William Talbott
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
William Talbott has a total of 47 co-authors. Here are the top co-authors by number of shared publications:
Abhijit Roy
24Instituto de Nanociencia y Materiales de Aragon (INMA), CSIC-University of Zaragoza, Calle Mariano Esquillor, 50018 Zaragoza, Spain
1 shared publication- Alba Centeno
Graphenea SA San Sebastian Spain
1 shared publication Alexander Rakowski
National Center for Electron Microscopy Facility, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, United States of America
1 shared publication- Alexander Stuart Eggeman
Department of Materials, University of Manchester, M13 9PL Manchester, UK
1 shared publication Amaia Pesquera
19Graphenea, Graphenea Headquarters, Paseo Mikeletegi 83, 20009 San Sebastián, Spain
1 shared publication- Amaia Zurutuza
Graphenea San Sebastián Spain
1 shared publication
Latest Publications
- Open Access
- 15 December 2025
- Published by IOP Publishing in 2D Materials
- Vol. 13 (2)
A large interlaboratory electron diffraction study of monolayer graphene
Standardisation of data collection and analysis is essential to enable commercialisation of 2D materials in a wide range of technologies. Selected area electron diffraction (SAED) in the transmission electron microscope (TEM) is one of the key methods for distinguishing monolayer from bilayer and few-layer graphene by comparing the 1st and 2nd order diffraction spot intensities. Yet there are many factors that can affect the reliability of data collection and interpretation, causing the measurement of monolayer samples to deviate from the literature boundary condition of I{-2110}/I{1-100}<1 for monolayer graphene. Here we present the results of a large interlaboratory SAED comparison study, where 15 international laboratories measured and analysed nominally identical samples of chemical vapour deposited (CVD) graphene. Large variations were observed in the measured ratios of diffraction spot intensities, with the largest variance associated with poor quality SAED data resulting from poor specimen handling and storage. To inform the reliable determination of monolayer thickness from SAED patterns we provide a description of best practice for specimen handling, TEM operation, data collection and analysis. This work was undertaken within VAMAS Technical Working Area (TWA) 41: Graphene and related 2D materials - Project 9, the results of which have been directly incorporated into ISO/TS 21356-2 for the characterisation of graphene sheets. We find that when this methodology is followed, monolayer graphene can be distinguished from bilayer or thicker material with high confidence where analysis of a single SAED pattern gives I{-2110}/I{1-100}<1.2, even in the absence of precise specimen tilting.
- 15 December 2025
- Published by IOP Publishing in 2D Materials
- Vol. 13 (2)
Open AccessA large interlaboratory electron diffraction study of monolayer graphene
Standardisation of data collection and analysis is essential to enable commercialisation of 2D materials in a wide range of technologies. Selected area electron diffraction (SAED) in the transmission electron microscope (TEM) is one of the key methods for distinguishing monolayer from bilayer and few-layer graphene by comparing the 1st and 2nd order diffraction spot intensities. Yet there are many factors that can affect the reliability of data collection and interpretation, causing the measurement of monolayer samples to deviate from the literature boundary condition of I{-2110}/I{1-100}<1 for monolayer graphene. Here we present the results of a large interlaboratory SAED comparison study, where 15 international laboratories measured and analysed nominally identical samples of chemical vapour deposited (CVD) graphene. Large variations were observed in the measured ratios of diffraction spot intensities, with the largest variance associated with poor quality SAED data resulting from poor specimen handling and storage. To inform the reliable determination of monolayer thickness from SAED patterns we provide a description of best practice for specimen handling, TEM operation, data collection and analysis. This work was undertaken within VAMAS Technical Working Area (TWA) 41: Graphene and related 2D materials - Project 9, the results of which have been directly incorporated into ISO/TS 21356-2 for the characterisation of graphene sheets. We find that when this methodology is followed, monolayer graphene can be distinguished from bilayer or thicker material with high confidence where analysis of a single SAED pattern gives I{-2110}/I{1-100}<1.2, even in the absence of precise specimen tilting.