Solène Comby-Dassonneville
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Solène Comby-Dassonneville has a total of 67 co-authors. Here are the top co-authors by number of shared publications:
- Olivier Thomas
Aix Marseille Université, CNRS Université de Toulon IM2NP UMR 7334 13397 Marseille France
6 shared publications - Cristian Mocuta
Synchrotron SOLEIL, L'Orme des Merisiers 2 , Départementale 128, 91190 Saint-Aubin
3 shared publications - Fabien Volpi
Universite Grenoble Alpes, CNRS, Grenoble INP, SIMaP laboratory 3 , 1130 Rue de la Piscine, Saint-Martin-d'Hères, 38402, France
3 shared publications - Thomas Walter Cornelius
Aix-Marseille Université, CNRS, Université de Toulon, IM2NP UMR 7334, 13397 Marseille, France
3 shared publications - Yannick Le-Friec
STMicroelectronics 3 , 850 rue Jean Monnet, 38920 Crolles
3 shared publications - Bailey E. Rhodes
University of California, Santa Barbara
2 shared publications
Latest Publications
- 10 November 2026
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 140 (18)
Femtosecond laser irradiation of thin Ge2Sb2Te5−x films: Amorphization and morphological evolution
This study explores the amorphization of a Te-poor Ge–Sb–Te alloy using single 800 nm femtosecond laser pulses. Before irradiation, the phase composition and microstructure of the investigated sample were characterized using synchrotron x-ray diffraction and high-resolution transmission electron microscopy. The threshold fluence required for amorphization with a single laser shot was identified, with a minimum fluence of ∼45 mJ cm−2 necessary to induce structural changes. At higher fluences (≥83 mJ cm−2), surface blistering and layer delamination occurred, also due to laser absorption by the TiN capping layer. This study revealed partial amorphization localized preferentially in the upper part of the layer with a few crystalline residuals closer to the substrate. The formation of cavities in the amorphized zones, close to the interface with the TiN layer, is supposed to be responsible for the delamination of the latter observed in the center of the irradiated zone. No long-range elemental diffusion was observed post-irradiation. These results provide valuable insights into the structural changes that can be induced by femtosecond laser irradiation in Ge–Sb–Te alloys.
- 10 November 2026
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 140 (18)
Femtosecond laser irradiation of thin Ge2Sb2Te5−x films: Amorphization and morphological evolution
This study explores the amorphization of a Te-poor Ge–Sb–Te alloy using single 800 nm femtosecond laser pulses. Before irradiation, the phase composition and microstructure of the investigated sample were characterized using synchrotron x-ray diffraction and high-resolution transmission electron microscopy. The threshold fluence required for amorphization with a single laser shot was identified, with a minimum fluence of ∼45 mJ cm−2 necessary to induce structural changes. At higher fluences (≥83 mJ cm−2), surface blistering and layer delamination occurred, also due to laser absorption by the TiN capping layer. This study revealed partial amorphization localized preferentially in the upper part of the layer with a few crystalline residuals closer to the substrate. The formation of cavities in the amorphized zones, close to the interface with the TiN layer, is supposed to be responsible for the delamination of the latter observed in the center of the irradiated zone. No long-range elemental diffusion was observed post-irradiation. These results provide valuable insights into the structural changes that can be induced by femtosecond laser irradiation in Ge–Sb–Te alloys.
