Samir H. Al-Hilfi
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Previous Organizations / Institutes
The organizations / institutes from the scholar's other articles in the past ten years
Research Subjects
Samir H. Al-Hilfi has a total of 13 co-authors. Here are the top co-authors by number of shared publications:
- Brian Derby
Department of Materials, University of Manchester, Oxford Road, Manchester M13 9PL, U.K.
2 shared publications - Ian A. Kinloch
University of Manchester
1 shared publication - J. Christopher Whitehead
School of Chemistry, The University of Manchester
1 shared publication - Klaus Müllen
Max Planck Institute for Polymer Research , Ackermannweg 10
1 shared publication Lingmei Ni
Department of Materials and Earth Science and Department of Chemistry, Technical University Darmstadt, Otto-Berndt-Straße 3, 64287 Darmstadt, Germany
1 shared publication- Philip A. Martin
Department of Chemical Engineering, The University of Manchester, Oxford Road, Manchester M13 9PL, UK
1 shared publication
Latest Publications
- Open Access
- 9 November 2021
- Published by Royal Society of Chemistry (RSC) in Materials Horizons
- Vol. 9 (1) , 417-424
Facilitating the acidic oxygen reduction of Fe–N–C catalysts by fluorine-doping
As the alternatives to expensive Pt-based materials for the oxygen reduction reaction (ORR), iron/nitrogen co-doped carbon catalysts (FeNC) with dense FeNx active sites are promising candidates to promote the commercialization of proton exchange membrane fuel cells. Herein, we report a synthetic approach using perfluorotetradecanoic acid (PFTA)-modified metal–organic frameworks as precursors for the synthesis of fluorine-doped FeNC (F-FeNC) with improved ORR performance. The utilization of PFTA surfactants causes profound changes of the catalyst structure including F-doping into graphitic carbon, increased micropore surface area and Brunauer–Emmett–Teller (BET) surface area (up to 1085 m2 g−1), as well as dense FeNx sites. The F-FeNC catalyst exhibits an improved ORR activity with a high E1/2 of 0.83 V (VS. RHE) compared to the pristine FeNC material (E1/2 = 0.80 V). A fast decay occurs in the first 10 000 potential cycles for the F-FeNC catalyst, but high durability is still maintained up to another 50 000 cycles. Density functional theory calculations reveal that the strongly withdrawing fluorine atoms doped on the graphitic carbon can optimize the electronic structure of the FeNx active center and decrease the adsorption energy of ORR intermediates.
- 9 November 2021
- Published by Royal Society of Chemistry (RSC) in Materials Horizons
- Vol. 9 (1) , 417-424
Open AccessFacilitating the acidic oxygen reduction of Fe–N–C catalysts by fluorine-doping
As the alternatives to expensive Pt-based materials for the oxygen reduction reaction (ORR), iron/nitrogen co-doped carbon catalysts (FeNC) with dense FeNx active sites are promising candidates to promote the commercialization of proton exchange membrane fuel cells. Herein, we report a synthetic approach using perfluorotetradecanoic acid (PFTA)-modified metal–organic frameworks as precursors for the synthesis of fluorine-doped FeNC (F-FeNC) with improved ORR performance. The utilization of PFTA surfactants causes profound changes of the catalyst structure including F-doping into graphitic carbon, increased micropore surface area and Brunauer–Emmett–Teller (BET) surface area (up to 1085 m2 g−1), as well as dense FeNx sites. The F-FeNC catalyst exhibits an improved ORR activity with a high E1/2 of 0.83 V (VS. RHE) compared to the pristine FeNC material (E1/2 = 0.80 V). A fast decay occurs in the first 10 000 potential cycles for the F-FeNC catalyst, but high durability is still maintained up to another 50 000 cycles. Density functional theory calculations reveal that the strongly withdrawing fluorine atoms doped on the graphitic carbon can optimize the electronic structure of the FeNx active center and decrease the adsorption energy of ORR intermediates.
- Open Access
Chemical Vapor Deposition of Graphene on Cu-Ni Alloys: The Impact of Carbon Solubility
Chemical vapour deposition (CVD) is the most promising graphene synthesis route for film and electronic applications but the growth mechanism is still not fully understood. Herein, we investigate the role of the solubility of carbon in the underlying growth substrate on the CVD growth of graphene. A range of Cu-Ni alloys compositions that cover the carbon (C) solubility range between low C solubility (pure Cu) and high C solubility (pure Ni) were used as the catalytic growth substrates. The CVD of graphene on Cu-Ni alloys showed a transition from bilayer graphene (BLG) to few-layer graphene (FLG) at a substrate Ni concentration of 45 wt.%, which was attributed to an increase in the bulk diffusion of C. The Cu-rich alloys had a high graphene coverage (BLG) at a fast-cooling rate (367 °C/min), while the Ni-rich alloys had a low coverage (FLG) under the same cooling condition. In contrast, at slow cooling rates (27 °C/min), the Cu-rich alloys had a low coverage of graphene (BLG) and the Ni-rich alloys had a high coverage of graphene (FLG). Glow discharge optical emission spectroscopy (GDOES) was used to profile the subsurface composition, particularly the C concentration, as a function of depth.
