Jong Hyun Kim

Jong Hyun Kim

*This is an algorithmically generated author record based on publicly available information.

Jong Hyun Kim has a total of 65 co-authors. Here are the top co-authors by number of shared publications:


Latest Publications

  • Open Access

    An in situ visualization system using synchrotron white X-rays to investigate the solidification behaviors of metallic materials

    by Hyeong Uk Mo, Min Woo Kim, Chang Hun Lee, Jina Kim, Hyun Wook Park, Jae-Hong Lim, Chang Hee Yim, Cheol Hee Nam, Jong Hyun Kim, Ho Jae Kwak

    An advanced imaging platform has been developed to study the microstructural solidification behaviors of metals using synchrotron white X-rays. This system provides submicrometre effective pixel size and a frame rate of thousands per second, enabling high-resolution and high-speed imaging. The system functions independently, facilitating convenient alignment, magnification adjustments, and precise control of the region of interest. Additionally, we designed a specialized furnace for in situ characterization of microstructures during melting and solidification of metallic specimens at high temperature. This furnace meets stringent optical requirements and allows for finely adjusted specimen temperature gradients through the configuration of heating elements and individual current control. The furnace supports stable high-temperature experiments under vacuum, in an argon atmosphere, and at ambient pressure. Using this advanced imaging system, we investigated real-time in situ solidification phenomena of various metallic materials and other solidifying systems such as silicon. We performed image analysis to quantitatively assess microstructural changes, calculate dendritic spacing and determine liquid fractions.


  • Open Access

    The early development of a combined micro- and full-field X-ray fluorescence analysis system using white X-rays at PLS-II

    by Min Woo Kim, Kangwoo Ahn, Chang Hun Lee, Tae Joo Kim, JongYul Kim, Min-Su Han, Hyeong Uk Mo, Jina Kim, Hyun Wook Park, Ho Jae Kwak, et al.

    X-ray fluorescence (XRF) is widely used to analyze elemental distributions in samples. Micro-XRF (µ-XRF), the most basic conventional XRF technique, offers good spatial resolution through precise 2D scanning with a micrometre-sized X-ray source. Recently, synchrotron based XRF analysis platforms have achieved nano-XRF with highly focused X-rays using polycapillary optics or mirrors, leveraging the excellent coherence of synchrotron radiation. However, XRF techniques are hindered by long data acquisition times (exceeding several hours) due to their point-by-point scanning approach, impeding large-area elemental mapping. Full-field XRF (FF-XRF), developed in the 2010s and based on the high brilliance of synchrotron X-rays, enables significantly shorter (less than a few minutes) data acquisition times via single-exposure imaging using a 2D X-ray detector. Nevertheless, it is constrained by relatively low spatial resolution and sensitivity. Hence, a new XRF platform is required to accommodate resolution demands to cover diverse experimental purposes. In this study, we developed a preliminary model of a novel XRF system that combines micro- and full-field XRF setups to address these limitations. This system allows easy mode switching while maintaining the region of interest of the imaging system within a single apparatus, simply by rotating the sample to face either detector depending on research purposes. We anticipate that this new XRF system will be widely utilized in various research fields as the initial XRF setup at Pohang Light Source-II.


  • Open Access

    Development of High-Aspect-Ratio Soft Magnetic Microarrays for Magneto-Mechanical Actuation via Field-Induced Injection Molding

    by Da Seul Shin, Jin Wook Park, Chang Woo Gal, Jina Kim, Woo Seok Yang, Seon Yeong Yang, Min Jik Kim, Ho Jae Kwak, Sang Min Park, Jong Hyun Kim

