Jari Rodewald

Jari Rodewald

*This is an algorithmically generated author record based on publicly available information.

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Jari Rodewald has a total of 42 co-authors. Here are the top co-authors by number of shared publications:


Latest Publications

  • Open Access

    Structure-Related Electronic and Magnetic Properties in Ultrathin Epitaxial NixFe3−xO4 Films on MgO(001)

    by Jari Rodewald, Jannis Thien, Kevin Ruwisch, Tobias Pohlmann, Martin Hoppe, Jan Schmalhorst, Karsten Küpper, Joachim Wollschläger

    Off-stoichiometric NixFe3−xO4 ultrathin films (x < 2.1) with varying Ni content x and thickness 16 (±2) nm were grown on MgO(001) by reactive molecular beam epitaxy. Synchrotron-based high-resolution X-ray diffraction measurements reveal vertical compressive strain for all films, resulting from a lateral pseudomorphic adaption of the film to the substrate lattice without any strain relaxation. Complete crystallinity with smooth interfaces and surfaces is obtained independent of the Ni content x. For x < 1 an expected successive conversion from Fe3O4 to NiFe2O4 is observed, whereas local transformation into NiO structures is observed for films with Ni content x > 1. However, angle-resolved hard X-ray photoelectron spectroscopy measurements indicate homogeneous cationic distributions without strictly separated phases independent of the Ni content, while X-ray absorption spectroscopy shows that also for x > 1, not all Fe2+ cations are substituted by Ni2+ cations. The ferrimagnetic behavior, as observed by superconducting quantum interference device magnetometry, is characterized by decreasing saturation magnetization due to the formation of antiferromagnetic NiO parts.


  • Open Access

    Cationic Ordering and Its Influence on the Magnetic Properties of Co-Rich Cobalt Ferrite Thin Films Prepared by Reactive Solid Phase Epitaxy on Nb-Doped SrTiO3(001)

    by Jannis Thien, Jascha Bahlmann, Andreas Alexander, Kevin Ruwisch, Jari Rodewald, Tobias Pohlmann, Martin Hoppe, Fatih Alarslan, Martin Steinhart, Baki Altuncevahir, et al.

    Here, we present the (element-specific) magnetic properties and cation ordering for ultrathin Co-rich cobalt ferrite films. Two Co-rich CoxFe3−xO4 films with different stoichiometry (x=1.1 and x=1.4) have been formed by reactive solid phase epitaxy due to post-deposition annealing from epitaxial CoO/Fe3O4 bilayers deposited before on Nb-doped SrTiO3(001). The electronic structure, stoichiometry and homogeneity of the cation distribution of the resulting cobalt ferrite films were verified by angle-resolved hard X-ray photoelectron spectroscopy. From X-ray magnetic circular dichroism measurements, the occupancies of the different sublattices were determined using charge-transfer multiplet calculations. For both ferrite films, a partially inverse spinel structure is found with increased amount of Co3+ cations in the low-spin state on octahedral sites for the Co1.4Fe1.6O4 film. These findings concur with the results obtained by superconducting quantum interference device measurements. Further, the latter measurements revealed the presence of an additional soft magnetic phase probably due to cobalt ferrite islands emerging from the surface, as suggested by atomic force microscope measurements.


  • Real-time monitoring the growth of strained off-stoichiometric NixFe3−xO4 ultrathin films on MgO(001)

    by J. Rodewald, J. Thien, T. Pohlmann, M. Hoppe, F. Bertram, K. Kuepper, J. Wollschläger

    Ni x Fe 3 − x O4 thin films with varying Ni amount (0 ≤ x ≤ 1.5) were deposited on MgO(001) via reactive molecular beam epitaxy. The growth process was monitored during film deposition by means of X-ray diffraction. All prepared films exhibit a well-ordered structure with complete vertical crystallinity throughout the whole film growth and flat surfaces of the final films independent of the Ni amount. An enhancement of the vertical compression in the initial growth continuously decreases up to a film thickness of 8 nm. During further growth, all films exhibit residual and constant vertical compression with lateral adaption of the final films to the substrate lattice, as observed by high energy surface X-ray diffraction experiments. Hard X-ray photoelectron spectroscopy measurements of the final films reveal increasing Fe 3 + : Fe 2 + ratios for higher Ni content and point to additional NiO agglomerations within the films exceeding the stoichiometric Ni amount of x = 1.


  • Enhanced magnetization of ultrathin NiFe2O4 films on SrTiO3(001) related to cation disorder and anomalous strain

    by J. Rodewald, J. Thien, K. Ruwisch, F. Bertram, K. Kuepper, J. Wollschläger

    NiFe2O4 thin films with varying thickness were grown on SrTiO3(001) by reactive molecular beam epitaxy. Soft and hard x-ray photoelectron spectroscopy measurements reveal a homogeneous cation distribution throughout the whole film with stoichiometric Ni:Fe ratios of 1:2 independent of the film thickness. Low energy electron diffraction and high resolution (grazing incidence) x-ray diffraction in addition to x-ray reflectivity experiments were conducted to obtain information of the film surface and bulk structure, respectively. For ultrathin films up to 7.3 nm, lateral tensile and vertical compressive strain is observed, contradicting an adaption at the interface of NiFe2O4 film and substrate lattice. The applied strain is accompanied by an increased lateral defect density, which is decaying for relaxed thicker films and attributed to the growth of lateral grains. Determination of cationic site occupancies in the inverse spinel structure by analysis of site sensitive diffraction peaks reveals low tetrahedral occupancies for thin, strained NiFe2O4 films, resulting in the partial presence of deficient rocksaltlike structures. These structures are assumed to be responsible for the enhanced magnetization of up to ∼250% of the NiFe2O4 bulk magnetization as observed by superconducting quantum interference device magnetometry for ultrathin films below 7.3 nm thickness.