- 8 May 2026
- Published by American Physical Society (APS) in Physical Review Materials
- Vol. 10 (5)
Origins of the giant magnetoplastic effect in L 2 1 -ordered intermetallics
- 8 May 2026
- Published by American Physical Society (APS) in Physical Review Materials
- Vol. 10 (5)
Origins of the giant magnetoplastic effect in L 2 1 -ordered intermetallics
- 3 April 2026
- Published by Agence Bibliographique de l'Enseignement Supérieur
Développement et application d'un nanoindenteur in situ MEB couplé à des mesures électriques
L’essor de la demande actuelle pour des matériaux architecturés, en microélectronique par exemple, ou pour des matériaux de structure, nécessite le développement d’outils de caractérisation toujours plus performants. Dans cette optique, un instrument de caractérisation multifonctionnel basé sur un couplage mécanique / électrique, a été développé au laboratoire SIMaP. Le cœur de ce dispositif est un nanoindenteur in situ FEG-SEM (Field Emission Gun Scanning Electron Microscope) couplé à des mesures électriques. Ce travail est porté par trois principales motivations: (1) L’étude du comportement mécanique d’objets petites échelles, (2) L’apport des données électriques à l’analyse quantitative du comportement mécanique pendant l’indentation, en particulier pour obtenir une meilleur estimation de l’aire de contact, (3) L’étude locale des propriétés électroniques d’empilements de films minces. L’intégration in situ SEM a été validée et permet un positionnement des indents avec une précision meilleure que 100 nm, autorisant ainsi l’étude des propriétés mécaniques à l’échelle submicrométrique. La rapidité des essais permet également des mesures statistiques. Des caractérisations mécaniques ont été menées aussi bien sur des échantillons composites massifs que sur des ilots d’or submicrométriques. Pour ce dernier cas, malgré la nature stochastique de leur comportement mécanique, une loi déterministe a pu être extraite des données mécaniques. Des mesures 3D-BCDI (Bragg Coherent Diffraction Imaging) au synchrotron ont été réalisées sur certains ilots avant et après chargement mécanique, révélant une germination de dislocations avant l’avalanche de grandes déformations plastiques. En parallèle de cette étude, des mesures électriques ont été réalisées pendant l’indentation de divers échantillons. Des mesures de nanoindentation résistive ont ainsi été effectuées sur des métaux nobles (Au) ou recouverts de leur oxyde natif (Cu, Al), soit à l’état de monocristal massif ou de film polycristallin. Les résultats quantitatifs soulignent l’importance de la présence d’une couche d’oxyde sur la réponse électrique. En présence d’un oxyde, l’interface pointe / échantillon semble être le lieu d’importantes réactions électrochimiques. En l’absence d’oxyde, la résistance mesurée peut être entièrement décrite par un modèle analytique. Dans ce cas, l’aire de contact électrique peut être prédite à partir des mesures de résistance. Enfin, des mesures capacitives ont été réalisées sur des structures MOS avec différentes épaisseurs d’oxyde. Les résultats expérimentaux sont parfaitement décrits par un modèle analytique, ce qui ouvre la voie à des mesures locales de permittivité diélectrique sous contrainte mécanique.
- 3 April 2026
- Published by Agence Bibliographique de l'Enseignement Supérieur
Développement et application d'un nanoindenteur in situ MEB couplé à des mesures électriques
L’essor de la demande actuelle pour des matériaux architecturés, en microélectronique par exemple, ou pour des matériaux de structure, nécessite le développement d’outils de caractérisation toujours plus performants. Dans cette optique, un instrument de caractérisation multifonctionnel basé sur un couplage mécanique / électrique, a été développé au laboratoire SIMaP. Le cœur de ce dispositif est un nanoindenteur in situ FEG-SEM (Field Emission Gun Scanning Electron Microscope) couplé à des mesures électriques. Ce travail est porté par trois principales motivations: (1) L’étude du comportement mécanique d’objets petites échelles, (2) L’apport des données électriques à l’analyse quantitative du comportement mécanique pendant l’indentation, en particulier pour obtenir une meilleur estimation de l’aire de contact, (3) L’étude locale des propriétés électroniques d’empilements de films minces. L’intégration in situ SEM a été validée et permet un positionnement des indents avec une précision meilleure que 100 nm, autorisant ainsi l’étude des propriétés mécaniques à l’échelle submicrométrique. La rapidité des essais permet également des mesures statistiques. Des caractérisations mécaniques ont été menées aussi bien sur des échantillons composites massifs que sur des ilots d’or submicrométriques. Pour ce dernier cas, malgré la nature stochastique de leur comportement mécanique, une loi déterministe a pu être extraite des données mécaniques. Des mesures 3D-BCDI (Bragg Coherent Diffraction Imaging) au synchrotron ont été réalisées sur certains ilots avant et après chargement mécanique, révélant une germination de dislocations avant l’avalanche de grandes déformations plastiques. En parallèle de cette étude, des mesures électriques ont été réalisées pendant l’indentation de divers échantillons. Des mesures de nanoindentation résistive ont ainsi été effectuées sur des métaux nobles (Au) ou recouverts de leur oxyde natif (Cu, Al), soit à l’état de monocristal massif ou de film polycristallin. Les résultats quantitatifs soulignent l’importance de la présence d’une couche d’oxyde sur la réponse électrique. En présence d’un oxyde, l’interface pointe / échantillon semble être le lieu d’importantes réactions électrochimiques. En l’absence d’oxyde, la résistance mesurée peut être entièrement décrite par un modèle analytique. Dans ce cas, l’aire de contact électrique peut être prédite à partir des mesures de résistance. Enfin, des mesures capacitives ont été réalisées sur des structures MOS avec différentes épaisseurs d’oxyde. Les résultats expérimentaux sont parfaitement décrits par un modèle analytique, ce qui ouvre la voie à des mesures locales de permittivité diélectrique sous contrainte mécanique.
