Krzysztof M. Nowak
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Previous Organizations / Institutes
The organizations / institutes from the scholar's other articles in the past ten years
Research Subjects
Krzysztof M. Nowak has a total of 16 co-authors. Here are the top co-authors by number of shared publications:
Hakaru Mizoguchi
Gigaphoton Inc., 400 Yokokura Shinden, Oyama 323-8558, Japan
3 shared publicationsJunichi Fujimoto
Gigaphoton Inc., 400 Yokokura Shinden, Oyama 323-8558, Japan
3 shared publicationsTakashi Suganuma
Gigaphoton Inc., 400 Yokokura Shinden, Oyama 323-8558, Japan
3 shared publicationsTakeshi Ohta
Gigaphoton Inc., 400 Yokokura Shinden, Oyama 323-8558, Japan
3 shared publicationsDenis R. Hall
School of Engineering and Physical Sciences, Heriot-Watt University, Edinburgh, EH14 4AS, UK
2 shared publicationsHoward J. Baker
School of Engineering and Physical Sciences, Heriot-Watt University, Edinburgh, EH14 4AS, UK
2 shared publications
Latest Publications
- 6 October 2015
- Published by Optica Publishing Group in Applied Optics
- Vol. 54 (29) , 8653-8663
Analytical model for CO_2 laser ablation of fused quartz
This paper reports the development of an analytical model, with supporting experimental data, which quite accurately describes the key features of laser ablation of fused silica glass. The quantitative model of nonexplosive, evaporative material removal is shown to match the experimental data very well, to the extent that it can be used as a tool for ablative measurements of absorption coefficient and vaporization energy. The experimental results indicated that a minimum of is required to fully vaporize fused quartz initially held at room temperature, which is in good agreement with the prediction of the model supplied with input data available in the literature. An optimal window for the machining of fused quartz was revealed in terms of pulse duration 20–80 μs and laser wavelength optimized for maximum absorption coefficient. Material removal rates of 0.33 μm per allow for a high-precision depth control with modest laser stability. The model may also be used as a parameter selection guide for laser ablation of fused silica or other materials of similar thermophysical properties.- 6 October 2015
- Published by Optica Publishing Group in Applied Optics
- Vol. 54 (29) , 8653-8663
Analytical model for CO_2 laser ablation of fused quartz
This paper reports the development of an analytical model, with supporting experimental data, which quite accurately describes the key features of laser ablation of fused silica glass. The quantitative model of nonexplosive, evaporative material removal is shown to match the experimental data very well, to the extent that it can be used as a tool for ablative measurements of absorption coefficient and vaporization energy. The experimental results indicated that a minimum of is required to fully vaporize fused quartz initially held at room temperature, which is in good agreement with the prediction of the model supplied with input data available in the literature. An optimal window for the machining of fused quartz was revealed in terms of pulse duration 20–80 μs and laser wavelength optimized for maximum absorption coefficient. Material removal rates of 0.33 μm per allow for a high-precision depth control with modest laser stability. The model may also be used as a parameter selection guide for laser ablation of fused silica or other materials of similar thermophysical properties.- 12 March 2013
- Published by Optica Publishing Group in Optics Letters
- Vol. 38 (6) , 881-883
Multiline short-pulse solid-state seeded carbon dioxide laser for extreme ultraviolet employing multipass radio frequency excited slab amplifier
In this Letter we describe in more detail a solid-state seeded, nanosecond pulse, multiline oscillator designed and built for the extreme ultraviolet (EUV) laser-produced-plasma (LPP) source. Our oscillator featured quantum cascade laser seeders, a diffraction-type seed beam combiner, and a radio-frequency-discharge-excited, diffusion-cooled, slab-waveguide gain cell in a compact multipass regenerative amplifier configuration. The oscillator generated pulses of exceptional stability in terms of envelope, energy, and spectrum. Excellent stability of output was achieved without any additional techniques. The output spectrum consisted of two laser lines of a band of a molecule, P20 and P22, with a target of four lines P18-P24. The pulse duration was electronically adjustable between 11 and 35 ns at a repetition frequency from a few hertz to hundreds of kilohertz. Electronic adjustment of the pulse duration was achieved by relative timing offsets of individual seeders, opening an avenue to a range of on-line adjustments of pulse shape and spectral content timing. The jitter-tolerant operation allows for easy synchronization with an external event, such as a droplet target in an EUV LPP source. A resistance to parasitic seeding of more than 40 dB was recorded. The oscillator produced up to 20 W of average output power at a repetition rate of 100 kHz in a near-diffraction-limited beam of and a pointing stability below 50 μrad.- 12 March 2013
