Chao Li

Gallium oxide (Ga₂O₃), as a wide-bandgap semiconductor material, is highly expected to find extensive applications in optoelectronic devices, high-power electronics, gas sensors, etc. However, the photoelectric properties of Ga₂O₃ still need to be improved before its devices become commercially viable. As is well known, doping is an effective method to modulate the various properties of semiconductor materials. In this study, Zn–N co-doped Ga₂O₃ films with various doping concentrations were grown in situ on sapphire substrates by atomic layer deposition (ALD) at 250 °C, followed by post-annealing at 900 °C. The post-annealed undoped Ga₂O₃ film showed a highly preferential orientation, whereas with the increase in Zn doping concentration, the preferential orientation of Ga₂O₃ films was deteriorated, turning it into an amorphous state. The surface roughness of the Ga₂O₃ thin films is largely affected by doping. As a result of post-annealing, the bandgaps of the Ga₂O₃ films can be modulated from 4.69 eV to 5.41 eV by controlling the Zn–N co-doping concentrations. When deposited under optimum conditions, high-quality Zn–N co-doped Ga₂O₃ films showed higher transmittance, a larger bandgap, and fewer defects compared with undoped ones.

In this work, the epitaxial 0.85BaTiO3-0.15Bi(Mg1/2Ti1/2)O3 (BT-BMT) films with large compressive strain were fabricated on SrTiO3 (001). The expansion of the unit cell volume and out-of-plane lattice parameter and the large built-in electric field (Ebi) in BT-BMT films indicate the existence of defect dipoles. It was found that the polarization and the breakdown strength can be optimized by the strain and the defects, respectively. Ultimately, a desirable energy density of 90.3 J/cm3 with efficiency of 62.3% was achieved. It suggests that strain can serve as a practical means to modulate the energy storage performance of ferroelectric epitaxial film capacitors.

Intrinsic SrTiO₃ is a quantum paraelectric, but moderately Bi-doped SrTiO₃ exhibits dielectric frequency dispersion similar to relaxor ferroelectrics. In this paper, detailed electron microscopic studies of the microstructures of Bi-doped SrTiO₃ samples were presented. It was found that the Sr sites were replaced by off-central Bi, resulting in tensile strain in the strontium titanate (STO) lattice. In the Bi-doped SrTiO₃ samples, the valence of titanium mainly showed the Ti[ ] characteristic. According to the dielectric behavior and microstructure analysis, the polar nanoregions (PNRs) composed of strained SrTiO₃ nanoclusters should be responsible for the ferroelectric relaxor behavior in samples with moderate Bi content.