Y. Morita
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
Research Interests
Y. Morita has a total of 3 co-authors. Here are the top co-authors by number of shared publications:
A. Kuroda
Institute of Industrial Science, The University of Tokyo, Komaba, Meguro-ku, Tokyo 153-8505, Japan
1 shared publicationM. Owari
Institute of Industrial Science, The University of Tokyo, Komaba, Meguro-ku, Tokyo 153-8505, Japan
1 shared publicationT. Iwata
Institute of Industrial Science, The University of Tokyo, Komaba, Meguro-ku, Tokyo 153-8505, Japan
1 shared publication
Latest Publications
- 9 September 2010
- Published by Wiley in Surface and Interface Analysis
- Vol. 42 (10-11) , 1622-1624
The effect of shave‐off scanning at a fabricated section by focused ion beam
Three‐dimensional microanalysis for a minute structure that consists of organic compounds and polymers is important to develop and to practically use the method to analyze a micronanometer order area. However, it is difficult because of the insulating nature of the material, need of structural analysis and a dose limit not to destruct surface organic structure (static limit). We developed a novel three‐dimensional microanalysis method by means of focused ion beam (FIB) for section processing (shave‐off scanning) and ToF‐SIMS for mapping method. For the purpose of realization of three‐dimensional microanalysis and a chemical and structural analysis of the organic matter, a polymer destruction of fabricated section by shave‐off scanning was examined. To determine spectrum changing, polystyrene was fabricated as a function of dose time by shave‐off scanning, and these samples were analyzed by ToF‐SIMS. As a result, a flat surface was made along with shave‐off scanning time, and a surface organic structure fabricated by FIB was detected with a certain rate. Copyright © 2010 John Wiley & Sons, Ltd.
- 9 September 2010
- Published by Wiley in Surface and Interface Analysis
- Vol. 42 (10-11) , 1622-1624
The effect of shave‐off scanning at a fabricated section by focused ion beam
Three‐dimensional microanalysis for a minute structure that consists of organic compounds and polymers is important to develop and to practically use the method to analyze a micronanometer order area. However, it is difficult because of the insulating nature of the material, need of structural analysis and a dose limit not to destruct surface organic structure (static limit). We developed a novel three‐dimensional microanalysis method by means of focused ion beam (FIB) for section processing (shave‐off scanning) and ToF‐SIMS for mapping method. For the purpose of realization of three‐dimensional microanalysis and a chemical and structural analysis of the organic matter, a polymer destruction of fabricated section by shave‐off scanning was examined. To determine spectrum changing, polystyrene was fabricated as a function of dose time by shave‐off scanning, and these samples were analyzed by ToF‐SIMS. As a result, a flat surface was made along with shave‐off scanning time, and a surface organic structure fabricated by FIB was detected with a certain rate. Copyright © 2010 John Wiley & Sons, Ltd.