Qianyu Hou
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
Qianyu Hou has a total of 48 co-authors. Here are the top co-authors by number of shared publications:
Wenhong Sun
5 shared publicationsKepiao Dai
4 shared publicationsYan Fang
4 shared publications- Dunjun Chen
Nanjing University
3 shared publications Liyue Xu
3 shared publicationsDunjun Chen
2 shared publications
Latest Publications
- 26 July 2026
- Published by Elsevier in Micro and Nanostructures
- Vol. 219
Enhancement-mode GaN superjunction CAVET with dual-island N–I–P gate stack for improved threshold voltage
- 26 July 2026
- Published by Elsevier in Micro and Nanostructures
- Vol. 219
Enhancement-mode GaN superjunction CAVET with dual-island N–I–P gate stack for improved threshold voltage
- 25 May 2026
- Published by AIP Publishing in Applied Physics Letters
- Vol. 128 (21)
High-resolution GaN p-i-n alpha-particle detector with thick i-GaN layer
Alpha-particle detectors face several fundamental challenges, including the difficulty in achieving thick, high-quality depletion regions essential for efficient charge collection, high leakage currents caused by material defects, and severe energy loss in conventional electrode configurations. To address these limitations, we developed a GaN p-i-n alpha-particle detector on a free-standing substrate with a 20 μm thick intrinsic layer. A grid-shaped front electrode is introduced to minimize dead-layer energy loss. The device achieves full depletion at a low bias of −40 V and maintains leakage currents below several tens of picoampere up to −100 V. Notably, it exhibits an energy resolution of 1.5% at just −10 V, as well as a charge collection efficiency of 83.6%, which increases to 98.1% at −70 V. Theoretical modeling further reveals the underlying mechanism behind the anomalous energy resolution trend. These advances are attributed to the high crystalline quality of the thick i-GaN layer and the grid-shaped electrode design, which collectively suppress dislocation-induced leakage and dead-layer effects. This work provides a practical pathway to low-voltage, high-performance GaN alpha-particle detectors.
- 25 May 2026
- Published by AIP Publishing in Applied Physics Letters
- Vol. 128 (21)
High-resolution GaN p-i-n alpha-particle detector with thick i-GaN layer
Alpha-particle detectors face several fundamental challenges, including the difficulty in achieving thick, high-quality depletion regions essential for efficient charge collection, high leakage currents caused by material defects, and severe energy loss in conventional electrode configurations. To address these limitations, we developed a GaN p-i-n alpha-particle detector on a free-standing substrate with a 20 μm thick intrinsic layer. A grid-shaped front electrode is introduced to minimize dead-layer energy loss. The device achieves full depletion at a low bias of −40 V and maintains leakage currents below several tens of picoampere up to −100 V. Notably, it exhibits an energy resolution of 1.5% at just −10 V, as well as a charge collection efficiency of 83.6%, which increases to 98.1% at −70 V. Theoretical modeling further reveals the underlying mechanism behind the anomalous energy resolution trend. These advances are attributed to the high crystalline quality of the thick i-GaN layer and the grid-shaped electrode design, which collectively suppress dislocation-induced leakage and dead-layer effects. This work provides a practical pathway to low-voltage, high-performance GaN alpha-particle detectors.
- Open Access
- 4 May 2026
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Photonics Journal
- Vol. 18 (3) , 6801604
Self-Powered Ultraviolet Bipolar Switching Photodetectors Based on β-Ga 2 O 3 / GaN Heterojunctions
Bipolar all-solid-state photodiodes, based on the photoelectric effect, are heralding a new dawn for the development of ultraviolet photonic integrated circuits. Here, we present a self-powered ultraviolet bipolar switching photodetector (SUBS-PD) based on a β-Ga2O3/GaN heterojunction. By introducing a heterojunction dual electric field to bidirectionally modulate carrier transport, the device achieves wavelength-selective photocurrent polarity reversal. It generates a positive photocurrent at 365 nm and a negative photocurrent at 270 nm, enabling intrinsic dual-band spectral discrimination without external power. By precisely engineering the thickness and doping concentration of the Ga2O3 layer, the optical absorption, internal electric-field distribution, and carrier transport dynamics are optimized, resulting in enhanced device performance. Furthermore, a simulated ultraviolet signal receiver incorporating the SUBS-PD demonstrates accurate American Standard Code for Information Interchange (ASCII) decoding. These results establish a compact and energy-efficient platform for programmable photonic circuits and secure ultraviolet optical communication.
