Cristina Craciun

We show that in plasmas generated in deuterium in the presence of sputtered W surfaces, various molecular tungsten species are formed, whose chemical composition depends on the presence of gaseous impurities, namely, nitrogen, oxygen, and hydrogen. A magnetron discharge was used for plasma sustaining, and the species were investigated by mass spectrometry and optical emission spectroscopy. The identified tungsten-containing molecules are described by the chemical formula WO_xN_yD_zH_t, where x = 0–4, y = 0–3, z = 0–3, t = 0–5. Presumptively, even higher mass tungsten molecular species are present in plasma, which were not detected because of the limitation of the spectrometer measurement range to 300 amu. The presence of these molecules will likely impact the W particle balance and dust formation mechanisms in fusion plasmas.

In this work, we describe an ion mass spectra processing method from plasmas generated in Ar and Ar/H₂ gases in contact with tungsten surfaces. For this purpose, advanced model functions, i.e., those suitable for fitting the experimental mass peak profiles, are used. In addition, the peak positions, peak shapes, abundances, and ion ratios are the parameters considered for building these functions. In the case of a multielement magnetron target, the calibration of the mass spectra with respect to the peak shape and position on the m/z scale is helpful in reducing the number of free variables during fitting. The mass spectra fitting procedure is validated by the obtained isotopic abundances of W ions in W/Ar magnetron plasmas, which, in turn, are comparable with their natural abundance. Moreover, its usefulness is exemplified by calculating the ratio of WH⁺/W⁺ ions in W/Ar/H₂ plasma. This work paves the way for obtaining relevant results regarding ion species in plasma even in the case of using general-purpose mass spectrometers with limited resolution and accuracy. Although this method is illustrated for the W/Ar/H₂ plasma system, it can be easily extendable to any plasma type.

This work is focused on the application of a laser-based technique, i.e., matrix-assisted pulsed laser evaporation (MAPLE) for the development of electrochemical sensors aimed at the detection of nitrites in water. Commercial carbon-based screen-printed electrodes were modified by MAPLE via the application of a newly developed composite coating with different concentrations of carbon nanotubes (CNTs), chitosan, and iron (II) phthalocyanine (C₃₂H₁₆FeN₈). The performance of the newly fabricated composite coatings was evaluated both by investigating the morphology and surface chemistry of the coating, and by determining the electro-catalytic oxidation properties of nitrite with bare and modified commercial carbon-based screen-printed electrode. It was found that the combined effect of CNTs with chitosan and C₃₂H₁₆FeN₈ significantly improves the electrochemical response towards the oxidation of nitrite. In addition, the MAPLE modified screen-printed electrodes have a limit of detection of 0.12 µM, which make them extremely useful for the detection of nitrite traces.

We report on the deposition and characterization of hafnium silicate and aluminium silicate thin films for different applications in optics and electronics. Pulsed laser deposition in a controllable oxygen atmosphere was used as a processing technique, with optimized parameters in terms of laser wavelength, laser fluence and oxygen pressure. The thin films were investigated using atomic force microscopy, spectroscopic ellipsometry, UV–VIS spectroscopy and X-ray photoelectron spectroscopy. The morphological investigations evidenced uniform layers with low roughness (in the order of nanometres). The optical investigations revealed that aluminium silicate layers with low roughness and low absorption in the infrared (IR) range can be obtained at high substrate temperatures (600 °C). The behaviour of the silicate thin films with respect to the nanosecond IR laser irradiation revealed that aluminium silicate layers have higher laser-induced damage threshold values in comparison with hafnium silicate.