Mai Ar Her
Mai Ar Her has a total of 8 co-authors. Here are the top co-authors by number of shared publications:
- Timothy John Gorey
Los Alamos National Laboratory
2 shared publications - Daniel Jorge Rodriguez
Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, Los Alamos, 87545, UNITED STATES
1 shared publication - Douglas J. Safarik
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
1 shared publication - Igor Olegovich Usov
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
1 shared publication - Mary Kathleen O'Brien
Los Alamos National Laboratory
1 shared publication - Michael G. Heidlage
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
1 shared publication
Latest Publications
- Open Access
- 1 November 2024
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 95 (11)
An automatic multi-precursor flow-type atomic layer deposition system
Designs for two automated atomic layer deposition (ALD) flow reactors are presented, and their capabilities for coating additively manufactured (AM) metal prints are described. One instrument allows the coating of several AM parts in batches, while the other is useful for single part experiments. To demonstrate reactor capabilities, alumina (Al2O3) was deposited onto AM 316L stainless steel by dosing with water (H2O) vapor and trimethylaluminum (TMA) and purging with nitrogen gas (N2). Both instruments are controlled by custom-programmed LabVIEW software that enables in situ logging of temperature, total pressure, and film thickness using a quartz crystal microbalance. An initial result shows that 150 ALD cycles led to a film thickness of ∼55 nm, which was verified with Rutherford backscattering spectroscopy. This indicates that the reactors were indeed depositing single atomic layers of Al2O3 per ALD cycle, as intended.
- 1 November 2024
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 95 (11)
Open AccessAn automatic multi-precursor flow-type atomic layer deposition system
Designs for two automated atomic layer deposition (ALD) flow reactors are presented, and their capabilities for coating additively manufactured (AM) metal prints are described. One instrument allows the coating of several AM parts in batches, while the other is useful for single part experiments. To demonstrate reactor capabilities, alumina (Al2O3) was deposited onto AM 316L stainless steel by dosing with water (H2O) vapor and trimethylaluminum (TMA) and purging with nitrogen gas (N2). Both instruments are controlled by custom-programmed LabVIEW software that enables in situ logging of temperature, total pressure, and film thickness using a quartz crystal microbalance. An initial result shows that 150 ALD cycles led to a film thickness of ∼55 nm, which was verified with Rutherford backscattering spectroscopy. This indicates that the reactors were indeed depositing single atomic layers of Al2O3 per ALD cycle, as intended.
- Open Access
- 10 October 2023
- Published by Office of Scientific and Technical Information (OSTI)
Transformative Manufacturing of Adaptive Wire Feedstocks with Atomic Layer Deposition of Nb2O5 onto Depleted Uranium [Slides]
The U.S. Department of Energy's Office of Scientific and Technical Information
- 10 October 2023
- Published by Office of Scientific and Technical Information (OSTI)
Open AccessTransformative Manufacturing of Adaptive Wire Feedstocks with Atomic Layer Deposition of Nb2O5 onto Depleted Uranium [Slides]
The U.S. Department of Energy's Office of Scientific and Technical Information