Sabyasachi Saha
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Previous Organizations / Institutes
The organizations / institutes from the scholar's other articles in the past ten years
Sabyasachi Saha has a total of 58 co-authors. Here are the top co-authors by number of shared publications:
K. Muraleedharan
Director, CSIR-Central Glass & Ceramic Research Institute,Kolkata,India
3 shared publicationsA. S. Mantri
University of Cincinnati
2 shared publicationsAtul Kumar
2 shared publicationsDeepak Kumar
Defence Metallurgical Research Laboratory, PO Kanchanbagh, Hyderabad 500058, India
2 shared publications- Francis Leonard Deepak
International Iberian Nanotechnology Laboratory (INL), Avenida Mestre Jose Veiga, Braga 4715-330, Portugal
2 shared publications - Krishna Yaddanapudi
Department of Materials Science and Engineering, University of California, Davis 2 , Davis, California 95616, USA
2 shared publications
Latest Publications
- 28 February 2023
- Published by Wiley in Physica Status Solidi (RRL) – Rapid Research Letters
- Vol. 17 (8)
Multistep Crystallization of Ge‐Rich GST Unveiled by In Situ synchrotron X‐ray diffraction and (scanning) transmission electron microscopy
Among many phase change materials, Ge‐rich GeSbTe (GST) alloys are of considerable interest due to their high thermal stability, a specification required for the next generation of embedded digital memories. This stability results from the fact that these alloys do not crystallize congruently but experience phase separation forming Ge and GST‐225 nanocrystals upon crystallization. However, the details of the crystallization process remain unclear. Combining in situ X‐ray diffraction studies during isothermal annealing and ex situ (scanning) transmission electron microscopy ((S)TEM) observations, the successive phases through which these alloys crystallize are identified. At low temperature (310 °C), the homogeneous amorphous material undergoes phase separation during wherein small regions of different Ge contents are formed. After a long incubation time, Pnma GeTe embryos first crystallize and trigger the heterogeneous crystallization of the Ge cubic phase. While the Ge phase progressively builds up through the addition of new small Ge crystals, cubic GeTe forms. At this point, the microstructure ceases to evolve, and Sb is still dispersed and contained within some remaining amorphous matrix surrounding Ge and GeTe crystals. Higher annealing temperatures (typically 400 °C) are needed to force Sb to diffuse and get incorporated into the GeTe grains to form cubic Ge2Sb2Te5.
- 28 February 2023
- Published by Wiley in Physica Status Solidi (RRL) – Rapid Research Letters
- Vol. 17 (8)
Multistep Crystallization of Ge‐Rich GST Unveiled by In Situ synchrotron X‐ray diffraction and (scanning) transmission electron microscopy
Among many phase change materials, Ge‐rich GeSbTe (GST) alloys are of considerable interest due to their high thermal stability, a specification required for the next generation of embedded digital memories. This stability results from the fact that these alloys do not crystallize congruently but experience phase separation forming Ge and GST‐225 nanocrystals upon crystallization. However, the details of the crystallization process remain unclear. Combining in situ X‐ray diffraction studies during isothermal annealing and ex situ (scanning) transmission electron microscopy ((S)TEM) observations, the successive phases through which these alloys crystallize are identified. At low temperature (310 °C), the homogeneous amorphous material undergoes phase separation during wherein small regions of different Ge contents are formed. After a long incubation time, Pnma GeTe embryos first crystallize and trigger the heterogeneous crystallization of the Ge cubic phase. While the Ge phase progressively builds up through the addition of new small Ge crystals, cubic GeTe forms. At this point, the microstructure ceases to evolve, and Sb is still dispersed and contained within some remaining amorphous matrix surrounding Ge and GeTe crystals. Higher annealing temperatures (typically 400 °C) are needed to force Sb to diffuse and get incorporated into the GeTe grains to form cubic Ge2Sb2Te5.