- Published by Optica Publishing Group in Optics Letters
- Vol. 38 (6) , 881-883
Multiline short-pulse solid-state seeded carbon dioxide laser for extreme ultraviolet employing multipass radio frequency excited slab amplifier
In this Letter we describe in more detail a solid-state seeded, nanosecond pulse, multiline oscillator designed and built for the extreme ultraviolet (EUV) laser-produced-plasma (LPP) source. Our oscillator featured quantum cascade laser seeders, a diffraction-type seed beam combiner, and a radio-frequency-discharge-excited, diffusion-cooled, slab-waveguide gain cell in a compact multipass regenerative amplifier configuration. The oscillator generated pulses of exceptional stability in terms of envelope, energy, and spectrum. Excellent stability of output was achieved without any additional techniques. The output spectrum consisted of two laser lines of a band of a molecule, P20 and P22, with a target of four lines P18-P24. The pulse duration was electronically adjustable between 11 and 35 ns at a repetition frequency from a few hertz to hundreds of kilohertz. Electronic adjustment of the pulse duration was achieved by relative timing offsets of individual seeders, opening an avenue to a range of on-line adjustments of pulse shape and spectral content timing. The jitter-tolerant operation allows for easy synchronization with an external event, such as a droplet target in an EUV LPP source. A resistance to parasitic seeding of more than 40 dB was recorded. The oscillator produced up to 20 W of average output power at a repetition rate of 100 kHz in a near-diffraction-limited beam of and a pointing stability below 50 μrad.- Open Access
- 1 January 2013
- Published by Polish Academy of Sciences Chancellery in Opto-Electronics Review
- Vol. 21 (4) , 345-354
CO2 laser drives extreme ultraviolet nano-lithography — second life of mature laser technology
It was shown both theoretically and experimentally that nanosecond order laser pulses at 10.6 micron wavelength were superior for driving the Sn plasma extreme ultraviolet (EUV) source for nano-lithography for the reasons of higher conversion efficiency, lower production of debris and higher average power levels obtainable in CO2 media without serious problems of beam distortions and nonlinear effects occurring in competing solid-state lasers at high intensities. The renewed interest in such pulse format, wavelength, repetition rates in excess of 50 kHz and average power levels in excess of 18 kiloWatt has sparked new opportunities for a matured multi-kiloWatt CO2 laser technology. The power demand of EUV source could be only satisfied by a Master-Oscillator-Power-Amplifier system configuration, leading to a development of a new type of hybrid pulsed CO2 laser employing a whole spectrum of CO2 technology, such as fast flow systems and diffusion-cooled planar waveguide lasers, and relatively recent quantum cascade lasers. In this paper we review briefly the history of relevant pulsed CO2 laser technology and the requirements for multi-kiloWatt CO2 laser, intended for the laser-produced plasma EUV source, and present our recent advances, such as novel solid-state seeded master oscillator and efficient multi-pass amplifiers built on planar waveguide CO2 lasers.
- 1 January 2013
- Published by Polish Academy of Sciences Chancellery in Opto-Electronics Review
- Vol. 21 (4) , 345-354
Open AccessCO2 laser drives extreme ultraviolet nano-lithography — second life of mature laser technology
It was shown both theoretically and experimentally that nanosecond order laser pulses at 10.6 micron wavelength were superior for driving the Sn plasma extreme ultraviolet (EUV) source for nano-lithography for the reasons of higher conversion efficiency, lower production of debris and higher average power levels obtainable in CO2 media without serious problems of beam distortions and nonlinear effects occurring in competing solid-state lasers at high intensities. The renewed interest in such pulse format, wavelength, repetition rates in excess of 50 kHz and average power levels in excess of 18 kiloWatt has sparked new opportunities for a matured multi-kiloWatt CO2 laser technology. The power demand of EUV source could be only satisfied by a Master-Oscillator-Power-Amplifier system configuration, leading to a development of a new type of hybrid pulsed CO2 laser employing a whole spectrum of CO2 technology, such as fast flow systems and diffusion-cooled planar waveguide lasers, and relatively recent quantum cascade lasers. In this paper we review briefly the history of relevant pulsed CO2 laser technology and the requirements for multi-kiloWatt CO2 laser, intended for the laser-produced plasma EUV source, and present our recent advances, such as novel solid-state seeded master oscillator and efficient multi-pass amplifiers built on planar waveguide CO2 lasers.