    Magnetorheological elastomers (MREs) are in demand in the field of high-tech microindustries and nanoindustries such as biomedical applications and soft robotics due to their exquisite magneto-sensitive response. Among various MRE applications, programmable actuators are emerging as promising soft robots because of their combined advantages of excellent flexibility and precise controllability in a magnetic system. Here, we present the development of magnetically programmable soft magnetic microarray actuators through field-induced injection molding using MREs, which consist of styrene-ethylene/butylene styrene (SEBS) elastomer and carbonyl iron powder (CIP). The ratio of the CIP/SEBS matrix was designed to maximize the CIP fraction based on a critical solids loading. Further, as part of the design of the magnetization distribution in micropillar arrays, the magnetorheological response of the molten composites was analyzed using the static and dynamic viscosity results for both the on and off magnetic states, which reflected the particle dipole interaction and subsequent particle alignment during the field-induced injection molding process. To develop a high-aspect-ratio soft magnetic microarray, X-ray lithography was applied to prepare the sacrificial molds with a height-to-width ratio of 10. The alignment of the CIP was designed to achieve a parallel magnetic direction along the micropillar columns, and consequently, the micropillar arrays successfully achieved the uniform and large bending actuation of up to approximately 81° with an applied magnetic field. This study suggests that the injection molding process offers a promising manufacturing approach to build a programmable soft magnetic microarray actuator.


  • Open Access

    Development of High-Aspect Ratio Soft Magnetic Microarrays for Magneto-Mechanical Actuation via Field-Induced Injection Molding

    by Da Seul Shin, Jin Wook Park, Chang Woo Gal, Jina Kim, Woo Seok Yang, Seon Yeong Yang, Min Jik Kim, Ho Jae Kwak, Sang Min Park, Jong Hyun Kim

    Magnetorheological elastomers (MREs) are in demand in the field of high-tech micro- and nano-industries such as biomedical applications and soft robotics due to their exquisite magneto-sensitive response. Among various MRE applications, programmable actuators are emerging as promising soft robots because of their combined advantages of excellent flexibility and precise controllability in a magnetic system. Here, we present the development of a magnetically programmable soft magnetic microarray actuators through field-induced injection molding using MREs, which consist of styrene-ethylene/butylene styrene (SEBS) elastomer and carbonyl iron powder (CIP). The ratio of the CIP/SEBS matrix is designed to maximize the CIP fraction based on a critical solids loading. Further, as part of the design of the magnetization distribution in micropillar arrays, the magnetorheological response of the molten composites is analyzed using the static and dynamic viscosity results for both the on- and off- magnetic states, which reflect the particle dipole interaction and subsequent particle alignment during field-induced injection molding process. To develop high aspect ratio soft magnetic microarray, X-ray lithography is applied to prepare the sacrificial molds with a height-to-width ratio of 10. The alignment of CIP is designed to achieve a parallel magnetic direction along the micropillar columns, and consequently, the micropillar arrays successfully achieve the uniform and large bending actuation of up to approximately 81Ëš with an applied magnetic field. This study suggests that the injection molding process offers a promising manufacturing approach to build a programmable soft magnetic microarray actuator.

  • Open Access

    Fabrication of Oblique Submicron-Scale Structures Using Synchrotron Hard X-ray Lithography

    by Kanghyun Kim, Kyungjin Park, Hyoryung Nam, Geon Hwee Kim, Seong Kyung Hong, Suhyeon Kim, Hyeonsu Woo, Seungbin Yoon, Jong Hyun Kim, Geunbae Lim

    Oblique submicron-scale structures are used in various aspects of research, such as the directional characteristics of dry adhesives and wettability. Although deposition, etching, and lithography techniques are applied to fabricate oblique submicron-scale structures, these approaches have the problem of the controllability or throughput of the structures. Here, we propose a simple X-ray-lithography method, which can control the oblique angle of submicron-scale structures with areas on the centimeter scale. An X-ray mask was fabricated by gold film deposition on slanted structures. Using this mask, oblique ZEP520A photoresist structures with slopes of 20° and 10° and widths of 510 nm and 345 nm were fabricated by oblique X-ray exposure, and the possibility of polydimethylsiloxane (PDMS) molding was also confirmed. In addition, through double exposure with submicron- and micron-scale X-ray masks, dotted-line patterns were produced as an example of multiscale patterning.