- Open Access
- 21 February 2026
- Published by Elsevier in Journal of Materials Research and Technology
- Vol. 41, 6748-6765
In situ Laue microdiffraction tracking of the { 110 } to { 112 } slip mode transition in L2 1 -ordered MnCu 2 Al
- 21 February 2026
- Published by Elsevier in Journal of Materials Research and Technology
- Vol. 41, 6748-6765
Open AccessIn situ Laue microdiffraction tracking of the { 110 } to { 112 } slip mode transition in L2 1 -ordered MnCu 2 Al
- 16 September 2025
- Published by Elsevier in Acta Materialia
- Vol. 301
Phase transformation in Ce-Doped zirconia single and oligo-crystals: In-situ micro-compression with electron back-scattered diffraction analysis
- 16 September 2025
- Published by Elsevier in Acta Materialia
- Vol. 301
Phase transformation in Ce-Doped zirconia single and oligo-crystals: In-situ micro-compression with electron back-scattered diffraction analysis
- Open Access
- 12 May 2025
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 137 (18)
Influence of an underlayer on the crystallization of thin Ge-rich Ge–Sb–Te films
Ge-rich Ge–Sb–Te alloys exhibit a high (>350 °C) crystallization temperature, which is compatible with applications requiring a high thermal stability such as the use of non-volatile memories in cars. As the composition of these alloys does not correspond to any stable crystalline phase, crystallization from the amorphous phase is accompanied by phase separation (Ge2Sb2Te5 + Ge). The complexity of the elemental processes associated with this multiphase amorphous-to-crystal transition calls for in-depth materials studies. In this work, we focus on the influence of a thin (5 nm) underlayer (Ge2Sb2Te5 or Sb2Te3) on the crystallization of a Ge-rich Ge–Sb–Te alloy. Using in situ synchrotron x-ray diffraction, we demonstrate that the underlayers facilitate crystallization by decreasing crystallization temperature and suppressing incubation time. These results are interpreted in the framework of classical nucleation theory and are supported by crystallographic texture measurements, which evidence ⟨111⟩ fiber texture in the crystallized cubic Ge2Sb2Te5, particularly marked in the case of an Sb2Te3 underlayer. These results bear important consequences for the cycling of memory cells based on these materials.
- 12 May 2025
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 137 (18)
Open AccessInfluence of an underlayer on the crystallization of thin Ge-rich Ge–Sb–Te films
Ge-rich Ge–Sb–Te alloys exhibit a high (>350 °C) crystallization temperature, which is compatible with applications requiring a high thermal stability such as the use of non-volatile memories in cars. As the composition of these alloys does not correspond to any stable crystalline phase, crystallization from the amorphous phase is accompanied by phase separation (Ge2Sb2Te5 + Ge). The complexity of the elemental processes associated with this multiphase amorphous-to-crystal transition calls for in-depth materials studies. In this work, we focus on the influence of a thin (5 nm) underlayer (Ge2Sb2Te5 or Sb2Te3) on the crystallization of a Ge-rich Ge–Sb–Te alloy. Using in situ synchrotron x-ray diffraction, we demonstrate that the underlayers facilitate crystallization by decreasing crystallization temperature and suppressing incubation time. These results are interpreted in the framework of classical nucleation theory and are supported by crystallographic texture measurements, which evidence ⟨111⟩ fiber texture in the crystallized cubic Ge2Sb2Te5, particularly marked in the case of an Sb2Te3 underlayer. These results bear important consequences for the cycling of memory cells based on these materials.
- 15 February 2025
- Published by Elsevier in Materialia
- Vol. 39
Combining nanoindentation and Bragg coherent diffraction imaging to investigate small-scale plasticity
- 15 February 2025
- Published by Elsevier in Materialia
- Vol. 39
Combining nanoindentation and Bragg coherent diffraction imaging to investigate small-scale plasticity
- Open Access
- 8 June 2024
- Published by Wiley in Physica Status Solidi (RRL) – Rapid Research Letters
Investigation of Phase Segregation Dynamics in Ge‐Rich GST Thin Films by In Situ X‐Ray Fluorescence Mapping
Ge‐rich Ge–Sb–Te alloy is a good candidate for future automotive applications due to its high crystallization temperature, which allows good data retention at elevated temperatures. Crystallization in this material is governed by elemental segregation which is key to thermal stability and device performance. In this work, elemental (Ge, Sb, Te) segregation is studied in situ during thermal annealing of Ge‐rich Ge–Sb–Te thin films using X‐ray fluorescence microscopy at ID16B beamline of ESRF with a beam size of 50 nm. Spatially resolved maps of Ge, Te, and Sb fluorescence yield are monitored and statistically analyzed as a function of temperature/time. In all investigated samples Sb appears to segregate much less than Te and Ge, indicating a lower mobility of this element. In situ, fluorescence mapping of samples doped with different amounts of carbon by ion implantation shows that carbon delays Ge and Te segregation to higher temperatures. Comparison with crystallization kinetics monitored by X‐ray diffraction shows a good correlation between the occurrence of spatially resolved chemical inhomogeneities and the appearance of crystallized phases.
