Isaac Rodríguez-Ibarra
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Isaac Rodríguez-Ibarra has a total of 7 co-authors. Here are the top co-authors by number of shared publications:
- Agustin Leobardo Herrera May
Centro de Investigación en Micro y Nanotecnología, Universidad Veracruzana, Boca del Río 94294, Veracruz, Mexico
1 shared publication - Cesia Guarneros-Aguilar
CONACYT-Instituto Politécnico Nacional, GESMAT-CICATA Altamira, 07738 Ciudad de Mexico, Mexico
1 shared publication - Edith Osorio-De-La-Rosa
SECIHTI, Division of Sciences, Engineering, and Technology, Autonomous University of the State of Quintana Roo (UQROO), Chetumal 77019, Mexico
1 shared publication - Felipe Caballero Briones
Instituto Politécnico Nacional, Materiales y Tecnologías para Energía, Salud y Medio Ambiente (GESMAT), Centro de Investigación en Ciencia Aplicada y Tecnología Avanzada, Unidad Altamira (CICATA Altamira), Altamira 89600, Mexico
1 shared publication - Francisco López-Huerta
Faculty of Electrical and Electronic Engineering, Universidad Veracruzana, Boca del Río 94294, Veracruz, Mexico
1 shared publication - Ricardo Agustín-Serrano
Facultad de Ciencias Físico Matemáticas, Benemérita Universidad Autónoma de Puebla, Puebla 72570, Puebla, Mexico
1 shared publication
Latest Publications
- Open Access
Automated Instrument for the Deposition of Thin Films Using Successive Ionic Layer Adsorption and Reaction
The development and improvement of thin film deposition techniques is an important research topic to obtain new materials at submicro and nano scale with high homogeneity and thickness control. Here, we designed and built an automated device for the deposition of binary or ternary compound films using Successive Ionic Layer Adsorption and Reaction (SILAR). The instrument is integrated by three different systems. The first system consists of a mobile platform of two degrees of freedom. The second part has an 8-bit microcontroller used to adjust the velocities along the horizontal and vertical axes. The third, the control system, uses a mobile app that can be implemented in smart devices, developed in free code software for programming and monitoring the main deposition parameters of the SILAR device such as the number of cycles, the immersion and emersion velocities, the residence time at each step, and the number of reactors. The performance of our instrument was verified through the deposition of PbS films, varying the number of deposition cycles to study the variations in the film thickness and structure, and assessed by profilometry, Raman spectroscopy, X-ray diffraction and atomic force microscopy. The system demonstrated is useful to obtain crystalline films with controllable thicknesses.
Open AccessAutomated Instrument for the Deposition of Thin Films Using Successive Ionic Layer Adsorption and Reaction
The development and improvement of thin film deposition techniques is an important research topic to obtain new materials at submicro and nano scale with high homogeneity and thickness control. Here, we designed and built an automated device for the deposition of binary or ternary compound films using Successive Ionic Layer Adsorption and Reaction (SILAR). The instrument is integrated by three different systems. The first system consists of a mobile platform of two degrees of freedom. The second part has an 8-bit microcontroller used to adjust the velocities along the horizontal and vertical axes. The third, the control system, uses a mobile app that can be implemented in smart devices, developed in free code software for programming and monitoring the main deposition parameters of the SILAR device such as the number of cycles, the immersion and emersion velocities, the residence time at each step, and the number of reactors. The performance of our instrument was verified through the deposition of PbS films, varying the number of deposition cycles to study the variations in the film thickness and structure, and assessed by profilometry, Raman spectroscopy, X-ray diffraction and atomic force microscopy. The system demonstrated is useful to obtain crystalline films with controllable thicknesses.