Wei Li
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
Research Interests
Wei Li has a total of 5 co-authors. Here are the top co-authors by number of shared publications:
- Bo Fu
Institute of Fluid Physics, China
1 shared publication - Fangyuan Zha
Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900, China
1 shared publication - Jiazhu Duan
Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900, China
1 shared publication - Yanglong Li
Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900, China
1 shared publication - Ziyou Zhou
School of Materials Science and Engineering, Central South University, Changsha 410083, China
1 shared publication
Latest Publications
- Open Access
- 17 January 2024
- Published by MDPI AG in Micromachines
- Vol. 15 (1) , 145
A Study on the Surface Quality and Damage Properties of Single-Crystal Silicon Using Different Post-Treatment Processes
Detecting subsurface defects in optical components has always been challenging. This study utilizes laser scattering and photothermal weak absorption techniques to detect surface and subsurface nano-damage precursors of single-crystal silicon components. Based on laser scattering and photothermal weak absorption techniques, we successfully establish the relationship between damage precursors and laser damage resistance. The photothermal absorption level is used as an important parameter to measure the damage resistance threshold of optical elements. Single-crystal silicon elements are processed and post-processed optimally. This research employs dry etching and wet etching techniques to effectively eliminate damage precursors from optical components. Additionally, detection techniques are utilized to comprehensively characterize these components, resulting in the successful identification of optimal damage precursor removal methods for various polishing types of single-crystal silicon components. Consequently, this method efficiently enhances the damage thresholds of optical components.
- 17 January 2024
- Published by MDPI AG in Micromachines
- Vol. 15 (1) , 145
Open AccessA Study on the Surface Quality and Damage Properties of Single-Crystal Silicon Using Different Post-Treatment Processes
Detecting subsurface defects in optical components has always been challenging. This study utilizes laser scattering and photothermal weak absorption techniques to detect surface and subsurface nano-damage precursors of single-crystal silicon components. Based on laser scattering and photothermal weak absorption techniques, we successfully establish the relationship between damage precursors and laser damage resistance. The photothermal absorption level is used as an important parameter to measure the damage resistance threshold of optical elements. Single-crystal silicon elements are processed and post-processed optimally. This research employs dry etching and wet etching techniques to effectively eliminate damage precursors from optical components. Additionally, detection techniques are utilized to comprehensively characterize these components, resulting in the successful identification of optimal damage precursor removal methods for various polishing types of single-crystal silicon components. Consequently, this method efficiently enhances the damage thresholds of optical components.