Abdelhakim Bouissil

Coatings play a key role in modern industry, enhancing the performance of materials. The diversity of their applications and constant progress make them a central area of research and development in materials science and engineering. In this manuscript, we examined some recent works of high-entropy coatings deposited by magnetron sputtering. The first section provides details on the magnetron sputtering technique and deposition mechanism. The change of the parameter influences the microstructure and then the properties of the films. High Power Impulse Magnetron Sputtering is sued to increase the compactness of the film. In the second, a spotlight on High-Entropy Films (HEFs) as an emergent-class material is presented and how their oxidation resistance is improved. Particular attention is being paid to studying the effect of some alloying elements, such as nitrogen and silicon, on oxidation resistance improvement. The last section presents potential applications of these coatings, especially the cutting tools, the diffusion barrier, and other industrial uses.

This work uses the direct current magnetron sputtering (DCMS) of equi-atomic (AlTiZrHfTa) and Si targets in dynamic sweep mode to deposit nano-layered (AlTiZrHfTa)N_x/SiN_x refractory high-entropy coatings (RHECs). Transmission electron microscopy (TEM), field emission scanning electron microscopy (FESEM), thermogravimetric analysis (TGA), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) are used to investigate the effect of Si addition on the oxidation behavior of the nano-layered coatings. The Si-free nitride coating exhibits FCC structure and columnar morphology, while the Si-doped nitride coatings present a FCC (AlTiZrHfTa)N/amorphous-SiN_x nano-layered architecture. The hardness decreases from 24.3 ± 1.0 GPa to 17.5 ± 1.0 GPa because of the nano-layered architecture, whilst Young’s modulus reduces from 188.0 ± 1.0 GPa to roughly 162.4 ± 1.0 GPa. By increasing the thickness of the SiN_x nano-layer, k_p values decrease significantly from 3.36 × 10⁻⁸ g² cm⁻⁴ h⁻¹ to 6.06 × 10⁻⁹ g² cm⁻⁴ h⁻¹. The activation energy increases from 90.8 kJ·mol⁻¹ for (AlTiZrHfTa)N_x nitride coating to 126.52 kJ·mol⁻¹ for the (AlTiZrHfTa)N_x/SiN_x nano-layered coating. The formation of a FCC (AlTiZrHfTa)-N_x/a-SiN_x nano-layered architecture results in the improvement of the resistance to oxidation at high temperature.

Refractory high-entropy films (RHEFs) are a new type of high-temperature material with great prospects for applications due to their superior properties. They have the potential to replace nickel-based superalloys in order to develop a new generation of materials that can be used under extreme conditions. (TiTaZrHf)_100−xY_x RHEFs are prepared using the magnetron sputtering technique. The yttrium (Y) content varies from 0 to 56 at.%. XRD analysis indicates the formation of an amorphous phase in Y-free films, while new phases are formed after the addition of Y. The results are confirmed by TEM analysis, revealing the formation of nano-grains with two phases L1₂ and Y-P6/mmm structure. With an increasing Y content, the grain size of the nano-grains increases, which has a significant effect on the mechanical properties of the films. Hardness decreases from 9.7 GPa to 5 GPa when the Y amount increases. A similar trend is observed for the Young’s modulus, ranging from 111.6 to 82 GPa. A smooth and featureless morphology is observed on the low Y content films, while those with a larger Y content appear columnar near the substrate. Furthermore, the phase evolution is evaluated by calculating the thermodynamic criteria ΔH_mix, ΔS_mix, Ω, and δ. The calculation results predict the formation of new phases and are then in good agreement with the experimental characterization.