Se-I Oh
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Previous Organizations / Institutes
The organizations / institutes from the scholar's other articles in the past ten years
Research Subjects
Se-I Oh has a total of 7 co-authors. Here are the top co-authors by number of shared publications:
- Jae-Hyung Jang
Department of Energy Engineering, KENTECH Institute of Energy Materials and Devices, Korea Institute of Energy Technology, Naju 58330, Republic of Korea
2 shared publications - Janardhanan. R. Rani
School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Oryong‐dong, Buk‐gu, Gwangju, South Korea
1 shared publication - Jarnardhanan R. Rani
School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju 61005, Korea
1 shared publication - Nayan Chandra Das
Gwangju Institute of Science and Technology, School of Electrical Engineering and Computer Science, Gwangju 61005, Korea
1 shared publication - Ranjith Thangavel
Department of Chemical Engineering, Indian Institute of Technology Tirupati, Tirupati 517619, India
1 shared publication - Sung-Min Hong
Gwangju Institute of Science and Technology, Gwangju, Republic of Korea
1 shared publication
Latest Publications
- Open Access
- 19 May 2020
- Published by MDPI AG in Applied Sciences
- Vol. 10 (10) , 3506
Multilevel Bipolar Electroforming-Free Resistive Switching Memory Based on Silicon Oxynitride
Resistive random-access memory (RRAM) devices are fabricated by utilizing silicon oxynitride (SiOxNy) thin film as a resistive switching layer. A SiOxNy layer is deposited on a p+-Si substrate and capped with a top electrode consisting of Au/Ni. The SiOxNy-based memory device demonstrates bipolar multilevel operation. It can switch interchangeably between all resistance states, including direct SET switching from a high-resistance state (HRS) to an intermediate-resistance state (IRS) or low-resistance state (LRS), direct RESET switching process from LRS to IRS or HRS, and SET/RESET switching from IRS to LRS or HRS by controlling the magnitude of the applied write voltage signal. The device also shows electroforming-free ternary nonvolatile resistive switching characteristics having RHRS/RIRS > 10, RIRS/RLRS > 5, RHRS/RLRS > 103, and retention over 1.8 × 104 s. The resistive switching mechanism in the devices is found to be combinatory processes of hopping conduction by charge trapping/detrapping in the bulk SiOxNy layer and filamentary switching mode at the interface between the SiOxNy and Ni layers.
- 19 May 2020
- Published by MDPI AG in Applied Sciences
- Vol. 10 (10) , 3506
Open AccessMultilevel Bipolar Electroforming-Free Resistive Switching Memory Based on Silicon Oxynitride
Resistive random-access memory (RRAM) devices are fabricated by utilizing silicon oxynitride (SiOxNy) thin film as a resistive switching layer. A SiOxNy layer is deposited on a p+-Si substrate and capped with a top electrode consisting of Au/Ni. The SiOxNy-based memory device demonstrates bipolar multilevel operation. It can switch interchangeably between all resistance states, including direct SET switching from a high-resistance state (HRS) to an intermediate-resistance state (IRS) or low-resistance state (LRS), direct RESET switching process from LRS to IRS or HRS, and SET/RESET switching from IRS to LRS or HRS by controlling the magnitude of the applied write voltage signal. The device also shows electroforming-free ternary nonvolatile resistive switching characteristics having RHRS/RIRS > 10, RIRS/RLRS > 5, RHRS/RLRS > 103, and retention over 1.8 × 104 s. The resistive switching mechanism in the devices is found to be combinatory processes of hopping conduction by charge trapping/detrapping in the bulk SiOxNy layer and filamentary switching mode at the interface between the SiOxNy and Ni layers.
- Open Access
- 24 January 2019
- Published by MDPI AG in Nanomaterials
- Vol. 9 (2) , 148
An Ultra-High-Energy Density Supercapacitor; Fabrication Based on Thiol-functionalized Graphene Oxide Scrolls
Present state-of-the-art graphene-based electrodes for supercapacitors remain far from commercial requirements in terms of high energy density. The realization of high energy supercapacitor electrodes remains challenging, because graphene-based electrode materials are synthesized by the chemical modification of graphene. The modified graphene electrodes have lower electrical conductivity than ideal graphene, and limited electrochemically active surface areas due to restacking, which hinders the access of electrolyte ions, resulting in a low energy density. In order to solve the issue of restacking and low electrical conductivity, we introduce thiol-functionalized, nitrogen-doped, reduced graphene oxide scrolls as the electrode materials for an electric double-layer supercapacitor. The fabricated supercapacitor exhibits a very high energy/power density of 206 Wh/kg (59.74 Wh/L)/496 W/kg at a current density of 0.25 A/g, and a high power/energy density of 32 kW/kg (9.8 kW/L)/9.58 Wh/kg at a current density of 50 A/g; it also operates in a voltage range of 0~4 V with excellent cyclic stability of more than 20,000 cycles. By suitably combining the scroll-based electrode and electrolyte material, this study presents a strategy for electrode design for next-generation energy storage devices with high energy density without compromising the power density.
- 24 January 2019
- Published by MDPI AG in Nanomaterials
- Vol. 9 (2) , 148
Open AccessAn Ultra-High-Energy Density Supercapacitor; Fabrication Based on Thiol-functionalized Graphene Oxide Scrolls
Present state-of-the-art graphene-based electrodes for supercapacitors remain far from commercial requirements in terms of high energy density. The realization of high energy supercapacitor electrodes remains challenging, because graphene-based electrode materials are synthesized by the chemical modification of graphene. The modified graphene electrodes have lower electrical conductivity than ideal graphene, and limited electrochemically active surface areas due to restacking, which hinders the access of electrolyte ions, resulting in a low energy density. In order to solve the issue of restacking and low electrical conductivity, we introduce thiol-functionalized, nitrogen-doped, reduced graphene oxide scrolls as the electrode materials for an electric double-layer supercapacitor. The fabricated supercapacitor exhibits a very high energy/power density of 206 Wh/kg (59.74 Wh/L)/496 W/kg at a current density of 0.25 A/g, and a high power/energy density of 32 kW/kg (9.8 kW/L)/9.58 Wh/kg at a current density of 50 A/g; it also operates in a voltage range of 0~4 V with excellent cyclic stability of more than 20,000 cycles. By suitably combining the scroll-based electrode and electrolyte material, this study presents a strategy for electrode design for next-generation energy storage devices with high energy density without compromising the power density.