Maja Koblar
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
Maja Koblar has a total of 23 co-authors. Here are the top co-authors by number of shared publications:
- Andreja Benčan
Electronic Ceramics Department, Jožef Stefan Institute, Jamova cesta 39, 1000 Ljubljana, Slovenia
4 shared publications - Goran Dražić
National Institute of Chemistry, Hajdrihova 19, P.O. Box 660, SI-1001 Ljubljana, Slovenia
4 shared publications - Anton Kokalj
Department of Physical and Organic Chemistry, Jožef Stefan Institute, Jamova 39, SI-1000 Ljubljana, Slovenia
2 shared publications - Janina Roknić
Jožef Stefan International Postgraduate School
2 shared publications - Katarina Žiberna
Electronic Ceramics Department
2 shared publications - Matic Poberžnik
Jožef Stefan Institute, Jamova ulica 39, SI-1000 Ljubljana, Slovenia
2 shared publications
Latest Publications
- Open Access
- 22 September 2026
- Published by Elsevier in SSRN Electronic Journal
Point-Defect-Enhanced Local Polarization in (K0.5Na0.5)NbO3 Revealed by Atomic-Scale Microscopy and Simulations
Local atomic displacements underpin ferroelectric polarization in perovskites such as (K0.5Na0.5)NbO3 (KNN), yet experimentally observed niobium (Nb) off-centering exceeds predictions from structural models. Here, we employ atomic-resolution scanning transmission electron microscopy (STEM), quantitative four-dimensional (4D)-STEM charge-density mapping, and density functional theory (DFT) calculations to directly measure Nb displacements and identify intrinsic point defects, including oxygen and alkali vacancies. Our results show that these defects locally perturb Nb off-centering by tens of picometers, correlating with increased local polarization. Integrated differential phase contrast (iDPC) imaging confirms the presence of defects, while DFT calculations demonstrate that oxygen vacancies alone locally perturb and amplify Nb off-centering, thereby influencing polarization fields. These findings suggest that intrinsic point defects significantly contribute to the enhanced local polarization observed in KNN, providing insight into defect-stabilized polar order in lead-free ferroelectric materials.
- 22 September 2026
- Published by Elsevier in SSRN Electronic Journal
Open AccessPoint-Defect-Enhanced Local Polarization in (K0.5Na0.5)NbO3 Revealed by Atomic-Scale Microscopy and Simulations
Local atomic displacements underpin ferroelectric polarization in perovskites such as (K0.5Na0.5)NbO3 (KNN), yet experimentally observed niobium (Nb) off-centering exceeds predictions from structural models. Here, we employ atomic-resolution scanning transmission electron microscopy (STEM), quantitative four-dimensional (4D)-STEM charge-density mapping, and density functional theory (DFT) calculations to directly measure Nb displacements and identify intrinsic point defects, including oxygen and alkali vacancies. Our results show that these defects locally perturb Nb off-centering by tens of picometers, correlating with increased local polarization. Integrated differential phase contrast (iDPC) imaging confirms the presence of defects, while DFT calculations demonstrate that oxygen vacancies alone locally perturb and amplify Nb off-centering, thereby influencing polarization fields. These findings suggest that intrinsic point defects significantly contribute to the enhanced local polarization observed in KNN, providing insight into defect-stabilized polar order in lead-free ferroelectric materials.
- Open Access
- 17 August 2026
- Published by American Chemical Society (ACS) in ChemRxiv
Point-defect-enhanced local polarization in (K0.5Na0.5)NbO3 revealed by atomic-scale microscopy and simulations
Local atomic displacements underpin ferroelectric polarization in perovskites such as (K0.5Na0.5)NbO3 (KNN), yet experimentally observed niobium (Nb) off-centering exceeds predictions from structural models. Here, we employ atomic-resolution scanning transmission electron microscopy (STEM), quantitative four-dimensional (4D)-STEM charge-density mapping, and density functional theory (DFT) calculations to directly measure Nb displacements and identify intrinsic point defects, including oxygen and alkali vacancies. Our results show that these defects locally perturb Nb off-centering by tens of picometers, correlating with increased local polarization. Integrated differential phase contrast (iDPC) imaging confirms the presence of defects, while DFT calculations demonstrate that oxygen vacancies alone locally perturb and amplify Nb off-centering, thereby influencing polarization fields. These findings suggest that intrinsic point defects significantly contribute to the enhanced local polarization observed in KNN, providing insight into defect-stabilized polar order in lead-free ferroelectric materials.