- Open Access
- 6 May 2021
- Published by Wiley in Advanced Materials
- Vol. 33 (23) , 2008779
Enhancing Light–Matter Interactions in MoS2 by Copper Intercalation
The intercalation of layered compounds opens up a vast space of new host–guest hybrids, providing new routes for tuning the properties of materials. Here, it is shown that uniform and continuous layers of copper can be intercalated within the van der Waals gap of bulk MoS2 resulting in a unique Cu–MoS2 hybrid. The new Cu–MoS2 hybrid, which remains semiconducting, possesses a unique plasmon resonance at an energy of ≈1eV, giving rise to enhanced optoelectronic activity. Compared with high‐performance MoS2 photodetectors, copper‐enhanced devices are superior in their spectral response, which extends into the infrared, and also in their total responsivity, which exceeds 104 A W−1. The Cu–MoS2 hybrids hold promise for supplanting current night‐vision technology with compact, advanced multicolor night vision.
- 6 May 2021
- Published by Wiley in Advanced Materials
- Vol. 33 (23) , 2008779
Open AccessEnhancing Light–Matter Interactions in MoS2 by Copper Intercalation
The intercalation of layered compounds opens up a vast space of new host–guest hybrids, providing new routes for tuning the properties of materials. Here, it is shown that uniform and continuous layers of copper can be intercalated within the van der Waals gap of bulk MoS2 resulting in a unique Cu–MoS2 hybrid. The new Cu–MoS2 hybrid, which remains semiconducting, possesses a unique plasmon resonance at an energy of ≈1eV, giving rise to enhanced optoelectronic activity. Compared with high‐performance MoS2 photodetectors, copper‐enhanced devices are superior in their spectral response, which extends into the infrared, and also in their total responsivity, which exceeds 104 A W−1. The Cu–MoS2 hybrids hold promise for supplanting current night‐vision technology with compact, advanced multicolor night vision.
- 2 March 2021
- Published by Springer Nature in Journal of Materials Science
- Vol. 56 (16) , 9692-9701
Extrinsic room-temperature ferromagnetism in MoS2
- 2 March 2021
- Published by Springer Nature in Journal of Materials Science
- Vol. 56 (16) , 9692-9701
Extrinsic room-temperature ferromagnetism in MoS2
- 1 June 2019
- Published by Oxford University Press (OUP) in Microscopy and Microanalysis
- Vol. 25 (6) , 1383-1393
Microstructural Characterization of GaN Grown on SiC
GaN films have been grown on SiC substrates with an AlN nucleation layer by using a metal organic chemical vapor deposition technique. Micro-cracking of the GaN films has been observed in some of the grown samples. In order to investigate the micro-cracking and microstructure, the samples have been studied using various characterization techniques such as optical microscopy, atomic force microscopy, Raman spectroscopy, scanning electron microscopy and transmission electron microscopy (TEM). The surface morphology of the AlN nucleation layer is related to the stress evolution in subsequent overgrown GaN epilayers. It is determined via TEM evidence that, if the AlN nucleation layer has a rough surface morphology, this leads to tensile stresses in the GaN films, which finally results in cracking. Raman spectroscopy results also suggest this, by showing the existence of considerable tensile residual stress in the AlN nucleation layer. Based on these various observations and results, conclusions or propositions relating to the microstructure are presented.
- 1 June 2019
- Published by Oxford University Press (OUP) in Microscopy and Microanalysis
- Vol. 25 (6) , 1383-1393
Microstructural Characterization of GaN Grown on SiC
GaN films have been grown on SiC substrates with an AlN nucleation layer by using a metal organic chemical vapor deposition technique. Micro-cracking of the GaN films has been observed in some of the grown samples. In order to investigate the micro-cracking and microstructure, the samples have been studied using various characterization techniques such as optical microscopy, atomic force microscopy, Raman spectroscopy, scanning electron microscopy and transmission electron microscopy (TEM). The surface morphology of the AlN nucleation layer is related to the stress evolution in subsequent overgrown GaN epilayers. It is determined via TEM evidence that, if the AlN nucleation layer has a rough surface morphology, this leads to tensile stresses in the GaN films, which finally results in cracking. Raman spectroscopy results also suggest this, by showing the existence of considerable tensile residual stress in the AlN nucleation layer. Based on these various observations and results, conclusions or propositions relating to the microstructure are presented.