- 8 June 2024
- Published by Wiley in Physica Status Solidi (RRL) – Rapid Research Letters
Open AccessInvestigation of Phase Segregation Dynamics in Ge‐Rich GST Thin Films by In Situ X‐Ray Fluorescence Mapping
Ge‐rich Ge–Sb–Te alloy is a good candidate for future automotive applications due to its high crystallization temperature, which allows good data retention at elevated temperatures. Crystallization in this material is governed by elemental segregation which is key to thermal stability and device performance. In this work, elemental (Ge, Sb, Te) segregation is studied in situ during thermal annealing of Ge‐rich Ge–Sb–Te thin films using X‐ray fluorescence microscopy at ID16B beamline of ESRF with a beam size of 50 nm. Spatially resolved maps of Ge, Te, and Sb fluorescence yield are monitored and statistically analyzed as a function of temperature/time. In all investigated samples Sb appears to segregate much less than Te and Ge, indicating a lower mobility of this element. In situ, fluorescence mapping of samples doped with different amounts of carbon by ion implantation shows that carbon delays Ge and Te segregation to higher temperatures. Comparison with crystallization kinetics monitored by X‐ray diffraction shows a good correlation between the occurrence of spatially resolved chemical inhomogeneities and the appearance of crystallized phases.
- 31 March 2021
- Published by American Chemical Society (ACS) in ACS Applied Materials & Interfaces
- Vol. 13 (14) , 17062-17074
ZrCuAg Thin-Film Metallic Glasses: Toward Biostatic Durable Advanced Surfaces
A combinatorial approach has served as a high-throughput strategy to identify compositional windows with optimized desired properties. Here, ZrCuAg thin-film metallic glasses were deposited by DC magnetron sputtering. For the purpose of using these coatings as biomedical surfaces, their durability in terms of mechanical and physicochemical properties as well as antibacterial properties were characterized. The effect of the chemical composition of thin films was studied. In particular, two key parameters were highlighted: the atomic ratio of Zr/Cu (with three values of 65/35, 50/50, and 35/65) and the silver content (from 1 to 16 at. %). All thin films are XRD amorphous and exhibit a typical veinlike pattern, which is characteristic of metallic glasses. They also show a dense and smooth surface and a hydrophobic behavior. Mechanical properties are found to be deeply influenced by the Zr/Cu ratio and the atomic structure. Although a low Zr/Cu ratio and/or a high silver content is detrimental to corrosion behavior, it favors the bactericidal effect of thin films. For all Zr/Cu ratios, ZrCuAg thin-film metallic glasses with silver contents higher than 12 at % are fully bactericidal. For lower silver contents, the bactericidal effect progressively decreases, which paves the way for a biostatic behavior of these surfaces.
- 31 March 2021
- Published by American Chemical Society (ACS) in ACS Applied Materials & Interfaces
- Vol. 13 (14) , 17062-17074
ZrCuAg Thin-Film Metallic Glasses: Toward Biostatic Durable Advanced Surfaces
A combinatorial approach has served as a high-throughput strategy to identify compositional windows with optimized desired properties. Here, ZrCuAg thin-film metallic glasses were deposited by DC magnetron sputtering. For the purpose of using these coatings as biomedical surfaces, their durability in terms of mechanical and physicochemical properties as well as antibacterial properties were characterized. The effect of the chemical composition of thin films was studied. In particular, two key parameters were highlighted: the atomic ratio of Zr/Cu (with three values of 65/35, 50/50, and 35/65) and the silver content (from 1 to 16 at. %). All thin films are XRD amorphous and exhibit a typical veinlike pattern, which is characteristic of metallic glasses. They also show a dense and smooth surface and a hydrophobic behavior. Mechanical properties are found to be deeply influenced by the Zr/Cu ratio and the atomic structure. Although a low Zr/Cu ratio and/or a high silver content is detrimental to corrosion behavior, it favors the bactericidal effect of thin films. For all Zr/Cu ratios, ZrCuAg thin-film metallic glasses with silver contents higher than 12 at % are fully bactericidal. For lower silver contents, the bactericidal effect progressively decreases, which paves the way for a biostatic behavior of these surfaces.