  • Open Access

    Synchrotron X-ray induced acoustic imaging

    by Seongwook Choi, Eun-Yeong Park, Sinyoung Park, Jong Hyun Kim, Chulhong Kim

    X-ray induced acoustic imaging (XAI) is an emerging biomedical imaging technique that can visualize X-ray absorption contrast at ultrasound resolution with less ionizing radiation exposure than conventional X-ray computed tomography. So far, medical linear accelerators or industrial portable X-ray tubes have been explored as X-ray excitation sources for XAI. Here, we demonstrate the first feasible synchrotron XAI (sXAI). The synchrotron generates X-rays, with a dominant energy of 4 to 30 keV, a pulse-width of 30 ps, a pulse-repetition period of 2 ns, and a bunch-repetition period of 940 ns. The X-ray induced acoustic (XA) signals are processed in the Fourier domain by matching the signal frequency with the bunch-repetition frequency. We successfully obtained two-dimensional XA images of various lead targets. This novel sXAI tool could complement conventional synchrotron applications.


  • High-Speed X-Ray Projection Microscopy at Beamline 9D of the Pohang Light Source-II

    by Kyungjin Park, Seob-Gu Kim, Ye Ji Lee, Jae-Hong Lim, Jong Hyun Kim

    We constructed a high-speed X-ray projection microscope at beamline 9D of the Pohang Light Source-II (PLS-II). The microscope was able to take X-ray projection micrographs with a submil-lisecond exposure time by using whitebeam X-rays from the PLS-II bending-magnet synchrotron radiation. It also takes advantage of edge enhancement in phase-contrast imaging, which significantly improves the visibility of soft materials and microfluids. Using the microscope, we captured the spreading of a water droplet on a hydrophilic and oleophilic nonwoven membrane at 1,264 frames per second. The computed tomography (CT), which visualized a three-dimensional wooden structure at a spatial resolution of 2.7 µm, took 2.5 s for scanning.


  • Demonstration of a ring-FEL as an EUV lithography tool

    by Jaeyu Lee, G. Jang, J. Kim, B. Oh, D.-E. Kim, S.-S. Lee, J.-H. Kim, J. Ko, C. Min, S. Shin

    This paper presents the required structure and function of a ring-FEL as a radiation source for extreme ultraviolet radiation lithography (EUVL). A 100 m-long straight section that conducts an extremely low emittance beam from a fourth-generation storage ring can increase the average power at 13.5 nm wavelength to up to 1 kW without degrading the beam in the rest of the ring. Here, simulation results for a ring-FEL as a EUVL source are described.


  • Open Access

    Microfabrication of Ni-Fe Mold Insert via Hard X-ray Lithography and Electroforming Process

    by Jae Man Park, Sung Cheol Park, Da Seul Shin, Jong Hyun Kim, Hanlyun Cho, Woo Seok Yang, Seong Ho Son, Seong Jin Park

    In this research, a Ni-Fe mold insert for the efficient replication of high aspect-ratio microstructure arrays was fabricated via hard X-ray lithography and an electroforming process. For the X-ray exposure on a photoresist, a gold-based X-ray mask was prepared with conventional UV photolithography. The gold thickness was designed to be over 15 μm to prevent development underneath the absorber and to enhance the adhesion strength between the photoresist and substrate. By using the X-ray mask, a positive-type photoresist was selectively exposed to X-ray under an exposure energy of 4 kJ/cm3. Thereafter, the exposed region was developed in a downward direction to effectively remove the residual photoresist from the substrate. During the evaporation process, deionized water mixed with a surface additive prevented the bending and clustering of the photoresist microstructure arrays by lowering the capillary force, resulting in a defect-free mother structure for electroforming. Lastly, the mother structure was uniformly Ni-Fe electroformed on a conductive substrate without the formation of any pores or detachment from the substrate. Based on the proposed microfabrication process, a Ni-Fe mold insert with a 183 μm pattern size, 68 μm gap size, 550 μm height, 2116 microcavities and a hardness of 585 Hv was precisely manufactured. It can be utilized for the mass production of high aspect ratio metal and ceramic microstructure arrays in micro molding technologies.