approaches, we demonstrate room-temperature values of $${{{{{{{\mathcal{A}}}}}}}}$$ =95% at λ=2.8 eV with theoretically predicted values as high as 99%. Moreover, the chemical variety of TMDs allows us to design NPLAs covering the entire visible range, paving the way for efficient atomically-thin optoelectronics.- 1 July 2023
- Published by Springer Nature in Nature Communications
- Vol. 14 (1) , 1-9
Open AccessAchieving near-perfect light absorption in atomically thin transition metal dichalcogenides through band nesting
Near-perfect light absorbers (NPLAs), with absorbance, $${{{{{{{\mathcal{A}}}}}}}}$$ , of at least 99%, have a wide range of applications ranging from energy and sensing devices to stealth technologies and secure communications. Previous work on NPLAs has mainly relied upon plasmonic structures or patterned metasurfaces, which require complex nanolithography, limiting their practical applications, particularly for large-area platforms. Here, we use the exceptional band nesting effect in TMDs, combined with a Salisbury screen geometry, to demonstrate NPLAs using only two or three uniform atomic layers of transition metal dichalcogenides (TMDs). The key innovation in our design, verified using theoretical calculations, is to stack monolayer TMDs in such a way as to minimize their interlayer coupling, thus preserving their strong band nesting properties. We experimentally demonstrate two feasible routes to controlling the interlayer coupling: twisted TMD bi-layers and TMD/buffer layer/TMD tri-layer heterostructures. Using these approaches, we demonstrate room-temperature values of $${{{{{{{\mathcal{A}}}}}}}}$$ =95% at λ=2.8 eV with theoretically predicted values as high as 99%. Moreover, the chemical variety of TMDs allows us to design NPLAs covering the entire visible range, paving the way for efficient atomically-thin optoelectronics. - 11 September 2020
- Published by Wiley in Advanced Materials
- Vol. 32 (43) , 2003567
Multioperation‐Mode Light‐Emitting Field‐Effect Transistors Based on van der Waals Heterostructure
2D semiconductors have shown great potential for application to electrically tunable optoelectronics. Despite the strong excitonic photoluminescence (PL) of monolayer transition metal dichalcogenides (TMDs), their efficient electroluminescence (EL) has not been achieved due to the low efficiency of charge injection and electron–hole recombination. Here, multioperation‐mode light‐emitting field‐effect transistors (LEFETs) consisting of a monolayer WSe2 channel and graphene contacts coupled with two top gates for selective and balanced injection of charge carriers are demonstrated. Visibly observable EL is achieved with the high external quantum efficiency of ≈6% at room temperature due to efficient recombination of injected electrons and holes in a confined 2D channel. Further, electrical tunability of both the channel and contacts enables multioperation modes, such as antiambipolar, depletion,and unipolar regions, which can be utilized for polarity‐tunable field‐effect transistors and photodetectors. The work exhibits great potential for use in 2D semiconductor LEFETs for novel optoelectronics capable of high efficiency, multifunctions, and heterointegration.
- 11 September 2020
- Published by Wiley in Advanced Materials
- Vol. 32 (43) , 2003567
Multioperation‐Mode Light‐Emitting Field‐Effect Transistors Based on van der Waals Heterostructure
2D semiconductors have shown great potential for application to electrically tunable optoelectronics. Despite the strong excitonic photoluminescence (PL) of monolayer transition metal dichalcogenides (TMDs), their efficient electroluminescence (EL) has not been achieved due to the low efficiency of charge injection and electron–hole recombination. Here, multioperation‐mode light‐emitting field‐effect transistors (LEFETs) consisting of a monolayer WSe2 channel and graphene contacts coupled with two top gates for selective and balanced injection of charge carriers are demonstrated. Visibly observable EL is achieved with the high external quantum efficiency of ≈6% at room temperature due to efficient recombination of injected electrons and holes in a confined 2D channel. Further, electrical tunability of both the channel and contacts enables multioperation modes, such as antiambipolar, depletion,and unipolar regions, which can be utilized for polarity‐tunable field‐effect transistors and photodetectors. The work exhibits great potential for use in 2D semiconductor LEFETs for novel optoelectronics capable of high efficiency, multifunctions, and heterointegration.