- 4 January 2019
- Published by Springer Nature in Transactions of the Indian Institute of Metals
- Vol. 72 (8) , 2105-2119
Photonic, Low-Friction and Antimicrobial Applications for an Ancient Icosahedral/Quasicrystalline Nano-composite Bronze Alloy
- 4 January 2019
- Published by Springer Nature in Transactions of the Indian Institute of Metals
- Vol. 72 (8) , 2105-2119
Photonic, Low-Friction and Antimicrobial Applications for an Ancient Icosahedral/Quasicrystalline Nano-composite Bronze Alloy
- 1 December 2018
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 1-4
GaN Growth Process by MOCVD Revisited: TEM Study of Microstructural Evolution Presented
Microstructure evolution of GaN grown on c-sapphire by MOCVD has been systematically studied using transmission electron microscopy based techniques. Individual samples have been derived by interrupting the GaN growth at various steps, starting from nitridation at 530° C, followed by the standard two step growth comprising of first deposition of low temperature GaN nucleation layer (LT-GaN NL) and then ramping up the temperature followed by high temperature GaN epilayer growth. Effect of nitridation, and the microstructure of the nitride layer for various nitridation temperatures has been recently reported by our group [1], where we have shown that the nitride layer formed at this nitridation temperature is cubic spinel Al x O y N z . In this paper it will be shown, that the LT-GaN grown on this Al x O y N z (after nitridation at 530° C) is primarily cubic zinc blende (zb) in structure, with multiple twin variants existing about various {111} planes. Its crystallographic orientation relationships with the underlying nitride layer and the sapphire substrate will be shown. The transformation of LT-GaN and the regions of transformation from cubic zb phase to the wurtzite (w) phase during the annealing step will be presented. Subsequent effects on the GaN epilayer growth due to the microstructural evolution of these underlying layers along with the evolution of defects will also be discussed.
- 1 December 2018
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 1-4
GaN Growth Process by MOCVD Revisited: TEM Study of Microstructural Evolution Presented
Microstructure evolution of GaN grown on c-sapphire by MOCVD has been systematically studied using transmission electron microscopy based techniques. Individual samples have been derived by interrupting the GaN growth at various steps, starting from nitridation at 530° C, followed by the standard two step growth comprising of first deposition of low temperature GaN nucleation layer (LT-GaN NL) and then ramping up the temperature followed by high temperature GaN epilayer growth. Effect of nitridation, and the microstructure of the nitride layer for various nitridation temperatures has been recently reported by our group [1], where we have shown that the nitride layer formed at this nitridation temperature is cubic spinel Al x O y N z . In this paper it will be shown, that the LT-GaN grown on this Al x O y N z (after nitridation at 530° C) is primarily cubic zinc blende (zb) in structure, with multiple twin variants existing about various {111} planes. Its crystallographic orientation relationships with the underlying nitride layer and the sapphire substrate will be shown. The transformation of LT-GaN and the regions of transformation from cubic zb phase to the wurtzite (w) phase during the annealing step will be presented. Subsequent effects on the GaN epilayer growth due to the microstructural evolution of these underlying layers along with the evolution of defects will also be discussed.