- 4 May 2026
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Photonics Journal
- Vol. 18 (3) , 6801604
Open AccessSelf-Powered Ultraviolet Bipolar Switching Photodetectors Based on β-Ga 2 O 3 / GaN Heterojunctions
Bipolar all-solid-state photodiodes, based on the photoelectric effect, are heralding a new dawn for the development of ultraviolet photonic integrated circuits. Here, we present a self-powered ultraviolet bipolar switching photodetector (SUBS-PD) based on a β-Ga2O3/GaN heterojunction. By introducing a heterojunction dual electric field to bidirectionally modulate carrier transport, the device achieves wavelength-selective photocurrent polarity reversal. It generates a positive photocurrent at 365 nm and a negative photocurrent at 270 nm, enabling intrinsic dual-band spectral discrimination without external power. By precisely engineering the thickness and doping concentration of the Ga2O3 layer, the optical absorption, internal electric-field distribution, and carrier transport dynamics are optimized, resulting in enhanced device performance. Furthermore, a simulated ultraviolet signal receiver incorporating the SUBS-PD demonstrates accurate American Standard Code for Information Interchange (ASCII) decoding. These results establish a compact and energy-efficient platform for programmable photonic circuits and secure ultraviolet optical communication.
- 25 February 2026
- Published by Elsevier in Optics Communications
- Vol. 608
Self-powered ultraviolet photodetector enhanced by gradient Mn-doped InZnO/p-GaN heterojunctions via energy-efficient sol-gel synthesis
- 25 February 2026
- Published by Elsevier in Optics Communications
- Vol. 608
Self-powered ultraviolet photodetector enhanced by gradient Mn-doped InZnO/p-GaN heterojunctions via energy-efficient sol-gel synthesis
- 8 September 2025
- Published by AIP Publishing in Applied Physics Letters
- Vol. 127 (10)
Defect-annealing-induced optical gain recovery in electron-irradiated 4H-SiC UV phototransistors
The ultraviolet (UV) response of a floating-base 4H-SiC n–p–n phototransistor is characterized before and after 10 MeV electron irradiation. The pristine device demonstrates visible-blind UV detection at 275 nm, achieving a UV/dark current ratio of ∼106, a specific detectivity of 1.37 × 1012 Jones, and a responsivity of 1.36 A/W. Responsivity monotonically increases with incident optical power density. After 500 kGy irradiation, responsivity degrades by 80%, with dose dependence following a double-exponential decay. Vacuum annealing at 800 K restores 79% of the pre-irradiation optical gain, confirming a partial reversibility of irradiation-induced defects. Deep level transient spectroscopy reveals defect evolution post-annealing, identifying corresponding energy levels, identities, and annihilation dynamics. High-temperature annealing primarily annihilates irradiation-induced point defects, enabling significant recovery, while thermally stable defect complexes prevent full restoration.
- 8 September 2025
- Published by AIP Publishing in Applied Physics Letters
- Vol. 127 (10)
Defect-annealing-induced optical gain recovery in electron-irradiated 4H-SiC UV phototransistors
The ultraviolet (UV) response of a floating-base 4H-SiC n–p–n phototransistor is characterized before and after 10 MeV electron irradiation. The pristine device demonstrates visible-blind UV detection at 275 nm, achieving a UV/dark current ratio of ∼106, a specific detectivity of 1.37 × 1012 Jones, and a responsivity of 1.36 A/W. Responsivity monotonically increases with incident optical power density. After 500 kGy irradiation, responsivity degrades by 80%, with dose dependence following a double-exponential decay. Vacuum annealing at 800 K restores 79% of the pre-irradiation optical gain, confirming a partial reversibility of irradiation-induced defects. Deep level transient spectroscopy reveals defect evolution post-annealing, identifying corresponding energy levels, identities, and annihilation dynamics. High-temperature annealing primarily annihilates irradiation-induced point defects, enabling significant recovery, while thermally stable defect complexes prevent full restoration.
- 11 August 2025
- Published by Elsevier in Microelectronics Journal
- Vol. 165
Simulation-based study of low dark current phototransistors with p-hBN/AlGaN/GaN HEMT structures
- 11 August 2025
- Published by Elsevier in Microelectronics Journal
- Vol. 165
Simulation-based study of low dark current phototransistors with p-hBN/AlGaN/GaN HEMT structures
- 13 June 2025
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 43 (4)
High threshold voltage enhancement-mode AlGaN/GaN HEMT with double barrier hybrid gate
This work presents a novel enhancement-mode hybrid p-type gate AlGaN/GaN high electron mobility transistor (HEMT) with a double barrier structure. The double barrier hybrid-gate (DBHG) HEMT yields better performance than the traditional p-GaN gate HEMTs in terms of threshold voltage and breakdown voltage, which can be attributed to the regulation of the interface electric field in the AlGaN barrier layers. Moreover, the simulated results indicate that the DBHG HEMT exhibits a high threshold voltage of 1.8 V and a breakdown voltage of 995 V. In addition, we discussed the influence of the thickness of each layer in the double barrier layer structure on device performance. This work provides valuable insights for future innovations in the structure design of HEMTs.