- 17 August 2026
- Published by American Chemical Society (ACS) in ChemRxiv
Open AccessPoint-defect-enhanced local polarization in (K0.5Na0.5)NbO3 revealed by atomic-scale microscopy and simulations
Local atomic displacements underpin ferroelectric polarization in perovskites such as (K0.5Na0.5)NbO3 (KNN), yet experimentally observed niobium (Nb) off-centering exceeds predictions from structural models. Here, we employ atomic-resolution scanning transmission electron microscopy (STEM), quantitative four-dimensional (4D)-STEM charge-density mapping, and density functional theory (DFT) calculations to directly measure Nb displacements and identify intrinsic point defects, including oxygen and alkali vacancies. Our results show that these defects locally perturb Nb off-centering by tens of picometers, correlating with increased local polarization. Integrated differential phase contrast (iDPC) imaging confirms the presence of defects, while DFT calculations demonstrate that oxygen vacancies alone locally perturb and amplify Nb off-centering, thereby influencing polarization fields. These findings suggest that intrinsic point defects significantly contribute to the enhanced local polarization observed in KNN, providing insight into defect-stabilized polar order in lead-free ferroelectric materials.
- Open Access
- 25 April 2025
- Published by Wiley in Advanced Science
- Vol. 12 (23) , e2500611
Large Built‐in Fields and Tunable Ferroelectricity in Composition‐Graded ScAlN Thin Films Deposited by Reactive Sputtering
The control of the coercive field and growth of abnormally oriented grains (AOGs) in wurtzite ferroelectric Sc x Al 1‐x N thin films is crucial for piezoelectric and ferroelectric applications. However, elevated Sc concentrations generally result in significant AOG growth and high leakage current, degrading piezoelectric and ferroelectric properties. Here, compositionally graded Sc x Al 1‐x N layered structures grown by sputtering are explored to effectively limit the AOG growth, compared to the 8–10% typically observed in conventional films, without requiring process optimization. Notably, a large built‐in electric field of ≈0.45 MV cm −1 , nearly 2.5 times larger than in graded PbZr x Ti 1‐x O 3 (PZT) and BaSr x Ti 1‐x O 3 (BST) systems, is achieved. This built‐in field induces unique features, including horizontal shifts in polarization‐electric field hysteresis loops, bi‐stable states in capacitance‐voltage characteristics, and highly asymmetric electrostrain behavior. Unlike other graded systems, this large built‐in field in the graded Sc x Al 1‐x N films arises primarily from polarization and chemical gradients. These findings offer a simplified, scalable and CMOS‐compatible strategy to overcome the AOG challenges and tune ferroelectric properties of Sc x Al 1‐x N thin films, providing the path for potential applications in advanced photonic and MEMS devices with improved performance and low‐power consumption.
- 25 April 2025
- Published by Wiley in Advanced Science
- Vol. 12 (23) , e2500611
Open AccessLarge Built‐in Fields and Tunable Ferroelectricity in Composition‐Graded ScAlN Thin Films Deposited by Reactive Sputtering
The control of the coercive field and growth of abnormally oriented grains (AOGs) in wurtzite ferroelectric Sc x Al 1‐x N thin films is crucial for piezoelectric and ferroelectric applications. However, elevated Sc concentrations generally result in significant AOG growth and high leakage current, degrading piezoelectric and ferroelectric properties. Here, compositionally graded Sc x Al 1‐x N layered structures grown by sputtering are explored to effectively limit the AOG growth, compared to the 8–10% typically observed in conventional films, without requiring process optimization. Notably, a large built‐in electric field of ≈0.45 MV cm −1 , nearly 2.5 times larger than in graded PbZr x Ti 1‐x O 3 (PZT) and BaSr x Ti 1‐x O 3 (BST) systems, is achieved. This built‐in field induces unique features, including horizontal shifts in polarization‐electric field hysteresis loops, bi‐stable states in capacitance‐voltage characteristics, and highly asymmetric electrostrain behavior. Unlike other graded systems, this large built‐in field in the graded Sc x Al 1‐x N films arises primarily from polarization and chemical gradients. These findings offer a simplified, scalable and CMOS‐compatible strategy to overcome the AOG challenges and tune ferroelectric properties of Sc x Al 1‐x N thin films, providing the path for potential applications in advanced photonic and MEMS devices with improved performance and low‐power consumption.
- Open Access
- 24 March 2025
- Published by Royal Society of Chemistry (RSC) in Materials Advances
- Vol. 6 (8) , 2648-2653
Epitaxial PbZrO 3 films from chemical solutions
Single-crystal PbZrO 3 thin films are processed via chemical route. The 680 nm-thick films are antiferroelectric, while the 170 nm-thick films show ferroelectric-like switching, which is associated with the defect formation during the annealing.
- 24 March 2025
- Published by Royal Society of Chemistry (RSC) in Materials Advances
- Vol. 6 (8) , 2648-2653
Open AccessEpitaxial PbZrO 3 films from chemical solutions
Single-crystal PbZrO 3 thin films are processed via chemical route. The 680 nm-thick films are antiferroelectric, while the 170 nm-thick films show ferroelectric-like switching, which is associated with the defect formation during the annealing.