- 12 March 2020
- Published by American Chemical Society (ACS) in Crystal Growth & Design
- Vol. 20 (4) , 2698-2705
Large-Scale Self-Limiting Synthesis of Monolayer MoS2 via Proximity Evaporation from Mo Films
- 12 March 2020
- Published by American Chemical Society (ACS) in Crystal Growth & Design
- Vol. 20 (4) , 2698-2705
Large-Scale Self-Limiting Synthesis of Monolayer MoS2 via Proximity Evaporation from Mo Films
- Open Access
- 1 July 2019
- Published by AIP Publishing in Applied Physics Letters
- Vol. 115 (1) , 012104
High-performance monolayer MoS2 field-effect transistor with large-scale nitrogen-doped graphene electrodes for Ohmic contact
A finite Schottky barrier and large contact resistance between monolayer MoS2 and electrodes are the major bottlenecks in developing high-performance field-effect transistors (FETs) that hinder the study of intrinsic quantum behaviors such as valley-spin transport at low temperature. A gate-tunable graphene electrode platform has been developed to improve the performance of MoS2 FETs. However, intrinsic misalignment between the work function of pristine graphene and the conduction band of MoS2 results in a large threshold voltage for the FETs, because of which Ohmic contact behaviors are observed only at very high gate voltages and carrier concentrations (∼1013 cm−2). Here, we present high-performance monolayer MoS2 FETs with Ohmic contact at a modest gate voltage by using a chemical-vapor-deposited (CVD) nitrogen-doped graphene with a high intrinsic electron carrier density. The CVD nitrogen-doped graphene and monolayer MoS2 hybrid FETs platform exhibited a large negative shifted threshold voltage of −54.2 V and barrier-free Ohmic contact under zero gate voltage. Transparent contact by nitrogen-doped graphene led to a 214% enhancement in the on-current and a fourfold improvement in the field-effect carrier mobility of monolayer MoS2 FETs compared with those of a pristine graphene electrode platform. The transport measurements, as well as Raman and X-ray photoelectron spectroscopy analyses before and after thermal annealing, reveal that the atomic C-N bonding in the CVD nitrogen-doped graphene is responsible for the dominant effects of electron doping. Large-scale nitrogen-doped graphene electrodes provide a promising device platform for the development of high-performance devices and the study of unique quantum behaviors.
- 1 July 2019
- Published by AIP Publishing in Applied Physics Letters
- Vol. 115 (1) , 012104
Open AccessHigh-performance monolayer MoS2 field-effect transistor with large-scale nitrogen-doped graphene electrodes for Ohmic contact
A finite Schottky barrier and large contact resistance between monolayer MoS2 and electrodes are the major bottlenecks in developing high-performance field-effect transistors (FETs) that hinder the study of intrinsic quantum behaviors such as valley-spin transport at low temperature. A gate-tunable graphene electrode platform has been developed to improve the performance of MoS2 FETs. However, intrinsic misalignment between the work function of pristine graphene and the conduction band of MoS2 results in a large threshold voltage for the FETs, because of which Ohmic contact behaviors are observed only at very high gate voltages and carrier concentrations (∼1013 cm−2). Here, we present high-performance monolayer MoS2 FETs with Ohmic contact at a modest gate voltage by using a chemical-vapor-deposited (CVD) nitrogen-doped graphene with a high intrinsic electron carrier density. The CVD nitrogen-doped graphene and monolayer MoS2 hybrid FETs platform exhibited a large negative shifted threshold voltage of −54.2 V and barrier-free Ohmic contact under zero gate voltage. Transparent contact by nitrogen-doped graphene led to a 214% enhancement in the on-current and a fourfold improvement in the field-effect carrier mobility of monolayer MoS2 FETs compared with those of a pristine graphene electrode platform. The transport measurements, as well as Raman and X-ray photoelectron spectroscopy analyses before and after thermal annealing, reveal that the atomic C-N bonding in the CVD nitrogen-doped graphene is responsible for the dominant effects of electron doping. Large-scale nitrogen-doped graphene electrodes provide a promising device platform for the development of high-performance devices and the study of unique quantum behaviors.