- 27 November 2012
- Published by Optica Publishing Group in Optics Letters
- Vol. 37 (23) , 4886-4888
Wavefront measurement of single-mode quantum cascade laser beam for seed application in laser-produced plasma extreme ultraviolet system
Quantum cascade laser (QCL) is a very attractive seed source for a multikilowatt pulsed lasers applied for driving extreme ultraviolet emitting plasmas. In this Letter, we investigate output beam properties of a QCL designed to address P18 and P20 lines of 10.6 micron band of molecule. In particular, output beam quality and stability are investigated for the first time. A well-defined linear polarization and a single-mode operation enabled a use of phase retrieval method for full description of QCL output beam. A direct, multi-image numerical phase retrieval technique was developed and successfully applied to the measured intensity patterns of a QCL beam. Very good agreement between the measured and reconstructed beam profiles was observed at distances ranging from QCL aperture to infinity, proving a good understanding of the beam propagation. The results also confirm a high spatial coherence and high stability of the beam parameters, the features expected from an excellent seed source.- 27 November 2012
- Published by Optica Publishing Group in Optics Letters
- Vol. 37 (23) , 4886-4888
Wavefront measurement of single-mode quantum cascade laser beam for seed application in laser-produced plasma extreme ultraviolet system
Quantum cascade laser (QCL) is a very attractive seed source for a multikilowatt pulsed lasers applied for driving extreme ultraviolet emitting plasmas. In this Letter, we investigate output beam properties of a QCL designed to address P18 and P20 lines of 10.6 micron band of molecule. In particular, output beam quality and stability are investigated for the first time. A well-defined linear polarization and a single-mode operation enabled a use of phase retrieval method for full description of QCL output beam. A direct, multi-image numerical phase retrieval technique was developed and successfully applied to the measured intensity patterns of a QCL beam. Very good agreement between the measured and reconstructed beam profiles was observed at distances ranging from QCL aperture to infinity, proving a good understanding of the beam propagation. The results also confirm a high spatial coherence and high stability of the beam parameters, the features expected from an excellent seed source.- 14 November 2012
- Published by Optica Publishing Group in Optics Letters
- Vol. 37 (22) , 4765-4767
Spectral characteristics of quantum-cascade laser operating at 106 μm wavelength for a seed application in laser-produced-plasma extreme UV source
In this Letter, we investigate, for the first time to our knowledge, the spectral properties of a quantum-cascade laser (QCL) from a point of view of a new application as a laser seeder for a nanosecond-pulse high-repetition frequency laser operating at 10.6 μm wavelength. The motivation for this work is a renewed interest in such a pulse format and wavelength driven by a development of extreme UV (EUV) laser-produced-plasma (LPP) sources. These sources use pulsed multikilowatt lasers to drive the EUV-emitting plasmas. Basic spectral performance characteristics of a custom-made QCL chip are measured, such as tuning range and chirp rate. The QCL is shown to have all essential qualities of a robust seed source for a high-repetition nanosecond-pulsed laser required by EUV LPP sources.- 14 November 2012
- Published by Optica Publishing Group in Optics Letters
- Vol. 37 (22) , 4765-4767
Spectral characteristics of quantum-cascade laser operating at 106 μm wavelength for a seed application in laser-produced-plasma extreme UV source
In this Letter, we investigate, for the first time to our knowledge, the spectral properties of a quantum-cascade laser (QCL) from a point of view of a new application as a laser seeder for a nanosecond-pulse high-repetition frequency laser operating at 10.6 μm wavelength. The motivation for this work is a renewed interest in such a pulse format and wavelength driven by a development of extreme UV (EUV) laser-produced-plasma (LPP) sources. These sources use pulsed multikilowatt lasers to drive the EUV-emitting plasmas. Basic spectral performance characteristics of a custom-made QCL chip are measured, such as tuning range and chirp rate. The QCL is shown to have all essential qualities of a robust seed source for a high-repetition nanosecond-pulsed laser required by EUV LPP sources.- 11 September 2010
- Published by Springer Nature in Applied Physics A
- Vol. 103 (4) , 1033-1046
“Cold” CO2 laser ablation of green-state LTCC—experimental verification of improved model and comparison of various LTCC materials
- 11 September 2010
- Published by Springer Nature in Applied Physics A
- Vol. 103 (4) , 1033-1046
“Cold” CO2 laser ablation of green-state LTCC—experimental verification of improved model and comparison of various LTCC materials
- 16 February 2008
- Published by Springer Nature in Applied Physics A
- Vol. 91 (2) , 341-348
A model for “cold” laser ablation of green state ceramic materials
- 16 February 2008
- Published by Springer Nature in Applied Physics A
- Vol. 91 (2) , 341-348
A model for “cold” laser ablation of green state ceramic materials