Tianren Liu
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
Tianren Liu has a total of 6 co-authors. Here are the top co-authors by number of shared publications:
- Dongxu Yang
State Key Laboratory of Optical Field Manipulation Science and Technology, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
1 shared publication - Jingxin Lei
State Key Laboratory of Advanced Polymer Materials, Polymer Research Institute, Sichuan University, Chengdu 610065, China
1 shared publication - Kaixin Su
State Key Laboratory of Optical Field Manipulation Science and Technology, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
1 shared publication - Xiaofei Liu
State Key Laboratory of Optical Field Manipulation Science and Technology, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
1 shared publication - Yuan Chen
State Key Laboratory of Optical Field Manipulation Science and Technology, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
1 shared publication - Yuanfu Chen
School of Integrated Circuit Science and Engineering, and State Key Laboratory of Electronic Thin Films and Integrated Devices University of Electronic Science and Technology of China Chengdu China
1 shared publication
Latest Publications
- Open Access
- 19 December 2025
- Published by MDPI AG in Micromachines
- Vol. 17 (1) , 1
Ligand Functionality-Dependent Performance of Organotin Carboxylate Resists
As metal-containing resists attract increasing research interest in high-resolution lithography, gaining insights into the photochemical mechanisms, particularly in relation to the ligand functionality, is actively demanded. In this work, a controlled pair of organotin carboxylates with analogous structures but different functional groups has been designed and synthesized as deep-ultraviolet (DUV) resists. Both resists demonstrate 90 nm half-pitch resolution and the capability of pattern transfer on carbon-based hard-mask layers. Through various characterizations and comparison of the controlled pair, we propose two competitive reaction paths for the organotin system with olefin groups, which regulate the lithographic sensitivity and dissolution contrast. Our findings highlight the structural adjustability of organotin carboxylates and their potential application as high-resolution and etch-durable DUV resists.
- 19 December 2025
- Published by MDPI AG in Micromachines
- Vol. 17 (1) , 1
Open AccessLigand Functionality-Dependent Performance of Organotin Carboxylate Resists
As metal-containing resists attract increasing research interest in high-resolution lithography, gaining insights into the photochemical mechanisms, particularly in relation to the ligand functionality, is actively demanded. In this work, a controlled pair of organotin carboxylates with analogous structures but different functional groups has been designed and synthesized as deep-ultraviolet (DUV) resists. Both resists demonstrate 90 nm half-pitch resolution and the capability of pattern transfer on carbon-based hard-mask layers. Through various characterizations and comparison of the controlled pair, we propose two competitive reaction paths for the organotin system with olefin groups, which regulate the lithographic sensitivity and dissolution contrast. Our findings highlight the structural adjustability of organotin carboxylates and their potential application as high-resolution and etch-durable DUV resists.