Tao Wu
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Tao Wu has a total of 15 co-authors. Here are the top co-authors by number of shared publications:
- Baohua Jia
RMIT University
1 shared publication - Chenchen Wei
School of Electrical Engineering & Intelligentization, Dongguan University of technology, Dongguan 523808, China
1 shared publication - Geng Zhang
School of Electrical Engineering and Intelligentization, Dongguan University of Technology. No. 1, Daxue Rd, Songshan Lake, Dongguan 523808, Guangdong, China
1 shared publication - Han Lin
RMIT University
1 shared publication - Honglong Ning
Guangdong Basic Research Center of Excellence for Energy & Information Polymer Materials, State Key Laboratory of Luminescent Materials and Devices, School of Materials Sciences and Engineering, South China University of Technology, Guangzhou 510640, China
1 shared publication - Hua Zheng
DGUT-CNAM Institute, Dongguan University of Technology, Dongguan 523007, China
1 shared publication
Latest Publications
- Top Cited PapersOpen Access
Research Progress of Micro-LED Display Technology
Micro-LED display technology is considered to be the next generation of display technology, which has the characteristics of high miniaturization, thin film and integration, as well as the advantages of high brightness, high contrast, fast response speed and long service life. However, in the development of Micro-LED display technology, there are still some technical and cost problems to be solved. This paper focuses on the key technologies involved in Micro-LED display technology, such as chip technology, mass transfer, full-color display, bonding and driving technology, the research history and frontier progress of these technologies are reviewed in detail. For chip epitaxy technology, the wavelength uniformity, current density and defect control are emphasized; for chip process, the two main chip structures and the challenges brought by miniaturization are discussed emphatically; for chip integration, full-color display, backplane bonding and driving, several mainstream technical schemes are summarized in turn. Finally, the chip detection and repair technologies and commercial application are introduced.
Top Cited PapersOpen AccessResearch Progress of Micro-LED Display Technology
Micro-LED display technology is considered to be the next generation of display technology, which has the characteristics of high miniaturization, thin film and integration, as well as the advantages of high brightness, high contrast, fast response speed and long service life. However, in the development of Micro-LED display technology, there are still some technical and cost problems to be solved. This paper focuses on the key technologies involved in Micro-LED display technology, such as chip technology, mass transfer, full-color display, bonding and driving technology, the research history and frontier progress of these technologies are reviewed in detail. For chip epitaxy technology, the wavelength uniformity, current density and defect control are emphasized; for chip process, the two main chip structures and the challenges brought by miniaturization are discussed emphatically; for chip integration, full-color display, backplane bonding and driving, several mainstream technical schemes are summarized in turn. Finally, the chip detection and repair technologies and commercial application are introduced.