- 1 September 2018
- Published by Elsevier in Surface and Coatings Technology
- Vol. 349, 695-706
Tensile behavior of a slurry Fe-Cr-Si coated Nb-alloy evaluated by Gleeble testing
- 1 September 2018
- Published by Elsevier in Surface and Coatings Technology
- Vol. 349, 695-706
Tensile behavior of a slurry Fe-Cr-Si coated Nb-alloy evaluated by Gleeble testing
- 6 July 2018
- Published by American Chemical Society (ACS) in Crystal Growth & Design
- Vol. 18 (9) , 4978-4986
Nitridation of Sapphire as a Precursor to GaN Growth: Structure and Chemistry
- 6 July 2018
- Published by American Chemical Society (ACS) in Crystal Growth & Design
- Vol. 18 (9) , 4978-4986
Nitridation of Sapphire as a Precursor to GaN Growth: Structure and Chemistry
- Open Access
- 28 June 2016
- Published by Defence Scientific Information and Documentation Centre in Defence Science Journal
- Vol. 66 (4) , 381-390
Structure-property Characterisation at Nanoscale using In-situ TEM and SEM
In-situ electron microscopy is an emerging technique for real time visualisation of micro-structural changes of a specimen under some applied constraints inside microscope. In this study, in-situ nanoindentation experimentation on a carbon nanocoil inside transmission electron microscope has been reported. The elastic modulus of the carbon nanocoil is found to be 177 GPa. Similar experiments are also carried out on carbon nanotubes, but force response of carbon nanotubes is beyond the limit of sensors presently available. The present study also reports the in-situ dissolution behavior of the secondary phases of a 7xxx series aluminum alloy under high vacuum condition in scanning electron microscope (SEM) in the temperature range of 350 °C to 400 °C. We report for the first time using in-situ SEM technique that dissolution of the MgZn2-base phase present as eutectic and divorced eutectic forms could start at a temperature as low as 300 °C, although the usual homogenisation temperature of such alloys is always > 450 °C. Furthermore, the kinetics of dissolution of such phases, particularly when present in fine eutectic phase mixture, is significantly faster than what is observed under atmospheric pressure. It has been found that modification of surface composition under high vacuum condition plays a key role in the low temperature dissolution processes. It has further been found that the dissolution process does not start with the thinning of the IDC phase as proposed for Al-Zn-Mg-Cu alloys, rather it occurs by a combination of ‘spheroidisation’ and thinning process called ‘the thinning, discontinuation, and full dissolution’ (TDFD) mechanism. Results of the in-stu experiments under high vacuum are compared with the ex-situ dissolution experiments under normal atmospheric pressure.
- 28 June 2016
- Published by Defence Scientific Information and Documentation Centre in Defence Science Journal
- Vol. 66 (4) , 381-390
Open AccessStructure-property Characterisation at Nanoscale using In-situ TEM and SEM
In-situ electron microscopy is an emerging technique for real time visualisation of micro-structural changes of a specimen under some applied constraints inside microscope. In this study, in-situ nanoindentation experimentation on a carbon nanocoil inside transmission electron microscope has been reported. The elastic modulus of the carbon nanocoil is found to be 177 GPa. Similar experiments are also carried out on carbon nanotubes, but force response of carbon nanotubes is beyond the limit of sensors presently available. The present study also reports the in-situ dissolution behavior of the secondary phases of a 7xxx series aluminum alloy under high vacuum condition in scanning electron microscope (SEM) in the temperature range of 350 °C to 400 °C. We report for the first time using in-situ SEM technique that dissolution of the MgZn2-base phase present as eutectic and divorced eutectic forms could start at a temperature as low as 300 °C, although the usual homogenisation temperature of such alloys is always > 450 °C. Furthermore, the kinetics of dissolution of such phases, particularly when present in fine eutectic phase mixture, is significantly faster than what is observed under atmospheric pressure. It has been found that modification of surface composition under high vacuum condition plays a key role in the low temperature dissolution processes. It has further been found that the dissolution process does not start with the thinning of the IDC phase as proposed for Al-Zn-Mg-Cu alloys, rather it occurs by a combination of ‘spheroidisation’ and thinning process called ‘the thinning, discontinuation, and full dissolution’ (TDFD) mechanism. Results of the in-stu experiments under high vacuum are compared with the ex-situ dissolution experiments under normal atmospheric pressure.
- 14 July 2015
- Published by Springer Nature in JOM
- Vol. 67 (12) , 2976-2983
Ancient Metal Mirror Alloy Revisited: Quasicrystalline Nanoparticles Observed
- 14 July 2015
- Published by Springer Nature in JOM
- Vol. 67 (12) , 2976-2983
Ancient Metal Mirror Alloy Revisited: Quasicrystalline Nanoparticles Observed