Open AccessChemical Vapor Deposition of Graphene on Cu-Ni Alloys: The Impact of Carbon Solubility
Chemical vapour deposition (CVD) is the most promising graphene synthesis route for film and electronic applications but the growth mechanism is still not fully understood. Herein, we investigate the role of the solubility of carbon in the underlying growth substrate on the CVD growth of graphene. A range of Cu-Ni alloys compositions that cover the carbon (C) solubility range between low C solubility (pure Cu) and high C solubility (pure Ni) were used as the catalytic growth substrates. The CVD of graphene on Cu-Ni alloys showed a transition from bilayer graphene (BLG) to few-layer graphene (FLG) at a substrate Ni concentration of 45 wt.%, which was attributed to an increase in the bulk diffusion of C. The Cu-rich alloys had a high graphene coverage (BLG) at a fast-cooling rate (367 °C/min), while the Ni-rich alloys had a low coverage (FLG) under the same cooling condition. In contrast, at slow cooling rates (27 °C/min), the Cu-rich alloys had a low coverage of graphene (BLG) and the Ni-rich alloys had a high coverage of graphene (FLG). Glow discharge optical emission spectroscopy (GDOES) was used to profile the subsurface composition, particularly the C concentration, as a function of depth.
- 23 June 2020
- Published by Royal Society of Chemistry (RSC) in Nanoscale
- Vol. 12 (28) , 15283-15294
Chemical vapour deposition of graphene on copper–nickel alloys: the simulation of a thermodynamic and kinetic approach
Chemical vapour deposition (CVD) of graphene on transition metals is generally believed to be the fabrication route best suited for the production of high-quality large-area graphene sheets. The mechanism of CVD graphene growth is governed by interactions in both the gas phase and at the surface. Here we present a simulation of the CVD graphene growth mechanism which includes thermodynamics, gas phase kinetics and the surface reaction in a sequential manner. The thermodynamic simulation shows that the deposition driving force is the greatest for high carbon to hydrogen ratios and reaches a maximum at around 850 °C. No graphene growth is observed below this temperature. The surface kinetic model also shows that below this temperature, the carbon surface concentration is less than the solubility limit, thus no film can grow. The effect of the reaction chamber geometry on the product concentrations was clear from the gas phase decomposition reactions. The gas residence times studied here (around 0.07 s) show that the optimum gas phase composition is far from that expected at thermodynamic equilibrium. The surface kinetics of CH4 reactions on Ni, Cu and Cu–Ni surfaces shows good agreement with the experimental results for different growth pressures (0.1 to 0.7 mbar), temperatures (600 to 1200 °C) and different Ni thicknesses (25–500 μm). Also, the model works well when substrates with various C solubilities are used. The thermodynamic and kinetic models described here can be used for the design of improved reactors to optimise the production of graphene with differing qualities, either single or multi-layer and sizes. More importantly, the transfer to a continuous process with a moving substrate should also be possible using the model if it is extended from 2D to 3D.
- 23 June 2020
- Published by Royal Society of Chemistry (RSC) in Nanoscale
- Vol. 12 (28) , 15283-15294
Chemical vapour deposition of graphene on copper–nickel alloys: the simulation of a thermodynamic and kinetic approach
Chemical vapour deposition (CVD) of graphene on transition metals is generally believed to be the fabrication route best suited for the production of high-quality large-area graphene sheets. The mechanism of CVD graphene growth is governed by interactions in both the gas phase and at the surface. Here we present a simulation of the CVD graphene growth mechanism which includes thermodynamics, gas phase kinetics and the surface reaction in a sequential manner. The thermodynamic simulation shows that the deposition driving force is the greatest for high carbon to hydrogen ratios and reaches a maximum at around 850 °C. No graphene growth is observed below this temperature. The surface kinetic model also shows that below this temperature, the carbon surface concentration is less than the solubility limit, thus no film can grow. The effect of the reaction chamber geometry on the product concentrations was clear from the gas phase decomposition reactions. The gas residence times studied here (around 0.07 s) show that the optimum gas phase composition is far from that expected at thermodynamic equilibrium. The surface kinetics of CH4 reactions on Ni, Cu and Cu–Ni surfaces shows good agreement with the experimental results for different growth pressures (0.1 to 0.7 mbar), temperatures (600 to 1200 °C) and different Ni thicknesses (25–500 μm). Also, the model works well when substrates with various C solubilities are used. The thermodynamic and kinetic models described here can be used for the design of improved reactors to optimise the production of graphene with differing qualities, either single or multi-layer and sizes. More importantly, the transfer to a continuous process with a moving substrate should also be possible using the model if it is extended from 2D to 3D.