- 13 June 2025
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 43 (4)
High threshold voltage enhancement-mode AlGaN/GaN HEMT with double barrier hybrid gate
This work presents a novel enhancement-mode hybrid p-type gate AlGaN/GaN high electron mobility transistor (HEMT) with a double barrier structure. The double barrier hybrid-gate (DBHG) HEMT yields better performance than the traditional p-GaN gate HEMTs in terms of threshold voltage and breakdown voltage, which can be attributed to the regulation of the interface electric field in the AlGaN barrier layers. Moreover, the simulated results indicate that the DBHG HEMT exhibits a high threshold voltage of 1.8 V and a breakdown voltage of 995 V. In addition, we discussed the influence of the thickness of each layer in the double barrier layer structure on device performance. This work provides valuable insights for future innovations in the structure design of HEMTs.
- Open Access
- 20 October 2023
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 41 (6)
High-performance normally off AlGaN/GaN high electron mobility transistor with p-type h-BN cap layer
Normally off AlGaN/GaN high electron mobility transistors (HEMTs) with p-type gates are attracting increasing attention due to their high safety and low power loss in the field of power switching. In this work, to solve the Mg difficult activating problem of the conventional p-GaN gate AlGaN/GaN HEMTs, we propose an advanced design for the normally off AlGaN/GaN HEMT with a p-type hexagonal boron nitride (h-BN) gate cap layer to effectively manipulate the channel transport of the device. The simulation results demonstrate that the p-hBN gate cap HEMTs yield superior performance over conventional p-GaN gate HEMTs in terms of output current and breakdown voltage, which can be attributed to the deeper potential well formation at the AlGaN/GaN interface and more accumulation of holes located at the p-hBN/AlGaN interface. Moreover, we investigate the effect of bandgap variation on device performance, taking into account that the exact bandgap of h-BN remains under debate. Herein, valuable insights into h-BN cap-gate E-mode AlGaN/GaN HEMT devices are provided, which could serve as a useful reference for the future development of robust III-nitride material power electronic devices.
- 20 October 2023
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 41 (6)
Open AccessHigh-performance normally off AlGaN/GaN high electron mobility transistor with p-type h-BN cap layer
Normally off AlGaN/GaN high electron mobility transistors (HEMTs) with p-type gates are attracting increasing attention due to their high safety and low power loss in the field of power switching. In this work, to solve the Mg difficult activating problem of the conventional p-GaN gate AlGaN/GaN HEMTs, we propose an advanced design for the normally off AlGaN/GaN HEMT with a p-type hexagonal boron nitride (h-BN) gate cap layer to effectively manipulate the channel transport of the device. The simulation results demonstrate that the p-hBN gate cap HEMTs yield superior performance over conventional p-GaN gate HEMTs in terms of output current and breakdown voltage, which can be attributed to the deeper potential well formation at the AlGaN/GaN interface and more accumulation of holes located at the p-hBN/AlGaN interface. Moreover, we investigate the effect of bandgap variation on device performance, taking into account that the exact bandgap of h-BN remains under debate. Herein, valuable insights into h-BN cap-gate E-mode AlGaN/GaN HEMT devices are provided, which could serve as a useful reference for the future development of robust III-nitride material power electronic devices.
- Open Access
- 29 September 2023
- Published by MDPI AG in Micromachines
- Vol. 14 (10) , 1872
Simulation-Based Analysis of the Effect of Alpha Irradiation on GaN Particle Detectors
Radiation-hardened semiconductor GaN has drawn considerable attention owing to its excellent properties such as large displacement energy. Many studies have focused on evaluating the degradation of GaN-based power device performance by proton beam or particle irradiation, while quantitative analysis of the energy transfer process of particles inside the material and the mechanisms involved in inducing degradation of electrical properties are rare. Here, on the basis of the fabricated alpha-particle detector, a device model validated by basic electrical experiments is established to simulate the influence of alpha-particle irradiation on the leakage current of the device. We observe that the current does not change significantly with increasing radiation fluence at low bias, while it shows a descending trend with increasing radiation fluence at higher bias. However, increasing the energy of the radiation particles at the same radiation fluence directly leads to a monotonically elevated leakage current. Such a series of phenomena is associated with radiation-induced changes in the density of trapped states within the active layers of the device.
- 29 September 2023
- Published by MDPI AG in Micromachines
- Vol. 14 (10) , 1872
Open AccessSimulation-Based Analysis of the Effect of Alpha Irradiation on GaN Particle Detectors
Radiation-hardened semiconductor GaN has drawn considerable attention owing to its excellent properties such as large displacement energy. Many studies have focused on evaluating the degradation of GaN-based power device performance by proton beam or particle irradiation, while quantitative analysis of the energy transfer process of particles inside the material and the mechanisms involved in inducing degradation of electrical properties are rare. Here, on the basis of the fabricated alpha-particle detector, a device model validated by basic electrical experiments is established to simulate the influence of alpha-particle irradiation on the leakage current of the device. We observe that the current does not change significantly with increasing radiation fluence at low bias, while it shows a descending trend with increasing radiation fluence at higher bias. However, increasing the energy of the radiation particles at the same radiation fluence directly leads to a monotonically elevated leakage current. Such a series of phenomena is associated with radiation-induced changes in the density of trapped states within the active layers of the device.