  • Open Access

    Formation of ultrathin cobalt ferrite films by interdiffusion ofFe3O4/CoObilayers

    by J. Rodewald, J. Thien, T. Pohlmann, M. Hoppe, F. Timmer, F. Bertram, K. Kuepper, J. Wollschläger

    In this work an alternate pathway is demonstrated to form ultrathin cobalt ferrite (CoxFe3−xO4) films by interdiffusion of Fe3O4/CoO bilayers. Bilayer samples with different Fe3O4/CoO thickness ratios have been prepared by reactive molecular beam epitaxy on Nb-doped SrTiO3(001) substrates to obtain cobalt ferrite films of varied stoichiometry. Subsequently, oxygen-assisted postdeposition annealing experiments for consecutive temperature steps between 300∘C and 600∘C have been conducted monitoring the interdiffusion process by means of high-resolution x-ray reflectivity, soft and angle-resolved hard x-ray photoelectron, and x-ray absorption spectroscopy. Magnetic properties were characterized using superconducting quantum interference device magnetometry. The interdiffusion process starts from 300∘C annealing temperature and is completed for temperatures above 500∘C. For completely interdiffused films with Co:Fe ratios larger than 0.84:2 a thin segregated CoO layer on top of the ferrite is formed. This CoO segregation is attributed to surface and interface effects. In addition, multiplet calculations of x-ray absorption spectra are performed to determine the occupancy of different sublattices. These results are correlated with the magnetic properties of the ferrite films. A stoichiometric CoFe2O4 film with partial inversion has been formed exhibiting homogeneously distributed Co2+ and mainly Fe3+ valence states if the initial Co:Fe content is 1.09:2. Thus, for the formation of stoichiometric cobalt ferrite by the proposed postdeposition annealing technique an initial Co excess has to be provided as the formation of a top CoO layer is inevitable.


  • Quadratic magnetooptic spectroscopy setup based on photoelastic light modulation

    by Robin Silber, Michaela Tomíčková, Jari Rodewald, Joachim Wollschläger, Jaromír Pištora, Martin Veis, Timo Kuschel, Jaroslav Hamrle


  • Open Access

    Impact of Strain and Morphology on Magnetic Properties of Fe3O4/NiO Bilayers Grown on Nb:SrTiO3(001) and MgO(001)

    by Olga Kuschel, Nico Pathé, Tobias Schemme, Kevin Ruwisch, Jari Rodewald, Ralph Buss, Florian Bertram, Timo Kuschel, Karsten Kuepper, Joachim Wollschläger

    We present a comparative study of the morphology and structural as well as magnetic properties of crystalline Fe3O4/NiO bilayers grown on both MgO(001) and SrTiO3(001) substrates by reactive molecular beam epitaxy. These structures were investigated by means of X-ray photoelectron spectroscopy, low-energy electron diffraction, X-ray reflectivity and diffraction, as well as vibrating sample magnetometry. While the lattice mismatch of NiO grown on MgO(001) was only 0.8%, it was exposed to a lateral lattice mismatch of −6.9% if grown on SrTiO3. In the case of Fe3O4, the misfit strain on MgO(001) and SrTiO3(001) amounted to 0.3% and −7.5%, respectively. To clarify the relaxation process of the bilayer system, the film thicknesses of the magnetite and nickel oxide films were varied between 5 and 20 nm. While NiO films were well ordered on both substrates, Fe3O4 films grown on NiO/SrTiO3 exhibited a higher surface roughness as well as lower structural ordering compared to films grown on NiO/MgO. Further, NiO films grew pseudomorphic in the investigated thickness range on MgO substrates without any indication of relaxation, whereas on SrTiO3 the NiO films showed strong strain relaxation. Fe3O4 films also exhibited strong relaxation, even for films of 5 nm thickness on both NiO/MgO and NiO/SrTiO3. The magnetite layers on both substrates showed a fourfold magnetic in-plane anisotropy with magnetic easy axes pointing in 100 directions. The coercive field was strongly enhanced for magnetite grown on NiO/SrTiO3 due to the higher density of structural defects, compared to magnetite grown on NiO/MgO.


  • Open Access

    Plasma Enhanced Complete Oxidation of Ultrathin Epitaxial Praseodymia Films on Si(111)

    by Olga Kuschel, Florian Dieck, Henrik Wilkens, Sebastian Gevers, Jari Rodewald, Christian Otte, Marvin Hartwig Zoellner, Gang Niu, Thomas Schroeder, Joachim Wollschläger

    Praseodymia films have been exposed to oxygen plasma at room temperature after deposition on Si(111) via molecular beam epitaxy. Different parameters as film thickness, exposure time and flux during plasma treatment have been varied to study their influence on the oxygen plasma oxidation process. The surface near regions have been investigated by means of X-ray photoelectron spectroscopy showing that the plasma treatment transforms the stoichiometry of the films from Pr2O3 to PrO2. Closer inspection of the bulk properties of the films by means of synchrotron radiation based X-ray reflectometry and diffraction confirms this transformation if the films are thicker than some critical thickness of 6 nm. The layer distance of these films is extremely small verifying the completeness of the plasma oxidation process. Thinner films, however, cannot be transformed completely. For all films, less oxidized very thin interlayers are detected by these experimental techniques.